Method of making an integrated inductor
First Claim
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1. A method comprising:
- forming a first dielectric layer over a substrate comprising a semiconductor material;
forming a conductor over the first dielectric layer;
forming a second dielectric layer directly on the conductor;
forming a magnetic layer over the second dielectric layer;
patterning the first dielectric layer to define one or more trenches such that the conductor defines a signal path along the one or more trenches; and
patterning the magnetic layer to define at least one slot.
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Abstract
An inductor comprises a substrate comprising a semiconductor material, a first dielectric layer over the substrate, a magnetic layer over the first dielectric layer, a second dielectric layer over the magnetic layer, and a conductor over the second dielectric layer.
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Citations
4 Claims
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1. A method comprising:
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forming a first dielectric layer over a substrate comprising a semiconductor material; forming a conductor over the first dielectric layer; forming a second dielectric layer directly on the conductor; forming a magnetic layer over the second dielectric layer; patterning the first dielectric layer to define one or more trenches such that the conductor defines a signal path along the one or more trenches; and patterning the magnetic layer to define at least one slot. - View Dependent Claims (2, 3, 4)
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Specification