System and method to correct for field curvature of multi lens array

• US 7,332,733 B2
• Filed: 10/05/2005
• Issued: 02/19/2008
• Est. Priority Date: 10/05/2005
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Baselmans, Johannes Jacobus Matheus, Jorritsma, Laurentius Catrinus
• Primary Examiner(s): Epps; Georgia
• Assistant Examiner(s): WILLIAMS, DON J
• Application Number:
  US11/243,180
• Publication Number:
  US 20070075278A1
• Time in Patent Office: 867 Days
• Field of Search: 250/548, 250/204, 2502061-2063, 250/208.1, 250/559.17, 250/559.18, 355/55, 355/67, 355/71, 355/53, 355/77, 359/224, 356/328, 356/401, 356/419
• US Class Current: 250/548
• CPC Class Codes: G02B 27/0025 for optical correction, e.g. distorsion, aberration
• CPC Class Codes: G02B 3/0006 Arrays G02B3/02, G02B5/188 take precedence
• CPC Class Codes: G03F 7/2008 characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70308 Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift

Abstract

Focal plane errors across the field of an array of focusing elements are reduced by using a non-planar correction surface, shaped such that focal points of the focusing elements lie closer to a single plane than they would if the correction surface were planar. For example, this can be used when an array of focusing elements is used in a projection system of a lithography system.

Claims

1. A lithographic apparatus, comprising:

a patterning device that modulates a radiation beam; and

a projection system that projects the modulated radiation beam onto a target portion of a substrate, the projection system comprising,

an array of focusing elements, configured such that each focusing element in the array of focusing elements focuses a portion of the modulated radiation beam onto the substrate,

wherein the array of focusing elements comprises a non-planar correction surface that is shaped such that focal points of the focusing elements lie closer to a single plane than they would if the correction surface were planar.

2. The lithographic apparatus of claim 1, wherein the array of focusing elements comprises:

a base plate that is substantially transparent to the radiation beam; and

an array of lenses on a first side of the base plate,

wherein a second side of the base plate, opposite the first side, is shaped to form the non-planar correction surface.

3. The lithographic apparatus of claim 1, wherein the array of focusing elements comprises:

a plurality of focusing elements supported by a base plate; and

a correction plate, on which the non-planar correction surface is formed.

4. The lithographic apparatus of claim 3, wherein the correction plate is bonded to the base plate.

5. The lithographic apparatus of claim 4, wherein:

the base plate and the correction plate are substantially transparent to the radiation beam;

the focusing elements are lenses on a first side of the base plate; and

the correction plate is bonded to a second side of the base plate, opposite the first side.

6. The lithographic apparatus of claim 3, wherein the correction plate is connected to the base plate by fasteners.

7. The lithographic apparatus of claim 6, wherein:

the base plate and the correction plate are substantially transparent to the radiation beam;

the focusing elements are lenses on a first side of the base plate;

the non-planar correction surface is formed on a first side of the correction plate; and

the correction plate is fastened to the base plate, such that a second side of the base plate, opposite the respective first side, and a second side of the correction plate, opposite the respective first side, are held against each other.

8. The lithographic apparatus of claim 3, wherein the base plate is connected to the correction surface, such that the base plate deforms to conform to the shape of the correction surface.

9. The lithographic apparatus of claim 3, wherein the base plate and the correction plate have a substantially same coefficient of thermal expansion.

10. The lithographic apparatus of claim 3, wherein the base plate and the correction plate have a substantially same refractive index.

11. An array of focusing elements, comprising:

a non-planar correction surface shaped such that, when a radiation beam is incident on the array of focusing elements, respective focal points of each focusing element in the array of focusing elements lie closer to a single plane than they would if the correction surface were planar,

wherein each of the focusing elements focuses a portion of the radiation beam to the respective focal point for a given wavelength of radiation.

12. A device manufacturing method, comprising:

projecting a modulated radiation beam onto a substrate using a projection system comprising an array of focusing elements having a non-planar correction surface; and

using each focusing element in the array of focusing elements to focus a portion of the modulated radiation beam onto the substrate;

wherein the non-planar correction surface that is shaped such that focal points of the focusing elements lie closer to a single plane than they would if the correction surface were planar.

13. A flat panel display manufactured according to the method of claim 12.

14. An integrated circuit device manufactured according to the method of claim 12.

15. A method, comprising:

measuring a position of focal points of an array of focusing elements when a radiation beam is incident on the array of focusing elements;

determining a shape of a non-planar correction surface, based on the measuring step, such that when the correction surface is applied to the array of focusing elements, the focal points lie closer to a single plane than they did in the measuring step; and

providing the array of focusing elements with the correction surface shaped according to the determining step.

16. The method of claim 15, further comprising:

forming the array of focusing elements, comprising,

providing a base place that is substantially transparent to the radiation beam; and

coupling an array of lenses on a first side of the base plate;

wherein the step of providing the array of focusing elements with the correction surface comprises forming the shape on a second side of the base plate, opposite the first side.

17. The method of claim 15, wherein the step of providing the array of focusing elements with the correction surface comprises:

forming the shape on a correction plate; and

attaching the correction plate to the array of focusing elements.

18. A method of configuring a lithographic apparatus having a projection system comprising an array of focusing elements, such that each focusing element focuses a respective portion of a modulated radiation beam onto a substrate, comprising:

measuring positions of points to which the array of focusing elements focus the respective portions of the modulated radiation beam;

determining a shape of a non-planar correction surface, such that when the correction surface is applied to the array of focusing elements, the points to which the focusing elements focus the respective portions of the modulated radiation beam lie closer to a single plane than they did in the measuring step; and

providing the array of focusing elements with the correction surface shaped according to the determining step.

19. The method of claim 18, wherein the array of focusing elements comprises:

a base plate that is substantially transparent to the modulated radiation beam; and

an array of lenses on a first side of the base plate,

wherein the step of providing the projection system with the correction surface comprises forming the shape on a second side of the base plate, opposite the first side.

20. The method of claim 18, wherein the step of providing the array of focusing elements with the correction surface comprises:

forming the shape on a correction plate; and

installing the correction plate in the array of focusing elements.

21. The method of claim 20, wherein installing the correction plate the comprises attaching the correction plate to the array of focusing elements.