Lithographic apparatus and device manufacturing method

• US 7,317,504 B2
• Filed: 04/08/2004
• Issued: 01/08/2008
• Est. Priority Date: 04/08/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Banine, Vadim Yevgenyevich, De Smit, Joannes Theodoor, Dierichs, Marcel Mathijs Theodore Marie, Modderman, Theodorus Marinus, Bisschops, Theodorus Hubertus Josephus
• Primary Examiner(s): MATHEWS, ALAN A
• Application Number:
  US10/820,227
• Publication Number:
  US 20050225734A1
• Time in Patent Office: 1,370 Days
• Field of Search: 355/30, 355/53, 430/30, 430/311, 356/237.1, 427/600, 427/560, 427/553
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041

Abstract

A lithographic apparatus and device manufacturing method makes use of a high refractive index liquid confined in a reservoir 13 at least partly filling the imaging field between the final element of the projection lens and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection can be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal can be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and phase shifting ultrasonic standing-wave node patterns.

Claims

1. A lithographic projection apparatus comprising:

a support structure configured to hold a patterning device, the patterning device configured to pattern a projection beam according to a desired pattern;

a substrate table configured to hold a substrate;

a projection system configured to project the patterned beam onto a target portion of the substrate;

a liquid supply system configured to at least partly fill a space between the projection system and said substrate with liquid; and

a selective heater configured to selectively control the temperature of bubbles in the liquid without substantially changing the temperature of the liquid.

2. A lithographic projection apparatus according to claim 1, further comprising a bubble detector.

3. A lithographic projection apparatus according to claim 2, wherein said bubble detector comprises at least one ultrasonic transducer, the attenuation of ultrasonic waves in said liquid being measured by said transducer so as to obtain information about bubbles present in said liquid.

4. A lithographic projection apparatus according to claim 3 wherein said ultrasonic transducer measures ultrasonic attenuation as a function of frequency.

5. A lithographic projection apparatus according to claim 1, further comprising a bubble removal device.

6. A lithographic projection apparatus adcording to claim 5, wherein said.bubble removal device comprises a degassing device, said degassing device comprising an isolation chamber, wherein a space above liquid in said isolation chamber is maintained at a pressure below atmospheric pressure encouraging previously dissolved gases to come out of solution and be pumped away.

7. A lithographic projection apparatus according to claim 5, wherein said bubble removal device is configured to provide a continuous flow of liquid over a final element of said projection system and said substrate to transport bubbles in said liquid out of said space between said projection system and said substrate.

8. A lithographic projection apparatus according to claim 1, further comprising a liquid pressurization device to pressurize said liquid above atmospheric pressure to minimize the size of bubbles and encourage bubble-forming gases to dissolve into said liquid.

9. A lithographic projection apparatus according to claim 1, wherein the composition of said liquid is chosen to have a lower surface tension than water.

10. A lithographic projection apparatus according to claim 1, wherein a bubble detector, a bubble removal device, or both, is configured to treat said liquid before itis supplied to said space between said projection system and said substrate.

11. A lithographic projection apparatus according to claim 10, wherein the treated liquid is kept in a sealed container, excess space in said sealed container being filled with one or more of the following:

nitrogen gas, argon gas, helium gas or a vacuum.

12. A lithographic projection apparatus according to claim 3, wherein an ultrasonic transducer is arranged in a pulse-echo configuration, said transducer acting both to transmit ultrasonic waves and, after reflection, to receive ultrasonic waves that have been attenuated during propagation along a path through said liquid.

13. A lithographic projection apparatus according to claim 3, wherein said bubble detector comprises two spatially separated ultrasonic transducers, the first arranged to transmit ultrasonic waves, and the second to receive ultrasonic waves that have been attenuated during propagation along a path through said liquid between the two transducers.

14. A lithographic projection apparatus according to claim 5, wherein said bubble removaldevice includes two spatially separated ultrasonic transducers, arranged to produce ultrasonic standing-wave patterns within said liquid which trap bubbles within the nodal regions, said bubble removal device being arranged to displace said bubbles through the use of a phase-adjusting device linked with said transducers, said phase-adjusting device causing spatial. shift of nodal regions and bubbles trapped therein.

15. A lithographic projection apparatus according to claim 5, wherein said bubble removal device comprises an electric field generator configured to apply an electric field to said liquid, said electric field being capable of dislodging bubbles attached to said substrate.

16. A lithographic projection apparatus according to claim 1, wherein said selective heater comprises a microwave source.

17. A lithographic projection apparatus according to claim 2, wherein said bubble detector comprises a light source, a light detector and a light comparator, said light source and said light detector being arranged so that light emitted by said source propagates between said source and said detector through a portion of said liquid, said comparator being arranged to detect changes in the proportion of said emitted light that arrives at said detector after propagation through a portion of said liquid.

18. A lithographic projection apparatus according to claim 1, further comprising a liquid quality monitor capable of switching the operational state of the projection apparatus between an active state and a suspended state, the active state being selected when the liquid quality is determined to be above a predefined threshold and the suspended state being selected when the liquid quality is determined to be below a predefined threshold state.

19. A device manufacturing method comprising:

at least partly filling a space between a projection system of a lithographic apparatus and a substrate with liquid;

projecting a patterned radiation beam using the projection system, through the liquid, onto a target portion of a substrate; and

selectively controlling the temperature of bubbles in the liquid without substantially changing the temperature of the liquid.

20. A device manufacturing method according to claim 19, wherein selectively controlling the temperature comprises heating using a microwave source.

21. A device manufacturing method according to claim 19, further comprising producing ultrasonic standing-wave patterns within the liquid which trap bubbles within the nodal regions and causing spatial shift of the nodal regions to displace the trapped bubbles.

22. A lithographic projection apparatus comprising:

a support structure configured to hold a patterning device, the patterning device configured to pattern a projection beam according to a desired pattern;

a substrate table configured to hold a substrate;

a projection system configured to project the patterned beam onto a target portion of the substrate;

a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid;

a particle input device configured to controllably introduce particles into the liquid; and

a particle removal device configured to remove the particles from the liquid.

23. A lithographic projection apparatus according to claim 22, wherein the particles comprise a surface with characteristics that encourage bubbles to attach thereto.

24. A lithographic projection apparatus according to claim 22, further comprising at least one ultrasonic transducer, the attenuation of ultrasonic waves in said liquid being measured by said transducer so as to obtain information about bubbles present in said liquid.