Vacuum evaporator

• US 7,339,182 B2
• Filed: 01/05/2006
• Issued: 03/04/2008
• Est. Priority Date: 01/06/2005
• Status: Expired due to Fees

• Current Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Original Assignee: Samsung SDI Company Limited
• Inventors: Yu, Kyong-Tae, Ryu, Seoung-Yoon
• Primary Examiner(s): Porta; David
• Assistant Examiner(s): BOOSALIS, FANI POLYZOS
• Application Number:
  US11/325,348
• Publication Number:
  US 20060145103A1
• Time in Patent Office: 789 Days
• Field of Search: 250/581, 250/582, 250/484.4, 250/370.11, 250/306, 427/66, 427/78, 118/620
• US Class Current: 250/581
• CPC Class Codes: C23C 14/546 using crystal oscillators

Abstract

A vacuum evaporator including a vacuum chamber and a source arranged in the vacuum chamber to supply a deposition material to a substrate on which a layer is formed. A crystal sensor measures a deposition speed of the deposition material. The crystal sensor includes an insert having a hole, and the insert is arranged in front of the crystal sensor.

Claims

1. A vacuum evaporator, comprising:

a vacuum chamber;

a source arranged at a bottom of the vacuum chamber, to receive a deposition material therein, the source comprising a heater at an exterior thereof;

a substrate fixture to fix a substrate over the source, the deposition material from the source for deposition on the substrate;

a crystal sensor arranged at a side of the substrate; and

an insert having a hole in front of the crystal sensor.

2. The vacuum evaporator of claim 1, wherein the deposition material is one of an organic material and an inorganic material.

3. The vacuum evaporator of claim 1, wherein two inserts are arranged in front of the crystal sensor.

4. The vacuum evaporator of claim 1, wherein the hole has a diameter in a range of 5 mm to 13 mm.

5. The vacuum evaporator of claim 4, wherein the hole has a diameter of 8 mm.

6. The vacuum evaporator of claim 4, wherein the hole has a diameter of 13 mm.

7. The vacuum evaporator of claim 1, wherein the insert is fixed in front of the crystal sensor by a supporter.

8. The vacuum evaporator of claim 1, wherein the hole is arranged substantially in a center of the insert.

9. A vacuum evaporator, comprising:

a vacuum chamber;

a source arranged in the vacuum chamber to supply a deposition material to a substrate;

a crystal sensor to measure a deposition speed of the deposition material; and

an insert having a hole, the insert being arranged in front of the crystal sensor.

10. The vacuum evaporator of claim 9, wherein the deposition material is one of an organic material and an inorganic material.

11. The vacuum evaporator of claim 9, wherein two inserts are arranged in front of the crystal sensor.

12. The vacuum evaporator of claim 9, wherein the hole has a diameter in a range of 5 mm to 13 mm.

13. The vacuum evaporator of claim 12, wherein the hole has a diameter of 8 mm to 13 mm.

14. The vacuum evaporator of claim 9, wherein the insert is fixed in front of the crystal sensor by a supporter.

15. The vacuum evaporator of claim 9, wherein the hole is arranged substantially in a center of the insert.

16. The vacuum evaporator of claim 15, wherein the source is arranged at a bottom of the vacuum chamber, the substrate is arranged over the source, and the crystal sensor is arranged at a side of the substrate.

17. The vacuum evaporator of claim 16, wherein the insert is fixed in front of the crystal sensor by a supporter, the supporter being coupled with the crystal sensor.