Photomask
First Claim
1. A photomask comprising, on a transparent substrate:
- a semi-shielding portion having a transmitting property against exposing light;
a transparent portion surrounded with said semi-shielding portion and having a transmitting property against the exposing light; and
an auxiliary pattern surrounded with said semi-shielding portion and provided around said transparent portion,wherein part of said semi-shielding portion is interposed between said transparent portion and said auxiliary pattern,said transparent portion is smaller than a rectangle with a side of (0.8×
λ
×
M)/NA,said auxiliary pattern is a rectangular pattern and has a center line thereof in a position away from the center of said transparent portion by a distance not less than (0.3×
λ
×
M)/NA and not more than (0.5×
λ
×
M)/NA,said semi-shielding portion and said transparent portion transmit the exposing light in an identical phase with respect to each other,said auxiliary pattern transmits the exposing light in an opposite phase with respect to said semi-shielding portion and said transparent portion and is not transferred through exposure, andλ
indicates a wavelength of the exposing light, and M and NA respectively indicate magnification and numerical aperture of a reduction projection optical system of a projection aligner.
3 Assignments
0 Petitions
Accused Products
Abstract
The photomask of this invention includes, on a transparent substrate, a semi-shielding portion having a transmitting property against exposing light, a transparent portion having a transmitting property against the exposing light and surrounded with the semi-shielding portion, and an auxiliary pattern surrounded with the semi-shielding portion and provided around the transparent portion. The semi-shielding portion and the transparent portion transmit the exposing light in an identical phase with respect to each other. The auxiliary pattern transmits the exposing light in an opposite phase with respect to the semi-shielding portion and the transparent portion and is not transferred through exposure.
-
Citations
36 Claims
-
1. A photomask comprising, on a transparent substrate:
-
a semi-shielding portion having a transmitting property against exposing light; a transparent portion surrounded with said semi-shielding portion and having a transmitting property against the exposing light; and an auxiliary pattern surrounded with said semi-shielding portion and provided around said transparent portion, wherein part of said semi-shielding portion is interposed between said transparent portion and said auxiliary pattern, said transparent portion is smaller than a rectangle with a side of (0.8×
λ
×
M)/NA,said auxiliary pattern is a rectangular pattern and has a center line thereof in a position away from the center of said transparent portion by a distance not less than (0.3×
λ
×
M)/NA and not more than (0.5×
λ
×
M)/NA,said semi-shielding portion and said transparent portion transmit the exposing light in an identical phase with respect to each other, said auxiliary pattern transmits the exposing light in an opposite phase with respect to said semi-shielding portion and said transparent portion and is not transferred through exposure, and λ
indicates a wavelength of the exposing light, and M and NA respectively indicate magnification and numerical aperture of a reduction projection optical system of a projection aligner. - View Dependent Claims (2, 3, 4, 5, 6, 14, 15, 16, 17, 18, 19, 20)
-
-
7. A photomask comprising, on a transparent substrate:
-
a semi-shielding portion having a transmitting property against exposing light; a transparent portion surrounded with said semi-shielding portion and having a transmitting property against the exposing light; and an auxiliary pattern surrounded with said semi-shielding portion and provided around said transparent portion, wherein part of said semi-shielding portion is interposed between said transparent portion and said auxiliary pattern, said transparent portion is in the shape of a line with a width in a short side direction smaller than (0.65×
λ
×
M)/NA,said auxiliary pattern is a rectangular pattern and has a center line thereof in a position away from the center of said transparent portion by a distance not less than (0.25×
λ
×
M)/NA and not more than (0.45×
λ
×
M)/NA,said semi-shielding portion and said transparent portion transmit the exposing light in an identical phase with respect to each other, said auxiliary pattern transmits the exposing light in an opposite phase with respect to said semi-shielding portion and said transparent portion and is not transferred through exposure, and λ
indicates a wavelength of the exposing light, and M and NA respectively indicate magnification and numerical aperture of a reduction projection optical system of a projection aligner. - View Dependent Claims (8, 9, 10, 11, 12, 13)
-
-
21. A photomask comprising, on a transparent substrate:
-
a semi-shielding portion having a transmitting property against exposing light; a first transparent portion surrounded with said semi-shielding portion and having a transmitting property against the exposing light; an auxiliary pattern surrounded with said semi-shielding portion and provided around said first transparent portion, and a second transparent portion surrounded with said semi-shielding portion and having a transmitting property against the exposing light, wherein part of said semi-shielding portion is interposed between said first transparent portion and said auxiliary pattern, said auxiliary pattern includes a first auxiliary pattern disposed in an area sandwiched between said first transparent portion and said second transparent portion and a second auxiliary pattern disposed in the other area, said semi-shielding portion and said first and second transparent portions transmit the exposing light in an identical phase with respect to each other, and said auxiliary pattern transmits the exposing light in an opposite phase with respect to said semi-shielding portion and said first and second transparent portions and is not transferred through exposure. - View Dependent Claims (22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36)
-
Specification