Inspection system and apparatus
First Claim
1. A system for inspection of a component having a surface with the component undergoing processing as part of a fabrication system, comprising:
- a rotatable sample stage for receiving a component;
a drive system to rotate the component;
a contact potential difference sensor system including a non-vibrating contact potential difference probe and a vibrating contact potential difference probe;
the non-vibrating contact potential difference probe generating a relative contact potential difference signal characteristic of at least one of contaminants and physical defects at the surface of the component as a result of a change in the contact potential difference generated by relative lateral motion of the non-vibrating contact potential difference probe and the component;
the vibrating contact potential difference probe generating an absolute contact potential difference signal characteristic of at least one of the contaminants and the physical defects at the surface of the component as a result of the change in the contact potential difference generated by the vibration of the vibrating contact potential difference probe while positioned over a point on the component; and
a computer system in communication with the contact potential difference sensor system, the computer system processing the relative contact potential difference signal and the absolute contact potential difference signal to inspect the surface of the component and provide analytical information about at least one of the contaminants and the physical defects of the surface of the component, thereby enabling quality control of the component as part of the fabrication system.
4 Assignments
0 Petitions
Accused Products
Abstract
A method and system for identifying a defect or contamination on a surface of a sample. The system operates by detecting changes in work function across a surface via both vCPD and nvCPD. It utilizes a non-vibrating contact potential difference (nvCPD) sensor for imaging work function variations over an entire sample. The data is differential in that it represents changes in the work function (or geometry or surface voltage) across the surface of a sample. A vCPD probe is used to determine absolute CPD data for specific points on the surface of the sample. The combination of vibrating and non-vibrating CPD measurement modes allows the rapid imaging of whole-sample uniformity, and the ability to detect the absolute work function at one or more points.
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Citations
20 Claims
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1. A system for inspection of a component having a surface with the component undergoing processing as part of a fabrication system, comprising:
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a rotatable sample stage for receiving a component; a drive system to rotate the component; a contact potential difference sensor system including a non-vibrating contact potential difference probe and a vibrating contact potential difference probe; the non-vibrating contact potential difference probe generating a relative contact potential difference signal characteristic of at least one of contaminants and physical defects at the surface of the component as a result of a change in the contact potential difference generated by relative lateral motion of the non-vibrating contact potential difference probe and the component; the vibrating contact potential difference probe generating an absolute contact potential difference signal characteristic of at least one of the contaminants and the physical defects at the surface of the component as a result of the change in the contact potential difference generated by the vibration of the vibrating contact potential difference probe while positioned over a point on the component; and a computer system in communication with the contact potential difference sensor system, the computer system processing the relative contact potential difference signal and the absolute contact potential difference signal to inspect the surface of the component and provide analytical information about at least one of the contaminants and the physical defects of the surface of the component, thereby enabling quality control of the component as part of the fabrication system. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A system for inspection of a semiconductor wafer having a surface with the semiconductor wafer undergoing processing as part of an in-line fabrication system, comprising:
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a rotatable sample stage for receiving a semiconductor wafer; a drive system to rotate the semiconductor wafer; a contact potential difference sensor system including a non-vibrating contact potential difference probe and a vibrating contact potential difference probe; the non-vibrating contact potential difference probe generating a relative contact potential difference signal characteristic of at least one of contaminants and physical defects at the surface of the semiconductor wafer as a result of a change in the contact potential difference generated by relative lateral motion of the non-vibrating contact potential difference probe and the semiconductor wafer; the vibrating contact potential difference probe generating an absolute contact potential difference signal characteristic of at least one of the contaminants and the physical defects at the surface of the semiconductor wafer as a result of the change in the contact potential difference generated by the vibration of the vibrating contact potential difference probe while positioned over a point on the semiconductor wafer; and a computer system in communication with the contact potential difference sensor system, the computer system processing the relative contact potential difference signal and the absolute contact potential difference signal to inspect the surface of the semiconductor wafer and provide analytical information about at least one of the contaminants and the physical defects of the surface of the semiconductor wafer, thereby enabling quality control of the semiconductor wafer as part of the in-line fabrication system. - View Dependent Claims (17, 18, 19, 20)
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Specification