Patterned atomic layer epitaxy

• US 7,326,293 B2
• Filed: 03/25/2005
• Issued: 02/05/2008
• Est. Priority Date: 03/26/2004
• Status: Active Grant

• Current Assignee: Zyvex Labs, Llc
• Original Assignee: Zyvex Labs, Llc
• Inventors: Folaron, Robert J., Stallcup, Richard E. II, Peng, Jingping, Baur, Christof, Skidmore, George D., Randall, John N., Liu, Jun-Fu
• Primary Examiner(s): KUNEMUND, ROBERT M
• Application Number:
  US11/089,814
• Publication Number:
  US 20050223968A1
• Time in Patent Office: 1,047 Days
• Field of Search: 117/54, 117/55, 117/86, 117/94, 117/95
• US Class Current: 117/55
• CPC Class Codes: C30B 25/04 Pattern deposit, e.g. by using masks
• CPC Class Codes: C30B 25/14 Feed and outlet means for the gases; Modifying the flow of the reactive gases

Abstract

A patterned layer is formed by removing nanoscale passivating particle from a first plurality of nanoscale structural particles or by adding nanoscale passivating particles to the first plurality of nanoscale structural particles. Each of a second plurality of nanoscale structural particles is deposited on each of corresponding ones of the first plurality of nanoscale structural particles that is not passivated by one of the plurality of nanoscale passivating particles.

Claims

1. A method, comprising:

patterning a layer by removing each of a plurality of nanoscale passivating particles which each passivate a corresponding one of a first plurality of nanoscale structural particles forming the layer; and

depositing each of a second plurality of nanoscale structural particles on each of corresponding ones of the first plurality of nanoscale structural particles from which one of the plurality of nanoscale passivating particles was removed;

wherein at least one of the patterning and the depositing is at least partially automated.

2. The method of claim 1 wherein each of the plurality of nanoscale passivating particles is one of a single passivating molecule and a single passivating atom, and wherein each of the first and second pluralities of nanoscale structural particles is one of a single structural molecule and a single structural atom.

3. The method of claim 1 wherein each of the plurality of nanoscale passivating particles is a single passivating atom, and wherein each of the first and second pluralities of nanoscale structural particles is a single structural atom.

4. The method of claim 1 further comprising repeating the patterning and the depositing to individually form each of a plurality of structural layers each having a thickness about equal to a thickness of one of the first plurality of nanoscale structural particles.

5. The method of claim 1 wherein depositing the second plurality of nanoscale structural particles forms a monolayer having a thickness about equal to one of the first plurality of nanoscale structural particles.

6. The method of claim 1 wherein the plurality of nanoscale passivating particles substantially comprises at least one of hydrogen atoms, chlorine atoms, HCl molecules, and methyl group molecules.

7. The method of claim 1 wherein the patterning includes at least one of:

individually removing each of ones of the plurality of nanoscale passivating particles with a scanning probe instrument, in a substantially serial manner; and

substantially simultaneously removing each of ones of the plurality of nanoscale passivating particles with a parallel array of scanning probes, in a substantially parallel manner.

8. The method of claim 1 wherein the patterning includes at least one of:

individually removing each of ones of the plurality of nanoscale passivating particles with one of a probe, a tip and a stamp, in a substantially serial manner; and

substantially simultaneously removing each of ones of the plurality of nanoscale passivating particles with one of a probe, a tip and a stamp, in a substantially parallel manner.

9. The method of claim 1 wherein the layer is located on a substrate comprising at least one of silicon and germanium, and the depositing is by atomic layer epitaxy of silicon employing hydrogen for passivation.

10. The method of claim 1 wherein the depositing is by liquid phase atomic layer epitaxy.

11. The method of claim 1 wherein each of the first and second pluralities of nanoscale structural particles comprises a plurality of first nanoscale particles having a first composition and a plurality of second nanoscale particles having a second composition that is different relative to the first composition.

