Gas supplying apparatus
First Claim
Patent Images
1. A gas supplying apparatus for supplying deposition gas onto a substrate surface, the gas supplying apparatus comprising:
- a gas supplying ring with a plurality of gas supplying channels formed along the interior of the gas supplying ring and with a plurality of gas distribution channels directed toward a center of the gas supplying ring; and
a plurality of adapters with gas nozzles to respectively connect to at least one of the gas distribution channels, the adapters detachably connected to the interior of the gas supplying ring;
wherein the gas nozzles have a variety of injection configurations; and
each of the adapters are selectively connectable to more than one of the gas distribution channels while connected to the gas supplying ring.
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Abstract
A gas supplying apparatus for supplying deposition gas onto a substrate surface, the gas supplying apparatus comprising: a gas supplying ring with one or more gas supplying channels formed along the interior of the gas supplying ring and with a plurality of gas distribution channels directed toward a center of the gas supplying ring; and a plurality of adapters with gas nozzles connecting to the gas distribution channels, respectively, that detachably connect to the interior of the gas supplying ring, wherein the gas nozzles have a variety of injection configurations.
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Citations
31 Claims
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1. A gas supplying apparatus for supplying deposition gas onto a substrate surface, the gas supplying apparatus comprising:
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a gas supplying ring with a plurality of gas supplying channels formed along the interior of the gas supplying ring and with a plurality of gas distribution channels directed toward a center of the gas supplying ring; and a plurality of adapters with gas nozzles to respectively connect to at least one of the gas distribution channels, the adapters detachably connected to the interior of the gas supplying ring; wherein the gas nozzles have a variety of injection configurations; and each of the adapters are selectively connectable to more than one of the gas distribution channels while connected to the gas supplying ring. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27)
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28. A gas supplying apparatus for supplying gas onto a substrate, comprising:
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a gas supplying ring comprising; a gas supplying channel formed in an interior of the gas supplying ring, and a plurality of gas distribution channels connecting to the gas supplying channel and extending toward a center of the gas supplying ring; a plurality of adapters with gas nozzles to respectively connect to at least one of the gas distribution channels, the adapters detachably connected to the gas supplying ring so as to be selectively connectable to more than one of the gas distribution channels; and a plurality of supplemental gas nozzles detachably connected to the gas nozzles of the adapters, respectively, at various injection angles.
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29. A method of supplying gas to a substrate using a gas supplying apparatus, the gas supplying apparatus having a gas supplying ring with a first gas distribution channel and a second gas distribution channel, detachable adapters with gas nozzles having various injection positions and injection angles with respect to the adapters, the gas nozzles connecting to the first gas distribution channel and the second gas distribution channel, the method comprising:
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blocking one of the first gas distribution channel and the second gas distribution channel; determining a desired gas nozzle injection position and injection angle according to a type of the substrate; selecting ones of the adapters according to the desired gas nozzle injection position and injection angle; attaching the selected adapters to the gas ring; and injecting gas toward the substrate through the selected adapters according to the desired gas nozzle injection position and injection angle.
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30. A gas supplying apparatus to supply deposition gas onto a substrate surface, the gas supplying apparatus comprising:
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a gas supplying ring with a plurality of gas supplying channels formed along the interior of the gas supplying ring and with a plurality of gas distribution channels directed toward a center of the gas supplying ring; a plurality of adapters with gas nozzles connecting to the gas distribution channels, respectively, that detachably connect to the interior of the gas supplying ring; and a blocking device selectively blocking the gas distribution channels; wherein the gas nozzles have a variety of injection configurations; and the blocking device comprises a plurality of blocking members that are selectively inserted into the plurality of gas distribution channels, respectively, to block the selected gas distribution channels.
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31. A gas supplying apparatus to supply deposition gas onto a substrate surface, the gas supplying apparatus comprising:
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a gas supplying ring with a plurality of gas distribution channels directed toward a center of the gas supplying ring; and a plurality of adapters with gas nozzles detachably connected to the gas supplying ring to respectively connect to at least one of the gas distribution channels; wherein at least one of the adapters is selectively connectable to more than one of the gas distribution channels while connected to the gas supplying ring.
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Specification