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Gas supplying apparatus

  • US 7,303,141 B2
  • Filed: 03/17/2004
  • Issued: 12/04/2007
  • Est. Priority Date: 04/09/2003
  • Status: Expired due to Fees
First Claim
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1. A gas supplying apparatus for supplying deposition gas onto a substrate surface, the gas supplying apparatus comprising:

  • a gas supplying ring with a plurality of gas supplying channels formed along the interior of the gas supplying ring and with a plurality of gas distribution channels directed toward a center of the gas supplying ring; and

    a plurality of adapters with gas nozzles to respectively connect to at least one of the gas distribution channels, the adapters detachably connected to the interior of the gas supplying ring;

    wherein the gas nozzles have a variety of injection configurations; and

    each of the adapters are selectively connectable to more than one of the gas distribution channels while connected to the gas supplying ring.

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