Lithographic apparatus, device manufacturing method, and device manufactured thereby
First Claim
1. A lithographic apparatus, comprising:
- a substrate holder configured to hold a substrate;
an illuminator configured to condition a beam of radiation;
a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation;
a projection system configured to project the patterned beam onto a target portion of the substrate; and
a selection system configured to select one out of at least two different operational modes of the lithographic apparatus,wherein a first operational mode is associated with performing a process within a first time period at a first level of accuracy and a second operational mode is associated with performing the process within a second time period at a second level of accuracy, andwherein the first time period is shorter than the second time period and the first level of accuracy is lower than the second level of accuracy.
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Accused Products
Abstract
A lithographic apparatus is presented that provides versatile processing time and accuracy selection. The apparatus includes a substrate holder configured to hold a substrate; a radiation system configured to condition a beam of radiation; a support structure configured to support a patterning device that imparts a desired pattern onto the beam of radiation; a projection system that projects the patterned beam onto a target portion of the substrate; and a selection system that selects one out of at least two different operational modes of the lithographic apparatus. The first operational mode is associated with performing a process within a first time period at a first level of accuracy and a second operational mode is associated with performing the process within a second time period at a second level of accuracy. The first time period is shorter than the second time period and the first level of accuracy is lower than the second level of accuracy.
8 Citations
24 Claims
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1. A lithographic apparatus, comprising:
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a substrate holder configured to hold a substrate; an illuminator configured to condition a beam of radiation; a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation; a projection system configured to project the patterned beam onto a target portion of the substrate; and a selection system configured to select one out of at least two different operational modes of the lithographic apparatus, wherein a first operational mode is associated with performing a process within a first time period at a first level of accuracy and a second operational mode is associated with performing the process within a second time period at a second level of accuracy, and wherein the first time period is shorter than the second time period and the first level of accuracy is lower than the second level of accuracy. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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23. A device manufacturing method, comprising:
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providing a substrate that is at least partially covered by a layer of radiation-sensitive material; conditioning a beam of radiation; applying a patterning device to configure the conditioned beam of radiation with a desired pattern in its cross-section; projecting the patterned beam of radiation onto a target portion of the substrate; and selecting one out of at least two different operational modes, wherein a first operational mode is associated with performing a process within a first time period at a first level of accuracy and a second operational mode is associated with performing the process within a second time period at a second level of accuracy, and wherein the first time period is shorter than the second time period and the first level of accuracy is lower than the second level of accuracy. - View Dependent Claims (24)
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Specification
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- Resources
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Current AssigneeASML Netherlands BV (ASML Holding NV)
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Original AssigneeASML Netherlands BV (ASML Holding NV)
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InventorsVan Den Biggelaar, Petrus Marinus Christianus
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Primary Examiner(s)Berman; Jack I.
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Assistant Examiner(s)Hashmi; Zia R.
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Application NumberUS10/894,368Publication NumberTime in Patent Office1,211 DaysField of SearchNoneUS Class Current250/492.2CPC Class CodesG03F 7/70466 Multiple exposures, e.g. co...G03F 7/70533 Controlling abnormal operat...
