Lithographic apparatus and device manufacturing method
First Claim
Patent Images
1. A system, comprising:
- an illumination system configured to generate a beam of radiation;
a patterning device configured to pattern the beam of radiation;
a projection system configured to project the patterned beam onto a target portion of a substrate, the substrate located within a first plane, the projection system including an array of focusing elements located within a second plane, the array supporting the focusing elements; and
an actuator system coupled to a side surface of the array and configured to move the array of focusing elements along an axis that is perpendicular to the first and second planes,wherein the illumination system generates a second beam of radiation, and the system further comprises;
a second patterning device that patterns the second beam of radiation; and
a second projection system that projects the second patterned beam onto a second target portion of the substrate, the second projection system including a second array of focusing elements, wherein each of the second array of focusing elements projects a respective portion of the second patterned beam onto a corresponding portion of the second target portion of the substrate, andwherein the actuator system moves the first array of focusing elements relative to the second array of focusing elements.
1 Assignment
0 Petitions
Accused Products
Abstract
An arrangement for adjusting the position on a substrate of a patterned beam generated by a light engine relative to the substrate. The arrangement moves an array of focusing elements, each of which focuses a portion of the patterned beam onto a point on the substrate, relative to an array of individually controllable elements to impart the pattern to the patterned beam.
29 Citations
18 Claims
-
1. A system, comprising:
-
an illumination system configured to generate a beam of radiation; a patterning device configured to pattern the beam of radiation; a projection system configured to project the patterned beam onto a target portion of a substrate, the substrate located within a first plane, the projection system including an array of focusing elements located within a second plane, the array supporting the focusing elements; and an actuator system coupled to a side surface of the array and configured to move the array of focusing elements along an axis that is perpendicular to the first and second planes, wherein the illumination system generates a second beam of radiation, and the system further comprises; a second patterning device that patterns the second beam of radiation; and a second projection system that projects the second patterned beam onto a second target portion of the substrate, the second projection system including a second array of focusing elements, wherein each of the second array of focusing elements projects a respective portion of the second patterned beam onto a corresponding portion of the second target portion of the substrate, and wherein the actuator system moves the first array of focusing elements relative to the second array of focusing elements. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
-
-
9. A method, comprising:
-
patterning a first beam of radiation and a second beam of radiation using a first patterning device and a second patterning device, respectively; projecting the first patterned beam onto a first target portion of a substrate lying within a first plane using a first array of focusing elements lying within a second plane such that each of the focusing elements of the first array projects a respective portion of the first patterned beam onto a corresponding portion of the first target portion of the substrate; projecting the second patterned beam onto a second target portion of the substrate lying within the first plane using a second array of focusing elements lying within the second plane such that each of the focusing elements of the second array projects a respective portion of the second patterned beam onto a corresponding portion of the second target portion of the substrate; and moving the first array of focusing elements relative to the second array of focusing elements. - View Dependent Claims (10)
-
-
11. A system, comprising:
-
an illumination system configured to generate a beam of radiation; a patterning device configured to pattern the beam of radiation; a projection system configured to project the patterned beam onto a target portion of a substrate, the substrate located within a first plane, the projection system including an array of focusing elements located within a second plane; and an actuator system configured to move the array of focusing elements along an axis that is perpendicular to the first and second planes, wherein the illumination system generates a second beam of radiation, and the system further comprises, a second patterning device that patterns the second beam of radiation, and a second projection system that projects the second patterned beam onto a second target portion of the substrate, the second projection system including a second array of focusing elements, wherein each of the second array of focusing elements projects a respective portion of the second patterned beam onto a corresponding portion of the second target portion of the substrate, and wherein the actuator system moves the first array of focusing elements relative to the second array of focusing elements. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18)
-
Specification