Single scan irradiation for crystallization of thin films

• US 7,311,778 B2
• Filed: 09/17/2004
• Issued: 12/25/2007
• Est. Priority Date: 09/19/2003
• Status: Expired due to Fees

• Current Assignee: Trustees Of Columbia University In The City Of New York (Columbia University)
• Original Assignee: Trustees Of Columbia University In The City Of New York (Columbia University)
• Inventors: Im, James S., van der Wilt, Paul Christiaan
• Primary Examiner(s): HITESHEW, FELISA CARLA
• Application Number:
  US10/944,350
• Publication Number:
  US 20050235903A1
• Time in Patent Office: 1,194 Days
• Field of Search: 117/43, 117/200, 117/900, 438/479, 438/488
• US Class Current: 117/200
• CPC Class Codes: B23K 26/066 by using masks
• CPC Class Codes: C30B 13/24 using electromagnetic waves
• CPC Class Codes: C30B 28/08 by zone-melting
• CPC Class Codes: C30B 35/00 Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
• CPC Class Codes: G03F 7/70041 by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
• CPC Class Codes: G03F 7/70725 control
• CPC Class Codes: Y10S 117/90 Apparatus characterized by composition or treatment thereof, e.g. surface finish, surface coating
• CPC Class Codes: Y10T 117/10 Apparatus
• CPC Class Codes: Y10T 117/1008 with responsive control means

Abstract

A method of processing a polycrystalline film on a substrate includes generating a plurality of laser beam pulses, positioning the film on a support capable of movement in at least one direction, directing the plurality of laser beam pulses through a mask to generate patterned laser beams; each of said beams having a length l′, a width w′ and a spacing between adjacent beams d′, irradiating a region of the film with the patterned beams, said beams having an intensity that is sufficient to melt an irradiated portion of the film to induce crystallization of the irradiated portion of the film, wherein the film region is irradiated n times; and after irradiation of each film portion, translating either the film or the mask, or both, a distance in the x- and y-directions, where the distance of translation in the y-direction is in the range of about 1′/n-δ, where δ is a value selected to form overlapping the beamlets from the one irradiation step to the next, and where the distance of translation in the x-direction is selected such that the film is moved a distance of about λ′ after n irradiations, where λ′=w′+d′.

Claims

1. A system for processing a film on a substrate, comprising:

a laser for generating a plurality of laser beam pulses having a repetition frequency;

a film support for positioning a film that is capable of movement in at least one direction;

a mask support for positioning a mask that is capable of movement in at least one direction;

optics for directing the plurality of laser beam pulses through a mask to generate patterned laser beams;

optics for directing the patterned beams onto a region of the film; and

a controller for controlling the movement of the film support and the mask support in conjunction with the frequency of the laser beam pulses, wherein the controller comprises computer-implemented instructions for executing the steps of;

positioning the film and the mask so as to irradiate a portion of a selected region of a film with one of the plurality of patterned laser beams; and

moving the film along a first translation pathway and moving the mask along a second translation pathway such that successive portions of the selected region are irradiated with patterned beams, and such that the selected region of the film is substantially completely crystallized in a single traversal of the patterned beams over the selected region of the film.

2. The system of claim 1, wherein the controller comprises computer-implemented instructions for moving the film and the mask in orthogonal directions.

3. The system of claim 1, wherein the controller comprises computer-implemented instructions for moving the film at a constant velocity along the first translation pathway.

4. The system of claim 1, wherein the controller comprises computer-implemented instructions for moving the film in a constant direction along the first translation pathway during a single traversal of the patterned beams over the selected region of the film.

5. The system of claim 4, wherein the controller comprises computer-implemented instructions for oscillating the mask in positive and negative directions along the second translation pathway during a single traversal of the patterned beams over the selected region of the film.

6. The system of claim 4, wherein the controller comprises computer-implemented instructions for moving the mask in a constant direction along the second translation pathway during a single traversal of the patterned beams over the selected region of the film.

7. The system of claim 6, wherein the controller comprises computer-implemented instructions for moving the mask at a constant velocity along the second translation pathway during a single traversal of the patterned beams over the selected region of the film.

8. The system of claim 1, wherein the controller comprises computer-implemented instructions for moving the mask in more than one direction along the second translation pathway during a single traversal of the patterned beams over the selected region of the film.

9. The system of claim 1, wherein the substrate is defined by x- and y-axes and the controller comprises computer-implemented instructions for moving the film in the y-direction and the mask in the x-direction.

10. The system of claim 1, wherein the substrate is defined by x- and y-axes and the controller comprises computer-implemented instructions for moving the film in the y-direction and the mask in the x- and y-directions.

11. The system of claim 1, wherein the laser produces laser pulses at a selected frequency and the controller comprises computer-implemented instructions for selecting the first and second translation pathways and speeds so that irradiation occurs at the desired location on the film.

12. The system of claim 1, wherein the substrate is defined by x′

- and y′

-axes, and wherein the controller comprises computer-implemented instructions for offsetting the x′

- and y′

-axes of the substrate from the translation directions of the film and mask by an angle θ

, where θ

is greater than 0° and

ranges up to about 45°

.

13. The system of claim 1, wherein the mask comprises a plurality of elongated laser-transparent regions in a laser opaque background.

14. The system of claim 13, wherein the elongated regions comprise rectangular regions.

15. The system of claim 1, wherein the mask comprises a plurality of laser-opaque features in a laser-transparent background.

16. The system of claim 1, wherein the controller comprises computer-implemented instructions for moving the mask along a pathway about a central location.

17. The system of claim 1, wherein the mask is selected to generate patterned laser beams, each of which has a length l′

, a width w′ and

a spacing between adjacent patterned beams d′

.

18. The system of claim 17, wherein the controller comprises computer-implemented instructions for:

repositioning the film a distance in the y-direction in the range of about l′

/n-δ

from the one irradiation pulse to the next, where δ

is a value selected to form overlapping patterned beams; and

repositioning the mask a distance in the x-direction of about λ

′

over a number of irradiation pulses, n, where λ

′

=w′

+d′

.

19. The system of claim 18, wherein n is in the range of 2 to about 25.

20. The system of claim 18, wherein n is 2, the y-translation distance is about l′

/2-δ

, and the x-translation distance is about λ

′

/2.

21. The system of claim 18, wherein λ

is in the range of about 1-10% of l.

22. The system of claim 21, wherein the controller comprises computer-implemented instructions for moving the mask n times in the positive x-direction from an initial x-position, followed by movement in the negative x-direction to the initial x-position.

23. The system of claim 18, wherein the controller comprises computer-implemented instructions for moving the mask a distance in the x-direction of λ

/n for each irradiation pulse.

24. The system of claim 1, wherein the controller comprises computer-implemented instructions for moving the mask in a constant x-direction.

25. The system of claim 1, wherein the laser generates a plurality of excimer laser pulses of a predetermined fluence.

26. The system of claim 25, further comprising at least one optical element for controllably modulating the fluence of the excimer laser pulses.

27. The system of claim 1, further comprising at least one optical element for homogenizing the intensity profile of the laser beam pulses.