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Semiconductor device and manufacturing method thereof

  • US 7,335,911 B2
  • Filed: 05/18/2004
  • Issued: 02/26/2008
  • Est. Priority Date: 07/22/1999
  • Status: Expired due to Fees
First Claim
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1. A display device comprising a pixel TFT disposed in a pixel section and a driver circuit comprising a p-channel TFT and an n-channel TFT disposed in a periphery of the pixel section, over a substrate, wherein:

  • the n-channel TFT of the driver circuit comprises;

    a gate electrode which has a tapered portion;

    a channel forming region;

    a first impurity region which forms an LDD region that is disposed in contact with the channel forming region and so as to be partly overlapped by the gate electrode; and

    a second impurity region which forms a source region or a drain region that is disposed on the outside of the first impurity region;

    the p-channel TFT of the driver circuit comprises;

    a gate electrode which has a tapered portion;

    a channel forming region;

    a third impurity region which forms an LDD region that is disposed in contact with the channel forming region and so as to be entirely overlapped by the gate electrode; and

    a fourth impurity region which forms a source region or a drain region which is disposed on the outside of the third impurity region;

    the pixel TFT comprises a gate electrode which has a tapered portion;

    a channel forming region;

    a first impurity region which forms an LDD region that is disposed in contact with the channel forming region and so as to be partly overlapped by the gate electrode; and

    a second impurity region which forms a source region or a drain region that is disposed on the outside of the first impurity region; and

    a pixel electrode that is disposed in the pixel section and has a light reflective surface is formed over a second interlayer insulating film comprising an organic insulating material; and

    is connected to the pixel TFT through an opening disposed at least in a first interlayer insulating film comprising an inorganic insulating material which is disposed over the gate electrode of the pixel TFT and in the second interlayer insulating film formed in close contact with the insulating film.

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