Method for fabricating group-III nitride devices and devices fabricated using method
First Claim
1. A method for fabricating high light extraction photonic devices, comprising:
- growing a Group-III nitride epitaxial semiconductor device structure on a silicon carbide (SiC) substrate, said epitaxial semiconductor structure and substrate comprising an emitter adapted to emit light in response to a bias;
flip-chip mounting said emitter on a submount such that said epitaxial semiconductor device structure is sandwiched between said submount and said substrate, andetching said substrate off said epitaxial semiconductor device by utilizing an etch environment that etches said substrate substantially faster than said epitaxial semiconductor structure.
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Abstract
A method according to the present invention for fabricating high light extraction photonic devices comprising growing an epitaxial semiconductor structure on a substrate and depositing a first mirror layer on the epitaxial semiconductor structure such that the epitaxial semiconductor structure is sandwiched between the first mirror layer and the substrate. Flip-chip mounting the epitaxial semiconductor structure, with its first mirror and substrate on a submount such that the epitaxial semiconductor device structure is sandwiched between the submount and substrate. The substrate is then removed from the epitaxial structure by introducing an etch environment to the substrate. A second mirror layer is deposited on the epitaxial semiconductor structure such that the epitaxial semiconductor structure is sandwiched between the first and second mirror layers. A device according to the present invention comprising a resonant cavity light emitting diode (RCLED) mounted to a submount.
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Citations
47 Claims
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1. A method for fabricating high light extraction photonic devices, comprising:
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growing a Group-III nitride epitaxial semiconductor device structure on a silicon carbide (SiC) substrate, said epitaxial semiconductor structure and substrate comprising an emitter adapted to emit light in response to a bias; flip-chip mounting said emitter on a submount such that said epitaxial semiconductor device structure is sandwiched between said submount and said substrate, and etching said substrate off said epitaxial semiconductor device by utilizing an etch environment that etches said substrate substantially faster than said epitaxial semiconductor structure. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
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25. A method for fabricating high light extraction photonic devices, comprising:
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growing an epitaxial semiconductor structure on a silicon carbide substrate; depositing a first mirror layer on said epitaxial semiconductor structure such that said epitaxial semiconductor structure is sandwiched between said first mirror layer and said substrate; removing said substrate from said epitaxial structure by introducing an etch environment to said substrate; and depositing a second mirror layer on said epitaxial semiconductor structure such that said epitaxial semiconductor structure is sandwiched between said first and second mirror layers. - View Dependent Claims (26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38)
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39. A resonant cavity light emitting diode (RCLED), comprising:
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a thin film epitaxial semiconductor structure; a first mirror layer on one surface of said epitaxial semiconductor structure; a second mirror layer on another surface of said epitaxial semiconductor structure such that said epitaxial semiconductor structure is sandwiched between said first and second mirrors, said second mirror layer being less reflective than said first mirror layer; a submount, said epitaxial semiconductor structure with its said first and second mirrors mounted on said submount, said first mirror layer being adjacent to said submount and said second mirror layer being the primary emitting surface. - View Dependent Claims (40, 41, 42, 43, 44)
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45. A method for removing a silicon carbide substrate from a Group-III nitride epitaxial semiconductor material, comprising:
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growing a Group-III nitride epitaxial semiconductor material on a silicon carbide substrate; introducing an etch environment to said silicon carbide substrate, said etch environment etching silicon carbide faster than said Group-III nitride epitaxial material such that said etching substantially stops after said silicon carbide is etched off. - View Dependent Claims (46, 47)
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Specification