Lithographic apparatus and device manufacturing method
First Claim
1. A lithographic projection apparatus comprising:
- a support structure configured to hold a patterning device, the patterning device configured to pattern a projection beam according to a desired pattern;
a substrate table configured to hold a substrate;
a projection system configured to project the patterned beam onto a target portion of the substrate;
a liquid supply system configured to at least partly fill a space between the projection system and said substrate with liquid; and
a selective heater configured to selectively control the temperature of bubbles in the liquid without substantially changing the temperature of the liquid.
1 Assignment
0 Petitions
Accused Products
Abstract
A lithographic apparatus and device manufacturing method makes use of a high refractive index liquid confined in a reservoir 13 at least partly filling the imaging field between the final element of the projection lens and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection can be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal can be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and phase shifting ultrasonic standing-wave node patterns.
198 Citations
24 Claims
-
1. A lithographic projection apparatus comprising:
-
a support structure configured to hold a patterning device, the patterning device configured to pattern a projection beam according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between the projection system and said substrate with liquid; and a selective heater configured to selectively control the temperature of bubbles in the liquid without substantially changing the temperature of the liquid. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
-
-
19. A device manufacturing method comprising:
-
at least partly filling a space between a projection system of a lithographic apparatus and a substrate with liquid; projecting a patterned radiation beam using the projection system, through the liquid, onto a target portion of a substrate; and selectively controlling the temperature of bubbles in the liquid without substantially changing the temperature of the liquid. - View Dependent Claims (20, 21)
-
-
22. A lithographic projection apparatus comprising:
-
a support structure configured to hold a patterning device, the patterning device configured to pattern a projection beam according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid; a particle input device configured to controllably introduce particles into the liquid; and a particle removal device configured to remove the particles from the liquid. - View Dependent Claims (23, 24)
-
Specification