Interferometric optical assemblies and systems including interferometric optical assemblies

• US 7,298,493 B2
• Filed: 06/30/2005
• Issued: 11/20/2007
• Est. Priority Date: 06/30/2004
• Status: Active Grant

• Current Assignee: Zygo Corporation (Ametek Incorporated)
• Original Assignee: Zygo Corporation (Ametek Incorporated)
• Inventors: Ranalli, Eliseo Romolo
• Primary Examiner(s): LEE, HWA S
• Application Number:
  US11/170,936
• Publication Number:
  US 20060001887A1
• Time in Patent Office: 873 Days
• Field of Search: 356/487, 356491-495, 356/482
• US Class Current: 356/493
• CPC Class Codes: G01B 2290/70 Using polarization in the interferometer
• CPC Class Codes: G01B 9/02007 Two or more frequencies or sources used for interferometric measurement using only beat G01B9/02003
• CPC Class Codes: G01B 9/02027 Two or more interferometric channels or interferometers
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position

Abstract

In general, in one aspect, the invention features assemblies that include a first polarizing beam splitter positioned in the paths of a pair of initial beams, the polarizing beam splitter being configured to combine the pair of initial beams to form an input beam. The assemblies further include an interferometer positioned to receive the input beam and configured to produce an output beam that includes information about an optical path difference between the paths of two component beams derived from the input beam. A second polarizing beam splitter is positioned in the path of the output beam and configured to split the output beam into a pair of secondary output beams that each include information about the optical path difference between the component beam paths.

Claims

1. An assembly, comprising:

a first polarizing beam splitter positioned in the paths of a pair of initial beams, the polarizing beam splitter being configured to combine the pair of initial beams to form an input beam;

an interferometer positioned to receive the input beam and configured to produce an output beam that comprises information about an optical path difference between the paths of two component beams derived from the input beam; and

a second polarizing beam splitter positioned in the path of the output beam and configured to split the output beam into a pair of secondary output beams that each comprise information about the optical path difference between the component beam paths;

wherein the first and second polarizing beam splitters each comprise a respective Wollaston prism.

2. The assembly of claim 1, wherein the interferometer is configured so that a first of the component beams has a first polarization state and a second component beam has a second polarization state substantially orthogonal to the first polarization state.

3. The assembly of claim 2, wherein the second polarizing beam splitter is configured so that the secondary output beams each comprise a portion of the first and second polarization states.

4. The assembly of claim 3, wherein the secondary output beams each comprise a substantially equal portion of the first and second polarization states.

5. The assembly of claim 2, wherein the pair of initial beams are polarized substantially orthogonally to each other.

6. The assembly of claim 5, wherein one of the initial beams has the first polarization state and the other initial beam has the second polarization state.

7. The assembly of claim 2, wherein the first and second polarizing beam splitters each comprise a pair of orthogonal principle axes and the orientation of the principle axes of the first polarizing beam splitter are substantially parallel to the first and second respective polarization states in the input beam while the orientation of the principle axes of the second polarizing beam splitter are substantially non-parallel to the first and second respective polarization states in the output beam.

8. The assembly of claim 7, wherein the principle axes of the second polarizing beam splitter are oriented at about 45°

with respect to the first polarization state in the output beam.

9. The assembly of claim 1, wherein the propagation directions of both of the secondary output beams are different from the propagation direction of the output beam.

10. The assembly of claim 9, wherein the paths of the pair of secondary output beams diverge at an angle of about 45°

or less.

11. The assembly of claim 1, wherein the information about the optical path difference included in each secondary output beam includes an interferometric phase where the interferometric phases of the secondary output beams have a phase difference of about π

.

12. The assembly of claim 1, further comprising a lens positioned to collimate the initial beams and direct them towards the first polarizing beam splitter.

13. The assembly of claim 12, further comprising a light source configured provide the initial beams to the lens.

14. The assembly of claim 13, further comprising a pair of optical waveguides each positioned to receive a respective polarization component of light emitted from the light source and deliver that component to the lens as one of the initial beams.

15. The assembly of claim 14, wherein an end of each of the optical waveguides is positioned in a focal plane of the lens.

16. The assembly of claim 13, wherein the light source is a homodyne light source.

17. The assembly of claim 13, wherein the light source is a heterodyne light source.

18. The assembly of claim 1, further comprising a lens positioned to receive the pair of secondary output beams and configured to focus the secondary output beams to respective foci.

19. The assembly of claim 18, further comprising a pair of optical waveguides being positioned relative to the lens to respectively receive one of the focused secondary output beams.

20. The assembly of claim 1, wherein the interferometer is a single pass interferometer.

21. The assembly of claim 1, wherein the interferometer is a multiple pass interferometer.

22. The assembly of claim 1, wherein the path of one of the component beams contacts a measurement object remote from the interferometer.

23. The assembly of claim 22, further comprising an electronic controller configured to determine information about the measurement object based on the intensities of the secondary output beams.

24. The assembly of claim 23, wherein the electronic controller determines information based on a difference between the intensities of the secondary output beams.

25. A lithography system for use in fabricating integrated circuits on a wafer, the system comprising:

a stage for supporting the wafer;

an illumination system for imaging spatially patterned radiation onto the wafer;

a positioning system for adjusting the position of the stage relative to the imaged radiation; and

an interferometry system comprising the assembly of claim 1 for monitoring the position of the wafer relative to the imaged radiation.

26. A lithography system for use in fabricating integrated circuits on a wafer, the system comprising:

a stage for supporting the wafer; and

an illumination system including a radiation source, a mask, a positioning system, a lens assembly, and an interferometry system comprising the assembly of claim 1,

wherein during operation the source directs radiation through the mask to produce spatially patterned radiation, the positioning system adjusts the position of the mask relative to the radiation from the source, the lens assembly images the spatially patterned radiation onto the wafer, and the interferometry system monitors the position of the mask relative to the radiation from the source.

27. A beam writing system for use in fabricating a lithography mask, the system comprising:

a source providing a write beam to pattern a substrate;

a stage supporting the substrate;

a beam directing assembly for delivering the write beam to the substrate;

a positioning system for positioning the stage and beam directing assembly relative one another; and

an interferometry system comprising the assembly of claim 1 for monitoring the position of the stage relative to the beam directing assembly.

28. A method for fabricating integrated circuits, the method comprising:

applying a resist to a wafer;

forming a pattern of a mask in the resist by exposing the wafer to radiation using the lithography system of claim 25; and

producing an integrated circuit from the wafer.

29. A method for fabricating integrated circuits, the method comprising:

applying a resist to a wafer;

forming a pattern of a mask in the resist by exposing the wafer to radiation using the lithography system of claim 26; and

producing an integrated circuit from the wafer.

30. A method for fabricating integrated circuits, the method comprising:

applying a resist to a wafer;

forming a pattern of a mask in the resist by exposing the wafer to radiation using the lithography system of claim 27; and

producing an integrated circuit from the wafer.

31. A method for fabricating a lithography mask, the method comprising:

directing a write beam to a substrate to pattern the substrate;

positioning the substrate relative to the write beam;

monitoring the position of the substrate relative to the write beam using an interferometry system comprising the assembly of claim 1; and

adjusting the relative position between the substrate and the write beam based on the monitored position.