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Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices

  • US 7,301,605 B2
  • Filed: 01/26/2001
  • Issued: 11/27/2007
  • Est. Priority Date: 03/03/2000
  • Status: Expired due to Fees
First Claim
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1. A catadioptric optical system forming a reduced image of a first surface onto a second surface comprising:

  • a first imaging optical subsystem which is arranged in an optical path between the first surface and the second surface and includes a dioptric imaging optical system to form a first intermediate image of the first surface;

    a first folding mirror which is arranged in the vicinity of a position of forming the first intermediate image to deflect a beam prior to or after the position where the first intermediate image is formed;

    a second imaging optical subsystem which is arranged in an optical path between the first folding mirror and the second surface and which forms a second intermediate image with a magnification factor nearly equal to the first intermediate image in the vicinity of a position of forming the first intermediate image based on the beam from the first intermediate image, the second imaging optical subsystem includes a concave reflecting mirror and at least one negative lens;

    a second folding mirror which is arranged in the vicinity of a position of forming the first intermediate image to deflect a beam prior to or after the position where the second intermediate image is formed; and

    a third imaging optical subsystem which is arranged in an optical path between the second imaging optical subsystem and the second surface and includes a dioptric imaging optical system to form the reduced image onto the second surface based on the beam from the second intermediate image,wherein the catadioptric optical system is a telecentric optical system on both sides of the first surface and the second surface.

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