Cleaning compositions comprising an organosilicone quaternary ammonium compound

• US 7,304,022 B2
• Filed: 10/29/2004
• Issued: 12/04/2007
• Est. Priority Date: 11/01/2003
• Status: Expired due to Fees

• Current Assignee: Reckitt Benckiser LLC (Reckitt Benckiser Group PLC)
• Original Assignee: Reckitt Benckiser Incorporated (Reckitt Benckiser Group PLC)
• Inventors: Cheung, Tak Wai, Fu, Edward
• Primary Examiner(s): BOYER, CHARLES I
• Application Number:
  US10/577,093
• Publication Number:
  US 20060281662A1
• Time in Patent Office: 1,131 Days
• Field of Search: 510/191, 510/199, 510/466, 510/228, 510/235, 510/238, 510/253, 510/382, 510/384, 510/391, 510/424, 510/426, 510/427, 510/434, 510/473, 510/477, 510/490
• US Class Current: 510/191
• CPC Class Codes: A01N 2300/00 Combinations or mixtures of active ingredients covered by classes A01N27/00 - A01N65/48 with other active or formulation relevant ingredients, e.g. specific carrier materials or surfactants, covered by classes A01N25/00 - A01N65/48
• CPC Class Codes: A01N 33/12 Quaternary ammonium compounds
• CPC Class Codes: A01N 37/36 containing at least one carboxylic group or a thio analogue, or a derivative thereof, and a singly bound oxygen or sulfur atom attached to the same carbon skeleton, this oxygen or sulfur atom not being a member of a carboxylic group or of a thio analogue, or of a derivative thereof, e.g. hydroxy-carboxylic acids
• CPC Class Codes: A01N 55/00 Biocides, pest repellants or attractants, or plant growth regulators, containing organic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen and sulfur containing organo-phosphorus compounds A01N57/00
• CPC Class Codes: C11D 1/62 Quaternary ammonium compounds
• CPC Class Codes: C11D 1/72 Ethers of polyoxyalkylene glycols
• CPC Class Codes: C11D 1/835 Mixtures of non-ionic with cationic compounds
• CPC Class Codes: C11D 17/003 Colloidal solutions, e.g. gels; Thixotropic solutions or pastes
• CPC Class Codes: C11D 3/2075 Carboxylic acids-salts thereof
• CPC Class Codes: C11D 3/2082 Polycarboxylic acids-salts thereof
• CPC Class Codes: C11D 3/2086 Hydroxy carboxylic acids-salts thereof
• CPC Class Codes: C11D 3/225 etherified, e.g. CMC
• CPC Class Codes: C11D 3/3742 Nitrogen containing silicones
• CPC Class Codes: C11D 3/48 Medical, disinfecting agents, disinfecting, antibacterial, germicidal or antimicrobial compositions

Abstract

Thickened acidic film forming hard surface cleaning and disinfecting compositions which are particularly useful in the cleaning of ceramic surfaces, especially lavatory surfaces.

Claims

1. Thickened aqueous acidic hard surface cleaning and disinfecting composition with film forming properties which comprises:

0.1-10% wt. of one or more nonionic surfactants;

0.1-3% wt. of one or more quaternary ammonium surfactant compounds having germicidal properties;

0.1-15% wt. of an acid constituent based on one or more water soluble organic acids, particularly water soluble organic acids selected from the group consisting of formic acid, citric acid, mixtures of formic acid with citric acid, and oxalic acid;

0.1-5% wt. of a cellulose based thickening composition;

0.01-5% wt. of a film-forming, organosilicone quaternary ammonium compound;

up to 10% wt. of one or more of a pH adjusting agent, fragrance/perfume, or coloring agent;

optionally, one or more further conventional constituents selected from the group consisting of pH buffering agents, perfume carriers, hydrotropes, additional germicides, fungicides, anti-oxidants, and anti-corrosion agents;

and, water.

2. The composition according to claim 1 wherein the acid constituent consists solely of oxalic acid.

3. The composition according to claim 1 wherein the acid constituent consists solely of a mixture of citric acid and formic acid.

4. The composition according to claim 1 wherein the one or more nonionic surfactants are linear primary alcohol ethoxylates.

5. A composition according to claim 1 wherein the organosilicone quaternary ammonium compounds are those which may be represented by the following structural representation:

6. A composition according to claim 1 wherein the composition exhibits a pH of less than about 4.5.

13. A method for cleaning and disinfecting hard surfaces, preferably metal, enamel and porcelain surfaces as found on lavatory fixtures, which method comprises the step of:

applying a cleaning and/or disinfecting effective amount of the compositions according to claim 1 to a surface in need of treatment.

14. A method for providing a residual film on surfaces which aids in limiting or preventing further limescale deposition on such hard surfaces, which method includes step of:

composition according to claim 1.

7. Thickened aqueous acidic hard surface cleaning and disinfecting composition with film forming properties which consists essentially of:

0.1-10% wt. of one or more nonionic surfactants;

0.1-3% wt. of one or more quaternary ammonium surfactant compounds having germicidal properties;

0.1-15% wt. of an acid constituent based on one or more water soluble organic acids, particularly water soluble organic acids selected from the group consisting of formic acid, citric acid, mixtures of formic acid with citric acid, and oxalic acid;

0.1-5% wt. of a cellulose based thickening composition;

0.01-5% wt. of a film-forming, organosilicone quaternary ammonium compound;

up to 10% wt. of one or more of a pH adjusting agent, fragrance/perfume, or coloring agent;

optionally, one or more further conventional constituents selected from the group consisting of pH buffering agents, perfume carriers, hydrotropes, additional germicides, fungicides, anti-oxidants, and anti-corrosion agents;

and, water.

8. A composition according to claim 7 wherein the one or more water soluble organic acids are selected from the group consisting of:

formic acid, citric acid, mixtures of formic acid with citric acid, and oxalic acid.

9. The composition according to claim 7 wherein the acid constituent consists solely of oxalic acid.

10. The composition according to claim 7 wherein the acid constituent consists solely of a mixture of citric acid and formic acid.

11. A composition according to claim 7 wherein the organosilicone quaternary ammonium compounds are those which may be represented by the following structural representation:

12. A composition according to claim 7 wherein the composition exhibits a pH of less than about 4.5.