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Single scan irradiation for crystallization of thin films

  • US 7,311,778 B2
  • Filed: 09/17/2004
  • Issued: 12/25/2007
  • Est. Priority Date: 09/19/2003
  • Status: Expired due to Fees
First Claim
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1. A system for processing a film on a substrate, comprising:

  • a laser for generating a plurality of laser beam pulses having a repetition frequency;

    a film support for positioning a film that is capable of movement in at least one direction;

    a mask support for positioning a mask that is capable of movement in at least one direction;

    optics for directing the plurality of laser beam pulses through a mask to generate patterned laser beams;

    optics for directing the patterned beams onto a region of the film; and

    a controller for controlling the movement of the film support and the mask support in conjunction with the frequency of the laser beam pulses, wherein the controller comprises computer-implemented instructions for executing the steps of;

    positioning the film and the mask so as to irradiate a portion of a selected region of a film with one of the plurality of patterned laser beams; and

    moving the film along a first translation pathway and moving the mask along a second translation pathway such that successive portions of the selected region are irradiated with patterned beams, and such that the selected region of the film is substantially completely crystallized in a single traversal of the patterned beams over the selected region of the film.

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