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Method and apparatus for preventing instabilities in radio-frequency plasma processing

  • US 7,304,438 B2
  • Filed: 09/22/2004
  • Issued: 12/04/2007
  • Est. Priority Date: 09/22/2003
  • Status: Active Grant
First Claim
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1. An RF power supply for providing power to a dynamic load, comprising:

  • a power circuit for converting an input power to output RF power, the circuit having low stored energy;

    a control circuit providing a control signal to the power circuit to regulate an input power consumption by the RF power supply;

    a first circuit for providing a measurement of an input power to the RF power supply that is used to adjust the control signal to the power circuit at a first rate, such that the input power is substantially constant; and

    a second circuit for measuring an output power at an output of the RF power supply that is used to compensate the power control signal to the RF power supply at a second rate, wherein the first rate is greater than the second rate.

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