Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic projection apparatus comprising:
- a support structure constructed to support a patterning device, said patterning device being configured to pattern a beam of radiation according to a desired pattern;
a substrate holder constructed to hold a substrate;
a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate; and
a downstream radical source having a tube connected to a gas supply and configured to provide a beam of radicals directed onto a surface of a component to be cleaned,wherein the radicals are generated within a flow of gas from the gas supply in the tube, andwherein the tube of the radical source is constructed and arranged to be moved relative to the surface to be cleaned and/or the component is constructed and arranged to be moved relative to the tube of the radical source so that the beam of radicals is incident on the surface to be cleaned.
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Abstract
A lithographic projection apparatus is disclosed. The apparatus includes a support structure constructed to support a patterning structure. The patterning structure is adapted to pattern a beam of radiation according to a desired pattern. The apparatus also includes a substrate holder that is constructed to hold a substrate, a projection system that is constructed and arranged to project the patterned beam onto a target portion of the substrate, and a downstream radical source that is connected to a gas supply and is configured to provide a beam of radicals onto a surface to be cleaned.
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Citations
20 Claims
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1. A lithographic projection apparatus comprising:
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a support structure constructed to support a patterning device, said patterning device being configured to pattern a beam of radiation according to a desired pattern; a substrate holder constructed to hold a substrate; a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate; and a downstream radical source having a tube connected to a gas supply and configured to provide a beam of radicals directed onto a surface of a component to be cleaned, wherein the radicals are generated within a flow of gas from the gas supply in the tube, and wherein the tube of the radical source is constructed and arranged to be moved relative to the surface to be cleaned and/or the component is constructed and arranged to be moved relative to the tube of the radical source so that the beam of radicals is incident on the surface to be cleaned. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A device manufacturing method comprising:
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providing a beam of radiation; patterning the beam of radiation; projecting the patterned beam of radiation onto a target portion of a layer of radiation-sensitive material; providing a flow of gas from a gas supply; generating a beam of radicals in the flow of gas from the gas supply in a tube of a downstream radical source; moving the tube of the radical source relative to a component comprising a surface to be cleaned and/or moving the component relative to the tube of the radical source; and directing said beam of radicals onto the surface to be cleaned so that the beam of radicals is incident on the surface to be cleaned.
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15. A lithographic projection apparatus comprising:
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a radiation source that provides a beam of radiation; a support structure constructed to support a patterning device, said patterning device being configured to pattern the beam of radiation according to a desired pattern; a substrate holder constructed to hold a substrate; a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate; a radical source connected to a gas supply and configured to generate a localized beam of radicals in a flow of gas from the gas supply in a tube of the radical source; and a structure to direct said beam of radicals onto a surface to be cleaned, wherein said radical source is disposed away from said radiation source such that operating conditions of said radical source do not adversely affect said beam of radiation, and wherein the tube of the radical source is constructed and arranged to be moved relative to a component comprising the surface to be cleaned and/or the component is constructed and arranged to be moved relative to the tube of the radical source so that the localized beam of radicals is incident on the surface to be cleaned. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification