Lithographic alignment system and device manufacturing method

• US 7,345,739 B2
• Filed: 03/05/2004
• Issued: 03/18/2008
• Est. Priority Date: 03/07/2003
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV), Koninklijke Philips Electronics N.V. (Koninklijke Philips N.V.)
• Inventors: Monshouwer, Rene, Hendriks, Robert Frans Maria, Lenderink, Egbert, Van Der Lee, Alexander Marc, 'T Hooft, Gert Wim
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US10/792,909
• Publication Number:
  US 20050110965A1
• Time in Patent Office: 1,474 Days
• Field of Search: 355/53, 355/55, 355 67- 71, 356399-401, 250/548, 372/26
• US Class Current: 355/55
• CPC Class Codes: G03F 7/70216 Mask projection systems
• CPC Class Codes: G03F 7/70483 Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
• CPC Class Codes: G03F 9/7065 Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength

Abstract

A lithographic apparatus equipped with an improved alignment system, is presented herein. In one embodiment, the apparatus includes a radiation system for providing a projection beam of radiation, a support structure for supporting a patterning device that configures the projection beam according to a desired pattern, a substrate holder for holding a substrate, projection system for projecting the patterned beam onto a target portion of the substrate, and an alignment system. The alignment system includes a radiation source for illuminating at least one mark which is usable for alignment on a substrate and an imaging system for imaging light which has interacted with the at least one mark to generate alignment information.

Claims

1. A lithographic apparatus comprising:

a support structure configured to support a patterning device, the patterning device arranged to configure a beam of radiation in accordance with a desired pattern;

a substrate holder configured to hold a substrate;

a projection system configured to project said patterned beam onto a target portion of the substrate; and

an alignment system comprising;

a radiation source configured to illuminate at least one mark on said substrate that is usable for alignment, said radiation source including a first mechanism configured to generate a coherent ray of light having a first wavelength spectrum which is narrow and a second mechanism that is configured to guide said ray of light, said second mechanism having a second wavelength spectrum that is broader than said first wavelength spectrum, and

an imaging system configured to image light which has interacted with said at least one mark to provide alignment information.

2. The lithographic apparatus of claim 1, wherein said first mechanism comprises a laser.

3. The lithographic apparatus of claim 2, wherein said laser comprises a pulsed laser.

4. The lithographic apparatus of claim 1, wherein said second mechanism comprises an optical fiber.

5. The lithographic apparatus of claim 4, wherein said fiber comprises a core extending in the axial direction of the fiber, the core being substantially surrounded by a medium with an index of refraction which is lower than the index of refraction of the core.

6. The lithographic apparatus of claim 5, wherein said fiber comprises at least one channel, each channel extending substantially along the axial direction of the fiber with said core being free from any channels extending substantially into the axial direction of the fiber.

7. The lithographic apparatus of claim 6, wherein said fiber comprises a plurality of channels that are arranged in a hexagonal close packed configuration.

8. The lithographic apparatus of claim 7, wherein each of said channels has a diameter which is of the order of the diameter of said core.

9. The lithographic apparatus of claim 7, wherein a ratio of the diameter of a channel to a channel pitch is between 0.4 and 0.8.

10. The lithographic apparatus of claim 6, wherein said at least one channel is filled with a gas or comprises a vacuum.

11. The lithographic apparatus of claim 5, wherein said fiber comprises at least one taper along the axial direction.

12. The lithographic apparatus of claim 1, wherein said second wavelength spectrum corresponds substantially to a wavelength spectrum of white light.

13. The lithographic apparatus of claim 1, wherein said alignment system is arranged as an off-axis alignment system.

14. The lithographic apparatus of claim 1, wherein said imaging system is configured to image onto one single image plane at least two distinct light wavelengths which are diffracted from a phase grating on said substrate.

15. An alignment system for use in an apparatus which reproducibly processes substrates held on a substrate table, said alignment system comprising:

a radiation source configured to illuminate at least one mark on said substrate that is usable for alignment, said radiation source including;

a first mechanism configured to generate a coherent ray of light having a first wavelength spectrum which is narrow, and

a second mechanism that is configured to guide said ray of light, said second mechanism having a second wavelength spectrum that is broader than said first wavelength spectrum; and

an imaging system configured to image light which has interacted with said at least one mark to provide alignment information.

18. The alignment system of claim 15, wherein said first mechanism comprises a laser.

19. The alignment system of claim 15, wherein said second mechanism comprises an optical fiber.

20. The alignment system of claim 19, wherein said fiber comprises a core extending in the axial direction of the fiber, the core being substantially surrounded by a medium with an index of refraction which is lower than the index of refraction of the core.

16. A device manufacturing method, comprising:

providing a substrate that is at least partially covered by a layer of radiation-sensitive material;

providing a beam of radiation using a radiation system;

using a patterning device to endow said beam of radiation with a desired pattern in its cross-section;

projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material; and

aligning the substrate using an alignment system, said aligning comprising;

illuminating at least one mark on said substrate which is usable for alignment by producing coherent light having a high brightness and a first wavelength spectrum which is narrow and guiding said coherent light with a structure that has a second wavelength spectrum that is broader than the first wavelength spectrum, and

imaging light which has interacted with said at least one mark to derive alignment information.

17. The device manufacturing method of claim 16, wherein said alignment system is configured as an off-axis alignment system.