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Optimized polarization illumination

  • US 7,292,315 B2
  • Filed: 08/20/2004
  • Issued: 11/06/2007
  • Est. Priority Date: 12/19/2003
  • Status: Expired due to Fees
First Claim
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1. A method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate, comprising the steps of:

  • (a) determining an illumination intensity for at least one point on an illuminator for at least two polarization states;

    (b) determining an image log slope (ILS) for the at least one point on the illuminator for the at least two polarization states;

    (c) determining a maximum point where the ILS is at least near zero for the at least one point on the illuminator; and

    (d) selecting an optimal polarization state for the maximum ILS for the at least one point on the illuminator for optimizing a resolution of the pattern to be formed in the surface of the substrate.

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