Method for position determination, method for overlay optimization, and lithographic projection apparatus

• US 7,288,779 B2
• Filed: 12/17/2003
• Issued: 10/30/2007
• Est. Priority Date: 12/17/2003
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Dunbar, Allan Reuben, Schets, Sicco Ian, Van Der Aa, Nicolaas Petrus, Huijbregstse, Jeroen
• Primary Examiner(s): Luu; Thanh X.
• Assistant Examiner(s): Wyatt; Kevin
• Application Number:
  US10/736,911
• Publication Number:
  US 20050133743A1
• Time in Patent Office: 1,413 Days
• Field of Search: 250/559.3, 250/559.33, 250/559.44, 250/559.4, 250/548
• US Class Current: 250/559.3
• CPC Class Codes: G03F 7/70633 Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching

Abstract

A method for optimizing an alignment condition of a lithographic projection apparatus. This method comprises projecting a beam of radiation on a target portion of a substrate and measuring a plurality of diffracted signals emitted by the target portion. This method further comprises calculating a variance for each of the plurality of diffracted signals, such that a plurality of variances of the diffracted signals is determined, and adjusting the alignment condition of the lithographic projection apparatus based on analysis of the plurality of variances.

Claims

1. A method of position determination, said method comprising:

obtaining a first set of signals, each signal of the first set corresponding to a respective one of a plurality of portions of light received by a detector, wherein the first set is generated by detection of a first beam of light affected by an alignment feature of a substrate;

obtaining one or more additional sets of signals such that each signal in the one or more additional sets corresponds to a respective one of the plurality of portions and each set is generated by detection of a respective one or more additional beams of light affected by the alignment feature of the substrate;

for each portion of light, determining a variance between a corresponding one of the signals in the first set and a corresponding one or more of the signals in the one or more additional sets;

selecting at least one from among the plurality of portions based on a result of said determining a variance; and

supplying or making available signals corresponding to the at least one from among the plurality of portions which was selected, for further analysis and processing to determine a position.

2. The method of position determination according to claim 1, wherein said obtaining a first set and one or more additional sets of signals is based on light diffracted by an alignment feature of the substrate, and wherein the plurality of portions comprise a plurality of diffraction orders of light.

3. The method of position determination according to claim 1, said method further comprising determining a position of the alignment feature based on the selected at least one portion.

4. The method of position determination according to claim 1, wherein said selecting comprises selecting one from among the plurality of portions based on a determination that the variance associated with the selected portion is less than the variances associated with the other portions.

5. The method of position determination according to claim 1, said method further comprising determining a correction based on the at least one selected portion, and determining a position of the alignment feature based on the correction.

6. The method of position determination according to claim 1, said method further comprising projecting a patterned beam of radiation onto a target portion of the substrate that is at least partially covered by a radiation-sensitive material.

7. The method of position determination according to claim 1, said method further comprising, subsequent to determining a position of the alignment feature, projecting a patterned beam of radiation onto a target portion of the substrate.

8. The method of position determination according to claim 1, wherein said selecting includes computing differences between the variances.

9. The method of position determination according to claim 1, wherein said selecting includes computing covariances between pairs of the plurality of signals.

10. The method of position determination according to claim 1, wherein said selecting includes evaluating the following equation for at least two different values of i and j:

var(r_i−

r_j)=var(r_i)+var(r_j)−

2cov(r_i,r_j)

where r_i and r_j denote values of two of the plurality of signals i and j;

var denotes variance; and

cov denotes covariance.

11. The method of position determination according to claim 10, wherein said selecting includes solving a system of equations A x= b, where x denotes a vector having var(r_i) as coordinates and b denotes a vector having var(r_i−

r_j) as coordinates.

12. The method of position determination according to claim 11, wherein said selecting includes solving the system using at least one of a least-squares and a singular value decomposition method.

13. The method of position determination according to claim 1, wherein said selecting includes decomposing at least one of the plurality of signals into a constant and a variable part.

14. The method of position determination according to claim 1, wherein said selecting includes correlating a variance of at least one of the plurality of signals with a location of the alignment feature on the substrate.

15. A lithographic projection apparatus comprising:

an alignment system configured to project an alignment beam onto an alignment feature of a substrate;

a detection system configured to generate a first set of signals based on detection of a first beam of light affected by the alignment feature, wherein each signal of the first set corresponds to a respective one of a plurality of portions of light from the first beam, said detection system being configured to generate one or more additional sets of signals based on detection of one or more additional beams of light affected by the alignment feature, each of the one or more additional beams corresponding to a respective one of the additional sets, wherein each signal in the one or more additional sets corresponds to a respective one of the plurality of portions; and

a processor configured to calculate, for each portion of light, a variance between a corresponding one of the signals in the first set and a corresponding one or more of the signals in the one or more additional sets and configured to select at least one from among the plurality of portions based on the calculated variances.

16. The lithographic projection apparatus according to claim 15, said apparatus further comprising a control system configured to position the substrate based on the at least one selected portion.

17. The lithographic projection apparatus according to claim 15, wherein said detection system is configured to generate the first set and the one or more additional sets of signals based on light diffracted by the alignment feature of the substrate and wherein the plurality of portions comprise a plurality of diffraction orders of light.

18. The lithographic projection apparatus according to claim 15, wherein said processor is configured to determine a position of the alignment feature based on the selected at least one portion.

19. The lithographic projection apparatus according to claim 15, wherein said processor is configured to determine a correction based on the at least one selected portion and to determine a position of the alignment feature based on the correction.

20. The lithographic projection apparatus according to claim 15, wherein said processor is configured to compute differences between the variances.

21. The lithographic projection apparatus according to claim 15, wherein said processor is configured to compute covariances between pairs of the plurality of signals.

22. A lithographic projection apparatus according to claim 15, said apparatus further comprising a plurality of memory units electrically coupled to the processor.

23. A lithographic projection apparatus according to claim 15, said apparatus further comprising a network interface configured to connect the processor to a network.

24. A lithographic projection apparatus according to claim 15, said apparatus further comprising a projection system configured to project a patterned beam of radiation onto a target portion of the substrate that is at least partially covered by a radiation-sensitive material.

25. A computer-readable data storage medium including instructions describing a method of position determination, said method comprising:

obtaining a first set of signals, each signal of the first set corresponding to a respective one of a plurality of portions of light received by a detector, wherein the first set is generated by detection of a first beam of light affected by an alignment feature of a substrate;

obtaining one or more additional sets of signals such that each signal in the one or more additional sets corresponds to a respective one of the plurality of portions and each set is generated by detection of a respective one or more additional beams of light affected by the alignment feature of the substrate;

for each portion of light, determining a variance between a corresponding one of the signals in the first set and a corresponding one or more of the signals in the one or more additional sets;

selecting at least one from among the plurality of portions based on a result of said determining a variance; and

supplying or making available signals corresponding to the at least one from among the plurality of portions which was selected, for further analysis and processing to determine a position.

26. The computer-readable data storage medium according to claim 25, wherein said obtaining a first set and one or more additional sets of signals is based on light diffracted by the alignment feature of the substrate, and wherein the plurality of portions comprise a plurality of diffraction orders of light.

27. The computer-readable data storage medium according to claim 25, said method further comprising determining a position of the alignment feature based on the selected at least one portion.

28. The computer-readable data storage medium according to claim 25, said method further comprising determining a correction based on the at least one selected portion, and determining a position of the alignment feature based on the correction.

29. The computer-readable data storage medium according to claim 25, wherein said selecting includes computing differences between the variances.

30. The computer-readable data storage medium according to claim 25, wherein said selecting includes computing covariances between pairs of the plurality of signals.

31. A processor configured and arranged to perform a method of position determination, said method comprising:

obtaining a first set of signals, each signal of the first set corresponding to a respective one of a plurality of portions of light received by a detector, wherein the first set is generated by detection of a first beam of light affected by an alignment feature of a substrate;

obtaining one or more additional sets of signals such that each signal in the one or more additional sets corresponds to a respective one of the plurality of portions and each set is generated by detection of a respective one or more additional beams of light affected by the alignment feature of the substrate;

for each portion of light, determining a variance between a corresponding one of the signals in the first set and a corresponding one or more of the signals in the one or more additional sets;

selecting at least one from among the plurality of portions based on a result of said determining a variance; and

supplying or making available signals corresponding to the at least one from among the plurality of portions which was selected, for further analysis and processing to determine a position.