Activated water apparatus and methods
First Claim
Patent Images
1. An apparatus comprising:
- a wave generator that produces waves at a radio frequency; and
a processing vessel having a water inlet that subjects a stream of water entering the vesselat the water inlet to the waves for sufficient time to directly produce processedwater with at least one of the following characteristics;
a mean cluster size of lessthan 4 molecules per cluster;
a measured pH of less than 4, a measured pH ofgreater than 10, a measured Oxidation Reduction Potential (ORP) of lessthan-350 mV, and a measured ORP of greater than +800 mV; and
including a control portion that directs a first portion of the processed water to exit a firstoutlet of the vessel at the pH of less than 4, and a second portion of the processedwater to exit a second outlet of the vessel at the measured pH of greater than 10.
4 Assignments
0 Petitions
Accused Products
Abstract
An apparatus subjects water to waves from an RF plasma. This allows continuous production of “activated water” characterized by cluster sizes below about 4 molecules per cluster, water having pH below 4 or above 10, or water having ORP of less than −350 mV or more than +800 mV. The basic frequency of the plasma is preferably between 0.44 MHz and 40.68 MHz, and the plasma is preferably modulated at a frequency between 10 kHz and 34 kHz. Flow rates typically range from 20 l/hr to about 2000 l/hr. Activated water can be used for many purposes, including antimicrobial cleaning of worktable, floor, wall, knife, transport and other surfaces, for example, in meat processing facilities and hospitals.
-
Citations
7 Claims
-
1. An apparatus comprising:
-
a wave generator that produces waves at a radio frequency; and a processing vessel having a water inlet that subjects a stream of water entering the vessel at the water inlet to the waves for sufficient time to directly produce processed water with at least one of the following characteristics;
a mean cluster size of lessthan 4 molecules per cluster;
a measured pH of less than 4, a measured pH ofgreater than 10, a measured Oxidation Reduction Potential (ORP) of less than-350 mV, and a measured ORP of greater than +800 mV; and including a control portion that directs a first portion of the processed water to exit a first outlet of the vessel at the pH of less than 4, and a second portion of the processed water to exit a second outlet of the vessel at the measured pH of greater than 10. - View Dependent Claims (2, 3, 4, 5, 6, 7)
-
Specification