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Lithographic apparatus and device manufacturing method

  • US 7,333,178 B2
  • Filed: 05/31/2005
  • Issued: 02/19/2008
  • Est. Priority Date: 03/18/2002
  • Status: Expired due to Fees
First Claim
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1. A lithographic projection apparatus, comprising:

  • an illumination system configured to condition a beam of radiation;

    a support configured to support a patterning device, the patterning device configured to pattern the beam of radiation according to a desired pattern;

    a substrate table configured to hold a substrate; and

    a projection system configured to project the patterned beam of radiation onto a target portion of the substrate,wherein the illumination system comprises a field faceted mirror comprising a plurality of field facets and configured to receive radiation from a radiation source and form a plurality of images of the radiation source on corresponding pupil facets of a pupil faceted mirror, each of the field facets being configured to provide an illumination slit at a level of the patterning device, the illumination slits being summed and superimposed together at the level of the patterning device to illuminate the patterning device; and

    a first blade configured to block radiation from the radiation source, the first blade being selectively actuable to cover a portion of a selectable number of field facets.

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