Fabricating method of a liquid crystal display device
First Claim
1. A fabricating method of a liquid crystal display device, comprising:
- forming a gate pattern having a double layered structure including a transparent first conductive layer and an opaque second conductive layer on a substrate, and a common pattern having a common line of the double layered structure and a common electrode formed of the first conductive layer using a first mask;
forming a gate insulating film on the gate pattern and the common pattern;
forming a semiconductor pattern on the gate insulating film, and a source/drain pattern having a data line, a source electrode and a drain electrode on the semiconductor pattern using a second mask;
forming a passivation film on the source/drain pattern, and a contact hole exposing the drain electrode using a third mask; and
forming a pixel electrode connected to the drain electrode through the contact hole using a fourth mask, wherein a horizontal field is formed with the common electrode,wherein a line width of the first conductive layer of the common line is wider than a portion of the common line overlapped by the pixel electrode.
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Accused Products
Abstract
A horizontal electric field applying type thin film transistor substrate of a LCD device having an increased aperture ratio as well as a simplified manufacturing process. The device includes a gate line having a double layered structure including a transparent first conductive layer and an opaque second conductive layer, a data line crossing the gate line to define a pixel area; a thin film transistor connected to the gate line and the data line; a common line having first and second conductive layers and substantially parallel to the gate line; a common electrode extended from the first conductive layer of the common line in the pixel area; and a pixel electrode connected to the thin film transistor to form a horizontal electric field with the common electrode in the pixel area.
32 Citations
14 Claims
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1. A fabricating method of a liquid crystal display device, comprising:
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forming a gate pattern having a double layered structure including a transparent first conductive layer and an opaque second conductive layer on a substrate, and a common pattern having a common line of the double layered structure and a common electrode formed of the first conductive layer using a first mask; forming a gate insulating film on the gate pattern and the common pattern; forming a semiconductor pattern on the gate insulating film, and a source/drain pattern having a data line, a source electrode and a drain electrode on the semiconductor pattern using a second mask; forming a passivation film on the source/drain pattern, and a contact hole exposing the drain electrode using a third mask; and forming a pixel electrode connected to the drain electrode through the contact hole using a fourth mask, wherein a horizontal field is formed with the common electrode, wherein a line width of the first conductive layer of the common line is wider than a portion of the common line overlapped by the pixel electrode. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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Specification