Spatial light modulator, lithographic apparatus and device manufacturing method

• US 7,321,417 B2
• Filed: 12/21/2006
• Issued: 01/22/2008
• Est. Priority Date: 06/30/2003
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Bleeker, Arno Jan
• Primary Examiner(s): Nguyen; Henry Hung
• Application Number:
  US11/642,604
• Publication Number:
  US 20070097344A1
• Time in Patent Office: 397 Days
• Field of Search: 355/53, 355/55, 355/67, 355/71, 430/5, 430/20, 430/30, 359290-291
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70283 Mask effects on the imaging process
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70508 Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

Abstract

A spatial light modulator used to pattern a radiation beam comprises an array of pixels disposed on a support. Each pixel has a light modulating element for modulating the radiation beam and a control circuit that positions the light modulating elements according to a desired pattern. The control circuit is disposed on the opposite side of the support than the light modulating elements. The control circuit comprises at least one of a digital to analog converter, an analog to digital converter, an optical fiber input, and a processor.

Claims

1. A patterning device, comprising:

an array of light modulating elements disposed on a support, the light modulating elements configured to modulate a radiation beam; and

a control circuit configured to position respective ones of the light modulating elements according to a desired pattern, the control circuit coupled to an opposite side of the support than the light modulating elements, and the control circuit comprising a digital-to-analog converter, an analog-to-digital converter, an optical fiber input, and a processor.

2. The patterning device of claim 1, wherein the control circuit decompresses compressed pattern data received from an external source.

3. The patterning device of claim 1, wherein the control circuit calibrates each of the light modulating elements.

4. The patterning device of claim 1, further comprising:

an optical input device configured to (a) receive an optical control signal including the desired pattern data and (b) generate a control signal therefrom,

wherein the control circuit is configured to receive the control signal and position the respective ones of the light modulating elements according to the received control signal.

5. A lithographic apparatus, comprising:

an illumination system configured to condition a beam of radiation;

an array of individually controllable elements disposed on a support, respective ones of the individually controllable elements being configured to pattern the beam of radiation;

a control circuit configured to position respective ones of the individually controllable elements according to a desired pattern, the control circuit coupled to an opposite side of the support than the individually controllable elements, and the control circuit comprising a digital-to-analog converter, an analog-to-digital converter, an optical fiber input, and a processor; and

a projection system configured to project the patterned beam onto a target portion of a substrate.

6. The lithographic apparatus of claim 5, wherein the control circuit decompresses compressed pattern data received from an external source.

7. The lithographic apparatus of claim 5, wherein the control circuit calibrates each of the individually controllable elements.

8. The lithographic apparatus of claim 5, further comprising:

an optical input device configured to receive an optical control signal including the desired pattern data and generate a control signal therefrom,

wherein the control circuit is configured to receive the control signal and position respective ones of the individually controllable elements according to the received control signal.

9. A device manufacturing method, comprising:

(a) patterning a beam of radiation using an array of individually controllable elements disposed on a support;

(b) positioning respective ones of the individually controllable elements according to a desired pattern using a control circuit, the control circuit comprising a digital-to-analog converter, an analog-to-digital converter, an optical-to-electrical converter, and a processor, and the control circuit being coupled to an opposite side of the support than the individually controllable elements; and

(c) projecting the patterned beam onto a target portion of a substrate using a projection system.

10. The method of claim 9, further comprising decompressing compressed pattern data received from an external source using the control circuit.

11. The method of claim 9, further comprising calibrating each of the individually controllable elements using the control circuit.