Method and apparatus for preventing instabilities in radio-frequency plasma processing
First Claim
Patent Images
1. An RF power supply for providing power to a dynamic load, comprising:
- a power circuit for converting an input power to output RF power, the circuit having low stored energy;
a control circuit providing a control signal to the power circuit to regulate an input power consumption by the RF power supply;
a first circuit for providing a measurement of an input power to the RF power supply that is used to adjust the control signal to the power circuit at a first rate, such that the input power is substantially constant; and
a second circuit for measuring an output power at an output of the RF power supply that is used to compensate the power control signal to the RF power supply at a second rate, wherein the first rate is greater than the second rate.
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Abstract
A method and apparatus for controlling a power supply to prevent instabilities due to dynamic loads in RF plasma processing systems, operating at frequencies of from 1 MHz and up, uses a feedforward type of control loop to tightly regulate the power supplied to the dynamic electrical load, such as loads caused by variable and inconsistent plasma impedance. A feedback control loop can also be used in combination with the feedforward loop, but at a slower rate, to help regulate the amount of power provided to the load.
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Citations
57 Claims
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1. An RF power supply for providing power to a dynamic load, comprising:
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a power circuit for converting an input power to output RF power, the circuit having low stored energy; a control circuit providing a control signal to the power circuit to regulate an input power consumption by the RF power supply; a first circuit for providing a measurement of an input power to the RF power supply that is used to adjust the control signal to the power circuit at a first rate, such that the input power is substantially constant; and a second circuit for measuring an output power at an output of the RF power supply that is used to compensate the power control signal to the RF power supply at a second rate, wherein the first rate is greater than the second rate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. An RF power supply for providing power to a variable-impedance load, comprising:
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a control circuit providing a control signal to the RF power supply to regulate a power output level from the RF power supply; a first circuit for providing a measurement of an input power to the RF power supply that is used to adjust the control signal at a first rate to maintain substantially constant input power; and a second circuit for measuring an output power at an output of the RF power supply that is used to compensate the power control signal to the RF power supply at a second rate, wherein the first rate is greater than the second rate. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27)
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28. An RF plasma generator comprising:
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an power source; and an AC switching power supply receiving power from the source comprising; a control circuit providing a control signal to the power supply to regulate a power output level from the power supply; a first circuit for providing a measurement of an input power to the power supply that is used to adjust the control signal to the power supply at a first rate to maintain substantially constant input power; and a second circuit for measuring an output power at an output of the power supply that is used to compensate the control signal to the power supply at a second rate, wherein the first rate is greater than the second rate, wherein an ouput of the switching power supply provides power to an RF generation section. - View Dependent Claims (29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41)
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42. A method of regulating power to a variable-impedance load, comprising the steps of:
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providing a control circuit that provides a control signal to an switching power supply to regulate a power output level from an RF generator; adjusting the control signal to the switching power supply at a first rate based on a first power measured at an input side of the switching power supply; compensating the control signal to the switching power supply at a second rate based on a second power measured at an output side of the RF generator, wherein the first rate is greater than the second rate. - View Dependent Claims (43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57)
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Specification