Lithographic apparatus and device manufacturing method

• US 7,304,718 B2
• Filed: 08/17/2004
• Issued: 12/04/2007
• Est. Priority Date: 08/17/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Baselmans, Johannes Jacobus Matheus, Bleeker, Arno Jan, De Jager, Pieter Willem Herman, Troost, Kars Zeger
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US10/919,530
• Publication Number:
  US 20060038969A1
• Time in Patent Office: 1,204 Days
• Field of Search: 355/53, 355/67, 355/77, 355/55, 359291-292, 245/85
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70383 Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams maskless lithography using a programmable mask G03F7/70291

Abstract

An array of individually controllable elements, comprising a plurality of control areas consisting of a plurality of rows of reflectors. Alternate rows of reflectors are actuated in a common manner such that the control areas function as a grating to provide a control element that can be used as a diffractive optical element.

Claims

1. A lithographic apparatus, comprising:

an illumination system that supplies a beam of radiation;

an array of reflectors that pattern the beam, each reflector having an associated actuator that positions the reflector, and the array of reflectors having a plurality of control areas that each comprise a plurality of rows of the reflectors;

a controller that provides control signals to the control areas, such that, on the basis of said control signals, alternate rows of reflectors in each of the plurality of control areas are set to a first common position and the remaining rows of reflectors in the plurality of control areas are set to a second common position, wherein for any given control area, said control signals control said given control area, without controlling any single reflector in said given control area independently of remaining reflectors in said given control area, and said first and second common positions are designated by said control signals from among three or more possible positions that correspond to a sequence of gray states; and

a projection system that projects the patterned beam onto a target portion of a substrate.

2. The lithographic apparatus of claim 1, wherein each of the plurality of control areas comprise at least three adjacent rows of the reflectors.

3. The lithographic apparatus of claim 1, wherein each of the rows of the reflectors comprises at least three adjacent reflectors.

4. The lithographic apparatus of claim 1, wherein a first common control signal from the controller is provided to one of the control areas, causing the alternate rows of reflectors in said one of the control areas to be set to the first common position.

5. The lithographic apparatus of claim 4, wherein a second common control signal from the controller is provided to said one of the control areas, causing the remaining rows of the reflectors in the said one of the control areas to be set to the second position.

6. The lithographic apparatus of claim 1, wherein:

a common control signal from the controller is provided to the actuators associated with all of the reflectors in a first control area to set the first and second positions of the reflectors in said first control area;

the actuators associated with the reflectors in the alternate rows of the first control area actuate the reflectors in a first direction in response to the common control signal; and

the actuators associated with the remaining reflectors in the first control area actuate the remaining reflectors in a second direction in response to the common control signal.

7. The lithographic apparatus of claim 6, wherein:

the reflectors in the first control area rotate about respective tilt axes when actuated;

the respective tilt axes are mutually parallel; and

the first and second directions are opposite rotations about the tilt axes.

8. The lithographic apparatus of claim 1, wherein:

the reflectors rotate about respective tilt axes that are substantially parallel to a first direction; and

the plurality of rows of reflectors are arranged substantially perpendicular to the first direction.

9. The lithographic apparatus of claim 1, wherein:

the reflectors rotate about respective tilt axes that are substantially parallel to a first direction; and

the rows of reflectors are arranged substantially parallel to the first direction.

10. The lithographic apparatus of claim 1, wherein:

the reflectors rotate about respective tilt axes that are substantially parallel to a first direction; and

the rows of reflectors are arranged at substantially 45°

to the first direction.

11. The lithographic apparatus of claim 1, wherein the actuators associated with the reflectors share a common component, such that the reflectors are actuated together.

12. The lithographic apparatus of claim 1, wherein:

each actuator comprises a capacitive actuator that generates a force between a conductor that moves with an associated reflector and a conductor on a base of the array of reflectors; and

the actuators associated with the reflectors in each row have a common conductor on the base.

13. An array of reflectors having one or more control areas, the array of reflectors modulating a beam of radiation in a lithographic apparatus, the lithographic apparatus comprising:

actuators that position respective reflectors in the array of reflectors; and

a controller that, in a first configuration, provides control signals to the actuators, such that alternate rows of the reflectors in each of the control areas are set to a first common position and remaining ones of the rows of the reflectors are set to a second common position, wherein for any given control area, said control signals control said given control area, without controlling any single reflector in said given control area independently of remaining reflectors in said given control area, and said first and second common positions are designated by said control signals from among three or more possible positions that correspond to a sequence of gray states.

14. The array of claim 13, wherein each of the control areas comprise at least three adjacent rows of reflectors.

15. The array according to claim 13, wherein the controller is switched to a second configuration in which it provides control signals to the actuators, such that each of the reflectors is independently set to a desired position.

16. A device manufacturing method, comprising:

(a) patterning a beam of radiation using an array of reflectors;

(b) providing one or more control areas within the array of reflectors, each respective reflector in the array of reflectors being positioned by an associated actuator;

(c) providing control signals to the actuators, such that alternate rows of the reflectors in each of the control areas are set to a first common position and remaining the rows of the reflectors are set to a second common position, wherein for any given control area, said control signals control said given control area, without controlling any single reflector in said given control area independently of remaining reflectors in said given control area, and said first and second common positions are designated by said control signals from among three or more possible positions that correspond to a sequence of gray states; and

(d) projecting the patterned beam onto a target portion of a substrate.

17. The method of claim 16, wherein step (b) comprises using at least three adjacent rows of the reflectors in each of the control areas.