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System and method to correct for field curvature of multi lens array

  • US 7,332,733 B2
  • Filed: 10/05/2005
  • Issued: 02/19/2008
  • Est. Priority Date: 10/05/2005
  • Status: Expired due to Fees
First Claim
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1. A lithographic apparatus, comprising:

  • a patterning device that modulates a radiation beam; and

    a projection system that projects the modulated radiation beam onto a target portion of a substrate, the projection system comprising,an array of focusing elements, configured such that each focusing element in the array of focusing elements focuses a portion of the modulated radiation beam onto the substrate,wherein the array of focusing elements comprises a non-planar correction surface that is shaped such that focal points of the focusing elements lie closer to a single plane than they would if the correction surface were planar.

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