Lithographic apparatus and device manufacturing method

• US 7,317,510 B2
• Filed: 12/27/2004
• Issued: 01/08/2008
• Est. Priority Date: 12/27/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Van Hassel, Marco Cornelis Jacobus Martinus, Bontekoe, Marcel, Tinnemans, Patricius Aloysius Jacobus, Mulckhuyse, Wouter Frans Willem, Kessels, Lambertus Gerardus Maria
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US11/020,643
• Publication Number:
  US 20060139980A1
• Time in Patent Office: 1,107 Days
• Field of Search: 355/53, 355 67- 71, 355/77, 430/5, 430/20, 430/30, 359/224
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70283 Mask effects on the imaging process
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70508 Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

Abstract

A lithography apparatus including a projection system configured to project a beam of radiation as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation to form a requested dose pattern on a substrate. The requested dose pattern is built up over time from an array of localized exposures in which at least neighboring localized exposures are imaged at substantially different times and in which each localized exposure is produced by one of the sub-beams of radiation. The lithography apparatus also includes a rasterizer device arranged to convert data defining the requested dose pattern to a sequence of data representing the requested dose at a corresponding sequence of points within the pattern, and also a data manipulation device arranged to receive the sequence of data and constitute a control signal suitable for controlling the array of individually controllable elements.

Claims

1. A lithography apparatus comprising:

a projection system configured to project a beam of radiation onto a substrate as an array of sub-beams of radiation;

an array of individually controllable elements configured to modulate said sub-beams of radiation so as substantially to form a requested dose pattern on said substrate, said requested dose pattern being built up over time from an array of localized exposures in which at least neighboring localized exposures are imaged at substantially different times and in which each localized exposure is produced by one of said sub-beams of radiation;

a rasterizer device arranged to convert data defining said requested dose pattern to a sequence of data representing a requested dose at a corresponding sequence of points within a pattern; and

a data manipulation device arranged to receive said sequence of data and constitute a control signal therefrom suitable for controlling said array of individually controllable elements, wherein said data manipulation device is configured to calculate a desired sub-beam intensity for each localized exposure so as to reproduce said requested dose pattern, said calculation being based for each localized exposure on context information comprising said requested dose pattern in a region on said substrate around said localized exposure, and wherein said data manipulation device includes

a memory buffer arranged to store at least a portion of said context information, wherein said portion of said context information includes at least a portion of said sequence of data; and

a desired sub-beam intensity calculation device configured to calculate said desired sub-beam intensity for the plurality of neighboring localized exposures based on said context information provided by said memory buffer.

2. The lithographic apparatus of claim 1, further comprising:

a second memory buffer, arranged to store results of calculations performed by said desired sub-beam intensity calculation device; and

a data re-ordering device configured to build said control signal from said stored results in such a way that desired sub-beam intensities are supplied to said array of individually controllable elements substantially in the order in which associated localized exposures are to be imaged.

3. The lithographic apparatus of claim 1, wherein a size of said portion of said sequence of data that is stored in said memory buffer is determined by an amount of said context information used in said desired sub-beam intensity calculation device.

4. The lithographic apparatus of claim 1, wherein said desired sub-beam intensity calculation device is configured to calculate the desired sub-beam intensities for at least two of said localized exposures in a row of said localized exposures defined along a direction perpendicular to a direction of movement of said substrate relative to said projection system before a first of said at least two localized exposures in said row are imaged.

5. The lithographic apparatus of claim 1, wherein said desired sub-beam intensity calculation device is configured to calculate the desired sub-beam intensities for an entire row of said localized exposures of a portion of said pattern on which the data manipulation device operates, defined along a direction perpendicular to a direction of movement of said substrate relative to said projection system, before a first localized exposure of said entire row of localized exposures is imaged.

6. The lithographic apparatus of claim 1, wherein said memory buffer comprises a shift register.

7. The lithography apparatus of claim 1, wherein said data manipulation device is configured to calculate said control signal during imaging, and wherein said memory buffer is accessible to said data manipulation device during imaging.

8. A device manufacturing method, comprising:

projecting a beam of radiation onto a substrate as an array of sub-beams of radiation;

modulating the sub-beams of radiation with an array of individually controllable elements so as substantially to form a requested dose pattern on the substrate, the requested dose pattern being built up over time from an array of localized exposures in which at least neighboring localized exposures are imaged at substantially different times and in which each localized exposure is produced by one of the sub-beams of radiation;

converting data defining the requested dose pattern to a sequence of data representing a requested dose at a corresponding sequence of points within a pattern;

receiving the sequence of data at a data manipulation device;

constituting a control signal at the data manipulation device suitable for controlling the array of individually controllable elements; and

calculating at the data manipulation device a desired sub-beam intensity for each localized exposure so as to reproduce the requested dose pattern, the calculation being based for each localized exposure on context information comprising the requested dose pattern in a region on the substrate around the localized exposure, the data manipulation device including

a memory buffer arranged to store at least a portion of the context information, wherein the portion of the context information includes at least a portion of the sequence of data; and

a desired sub-beam intensity calculation device configured to calculate the desired sub-beam intensity for the plurality of neighboring localized exposures based on the context information provided by the memory buffer.

9. The method of claim 8, further comprising:

storing at least a portion of the context information, wherein the portion of the context information includes at least a portion of the sequence of data.

10. The method of claim 8, further comprising:

calculating the desired sub-beam intensity for the plurality of neighboring localized exposures based on the context information provided by the memory buffer.