12. The method of claim 11 wherein the first plurality of nanoscale particles comprises a plurality of silicon atoms and the second plurality of nanoscale particles comprises a plurality of germanium atoms.

13. The method of claim 1 wherein the depositing includes growing the second plurality of nanoscale structural particles.

14. The method of claim 1 further comprising repeating the patterning and the depositing to individually form a plurality of structural layers, wherein the repeated patterning includes patterning a first pattern to which first ones of the plurality of deposited structural layers correspond and subsequently patterning a second pattern to which second ones of the plurality of deposited structural layers correspond.

15. A method, comprising:

(a) patterning a layer by removing each of a first plurality of nanoscale passivating particles which each passivate a corresponding one of a first plurality of nanoscale structural particles forming the layer;

(b) forming each of a second plurality of nanoscale structural particles on each of corresponding ones of the first plurality of nanoscale structural particles from which one of the first plurality of nanoscale passivating particles was removed, wherein each of the second plurality of nanoscale structural particles is passivated;

(c) removing each of a second plurality of nanoscale passivating particles which each passivate a corresponding one of a third plurality of nanoscale structural particles forming the layer; and

(d) forming each of a fourth plurality of nanoscale structural particles on each of corresponding ones of the third plurality of nanoscale structural particles from which one of the plurality of second plurality of nanoscale passivating particles was removed, wherein each of the fourth plurality of nanoscale structural particles is passivated;

wherein at least one of steps (a)-(d) is at least partially automated.

16. The method of claim 15 wherein each of the first plurality of nanoscale passivating particles is substantially different in composition relative to each of the second plurality of nanoscale passivating particles, permitting their selective removal.

17. The method of claim 15 wherein a first process employed to remove the first plurality of nanoscale passivating particles is different relative to a second process employed to remove the second plurality of nanoscale passivating particles.

18. The method of claim 15 wherein each of the first and second pluralities of nanoscale structural particles have a first composition and each of the third and fourth pluralities of nanoscale structural particles have a second composition.

19. The method of claim 15 wherein a first one of the first and second compositions is silicon and a second one of the first and second compositions is germanium.

20. The method of claim 19 wherein the silicon is deposited from precursor gas dichlorosilane and the germanium is deposited from precursor gas dimethylgermane.

21. The method of claim 20 wherein passivating chemistry for silicon is one of chlorine and HCl and passivating chemistry for germanium is methyl groups, the depassivation of the methyl groups from the Ge employs atomic hydrogen, and the depassivation of HCl from Si is accomplished by raising the temperature of the sample to desorb the HCl from the Si while leaving the methyl groups passivating the Ge.

22. The method of claim 15 wherein the layer includes nanoscale particles of at least three different compositions, wherein the nanoscale particles includes at least one of molecules and atoms, and wherein a thickness of the layer is equal to a thickness of one of the at least one of molecules and atoms.

23. A method, comprising:

patterning a layer by placing each of a plurality of nanoscale passivating particles on a corresponding one of a first plurality of nanoscale structural particles forming the layer, wherein the layer comprises the first plurality of nanoscale structural particles and a second plurality of nanoscale structural particles and has a thickness about equal to a dimension of one of the first and second pluralities of nanoscale structural particles; and

depositing each of a third plurality of nanoscale particles molecules on each of corresponding ones of the second plurality of nanoscale structural particles;

wherein at least one of the patterning and the depositing is at least partially automated.

24. The method of claim 23 wherein each of the first plurality of nanoscale structural particles has a first composition and each of the second plurality of nanoscale structural particles has a second composition that is substantially different relative to the first composition.

25. The method of claim 23 wherein placing includes substantially simultaneously placing ones of the plurality of nanoscale passivating particles in a procedurally parallel manner.

26. The method of claim 25 wherein placing includes substantially simultaneously placing ones of the plurality of nanoscale passivating particles with one of a probe, a tip and a stamp.