Method for determining a map, device manufacturing method, and lithographic apparatus

• US 7,292,351 B2
• Filed: 12/16/2004
• Issued: 11/06/2007
• Est. Priority Date: 12/17/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Brinkhof, Ralph, Van Alphen, Erwin Antonius Martinus, Stoeten, Jan, Schoonewelle, Hielke, De Nivelle, Martin Jules Marie-Emile, Boonman, Marcus Emile Joannes
• Primary Examiner(s): Chowdhury; Tarifur
• Assistant Examiner(s): Akanbi; Isiaka O
• Application Number:
  US11/013,202
• Publication Number:
  US 20050186483A1
• Time in Patent Office: 1,055 Days
• Field of Search: 356399-401, 356/237.4, 356/237.1, 355 53- 54, 250/548
• US Class Current: 356/601
• CPC Class Codes: G03F 9/7011 Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
• CPC Class Codes: G03F 9/7019 Calibration
• CPC Class Codes: G03F 9/7034 Leveling

Abstract

A method according to one embodiment of the invention includes determining a map of a second part of a substrate belonging to a group of substrates. The method includes measuring a first part of at least one substrate belonging to the group to create an average profile map or average height map and computing a map of the second part of the substrate belonging to the group, based on the average profile map or the average height map. The computed map is stored for use during a later determination of a height or tilt of a substrate from the group.

Claims

1. A method of determining a map of a surface, said method comprising:

measuring a first part of a substrate belonging to a group of substrates;

based on a result of said measuring, computing a map of a second part of at least one substrate belonging to the group of substrates, the first part partially overlapping with the second part; and

storing the map in a machine-readable memory or making available the map for use.

2. The method of determining a map according to claim 1, said method further comprising determining, based on the map, at least one of a height and a tilt of at least one of the substrate and another substrate belonging to the group.

3. The method of determining a map according to claim 2, said method further comprising measuring at least one of a height and a tilt of the at least one of the substrate and another substrate belonging to the group,

wherein said determining includes correcting a result of said measuring at least one of a height and a tilt.

4. The method of determining a map according to claim 2, wherein during said measuring, the substrate is positioned on a chuck, and

wherein during said determining, the at least one of the substrate and another substrate is positioned on at least one of the chuck and a second chuck similar to the chuck.

5. The method of determining a map according to claim 4, wherein during said measuring, the substrate is clamped to the chuck by a clamping mechanism, and

wherein during said determining, the at least one of the substrate and another substrate is clamped to at least one of the chuck and the second chuck by at least one of the clamping mechanism and a second clamping mechanism similar to the clamping mechanism.

6. The method of determining a map according to claim 2, wherein during said measuring, the substrate is positioned on a substrate table, and

wherein during said determining, the at least one of the substrate and another substrate is positioned on at least one of the substrate table and a second substrate table similar to the substrate table.

7. The method of determining a map according to claim 2, said method further comprising:

projecting a patterned beam of radiation onto a target portion of the at least one of the substrate and another substrate belonging to the group.

8. The method of determining a map according to claim 7, wherein said determining includes extrapolating the at least one of a height and a tilt based on the map.

9. The method of determining a map according to claim 7, said method further comprising using a sensor to measure at least one of a height and a tilt of the at least one of the substrate and another substrate belonging to the group.

10. The method of determining a map according to claim 9, wherein the sensor is a multi-spot sensor.

11. The method of determining a map according to claim 1, said method further comprising storing the result of said measuring.

12. The method of determining a map according to claim 1, wherein the second part includes a strip along an edge of the substrate.

13. The method of determining a map according to claim 1, wherein said measuring includes measuring along a line perpendicular to an edge of the substrate.

14. The method of determining a map according to claim 1, wherein said measuring includes measuring along a line that is at least one among perpendicular to and parallel to a scan direction during exposure of the substrate.

15. The method of determining a map according to claim 1, wherein the first part includes a strip along an edge of the substrate.

16. The method of determining a map according to claim 1, wherein said measuring includes using a single spot level sensor.

17. The method of determining a map according to claim 1, wherein the map is an average height map.

18. The method of determining a map according to claim 1, wherein the map is an average profile map.

27. The method of determining a map according to claim 1, wherein the first part of the substrate belonging to the group and the second part of the at least one substrate belonging to the group correspond to a same substrate.

28. The method of determining a map according to claim 1, wherein the first part of the substrate belonging to the group and the second part of the at least one substrate belonging to the group correspond to different substrates.

19. An apparatus comprising:

a sensor configured to measure a first part of a substrate belonging to a group of substrates; and

a processing unit configured to compute, based on a result of said measuring, a map of a second part of at least one substrate belonging .to the group of substrates, the first part partially overlapping with the second part.

20. The apparatus according to claim 19, said apparatus further comprising a memory unit configured to store the map.

21. The apparatus according to claim 19, wherein the processing unit is configured to determine, based on the map, at least one of a height and a tilt for at least one of the substrate and another substrate belonging to the group.

22. The apparatus according to claim 21, said apparatus further comprising a projection system configured to project a patterned beam of radiation onto a target portion of the at least one of the substrate and another substrate belonging to the group.

23. A method of determining a map of a surface, said method comprising:

measuring a first part of a substrate belonging to a group of substrates;

storing a result of said measuring;

based on the result of said measuring, computing a map of at least one of a second part of at least one substrate belonging to the group of substrates and a part of another substrate belonging to the group, the first part partially overlapping with the second part; and

storing the map in a machine-readable memory or making available the map for use.

24. The method of determining a map according to claim 23, wherein said computing a map is performed during determining at least one of a height and a tilt of at least one of the substrate and another substrate belonging to the group.

25. An apparatus comprising:

a sensor configured to measure a first part of a substrate belonging to a group of substrates;

a memory unit configured to store a result of said measuring; and

a processing unit configured to compute, based on the result of said measuring, a map of at least one of a second part of at least one substrate and a part of another substrate belonging to the group, the first part partially overlapping with the second part.

26. The apparatus according to claim 25, wherein said processing unit is configured to determine at least one of a height and a tilt of at least one of the substrate and another substrate belonging to the group, and

wherein said processing unit is configured to compute the map during said determining.

measuring a first part of a substrate supported by a structure;

storing a result of said measuring;

computing a map of at least a part of the structure, wherein the map includes an average profile map; and

storing the map in a machine-readable memory or making available the map for use.

29. A method of extrapolating a profile map associated with a surface of a substrate, said method comprising:

measuring a first part of the substrate belonging to a group of substrates;

determining an average profile map based at least on the measurement of the first part of the substrate;

computing, based on values of the average profile map, the profile map for a second part of at least one substrate that belongs to the group of substrates, wherein the first part is located adjacent to the second part; and

storing the profile map for the second part in a machine-readable memory or making available the profile map for the second part for use.

30. The method according to claim 29, wherein the average profile map is determined based on stored data.

31. The method according to claim 29, wherein the average profile data is determined before the substrate belonging to the group of substrates is processed.

32. The method according to claim 29, wherein the average profile data is determined while the substrate belonging to the group of substrates is processed.

33. The method according to claim 29, wherein the first part of the substrate belonging to the group and the second part of the at least one substrate belonging to the group correspond to a same substrate.

34. The method according to claim 29, wherein the first part of the substrate belonging to the group and the second part of the at least one substrate belonging to the group correspond to different substrates.