Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition model
First Claim
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1. A method for modeling a photolithography process comprising the steps of:
- generating a calibrated model of said photolithography process, said calibrated model capable of estimating an image to be produced by said photolithography process when utilized to image a mask pattern containing a plurality of features;
determining an operational window of said calibrated model, said operational window defining if said calibrated model can accurately estimate the image to be produced by a given feature in said mask pattern,comparing said plurality of features of said mask pattern to said operational window of said calibrated model, andidentifying said plurality of features of said mask pattern that are not within the operational window of said calibrated model.
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Abstract
A method for modeling a photolithography process which includes the steps of generating a calibrated model of the photolithography process capable of estimating an image to be produced by the photolithography process when utilized to image a mask pattern containing a plurality features; and determining an operational window of the calibrated model, which defines whether or not the calibrated model can accurately estimate the image to be produced by a given feature in the mask pattern.
40 Citations
12 Claims
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1. A method for modeling a photolithography process comprising the steps of:
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generating a calibrated model of said photolithography process, said calibrated model capable of estimating an image to be produced by said photolithography process when utilized to image a mask pattern containing a plurality of features; determining an operational window of said calibrated model, said operational window defining if said calibrated model can accurately estimate the image to be produced by a given feature in said mask pattern, comparing said plurality of features of said mask pattern to said operational window of said calibrated model, and identifying said plurality of features of said mask pattern that are not within the operational window of said calibrated model. - View Dependent Claims (2, 3, 4)
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5. A computer readable medium configured to store program instructions for execution by at least one programmable computer, wherein execution of the program instructions by at least one programmable computer causes the at least one programmable computer to perform a sequence of steps for modeling a photolithography process, said sequence of steps comprising:
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generating a calibrated model of said photolithography process, said calibrated model capable of estimating an image to be produced by said photolithography process when utilized to image a mask pattern containing a plurality of features; determining an operational window of said calibrated model, said operational window defining if said calibrated model can accurately estimate the image to be produced by a given feature in said mask pattern, comparing said plurality of features of said mask pattern to said operational window of said calibrated model, and identifying said plurality of features of said mask pattern that are not within the operational window of said calibrated model. - View Dependent Claims (6, 7, 8)
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9. An apparatus for modeling a photolithography process, said apparatus comprising:
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means for generating a calibrated model of said photolithography process, said calibrated model capable of estimating an image to be produced by said photolithography process when utilized to image a mask pattern containing a plurality of features; means for determining an operational window of said calibrated model, said operational window defining if said calibrated model can accurately estimate the image to be produced by a given feature in said mask pattern, means for comparing said plurality of features of said mask pattern to said operational window of said calibrated model, and means for identifying said plurality of features of said mask pattern that are not within the operational window of said calibrated model. - View Dependent Claims (10, 11, 12)
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Specification