Continuously tunable RF MEMS capacitor with ultra-wide tuning range

• US 7,345,866 B1
• Filed: 05/13/2005
• Issued: 03/18/2008
• Est. Priority Date: 05/13/2005
• Status: Expired due to Fees

• Current Assignee: HRL Laboratories LLC (The Boeing Co.)
• Original Assignee: HRL Laboratories LLC (The Boeing Co.)
• Inventors: Chang, David, Hsu, Tsung-Yuan
• Primary Examiner(s): Ha; Nguyen T.
• Application Number:
  US11/128,407
• Time in Patent Office: 1,040 Days
• Field of Search: 361272-277, 361278-280, 361287-291, 361/283.1, 361/283.3, 324/661, 331/16, 331/34, 331/36
• US Class Current: 361/277
• CPC Class Codes: H01G 5/18 due to change in inclination, e.g. by flexing, by spiral wrapping

Abstract

A method is provided of continuously varying the capacitance of a MEMS varactor having a cantilever assembly mounted on a base portion, the cantilever assembly having a first capacitance plate and a dielectric element mounted thereon, and the base portion having a second capacitance plate mounted thereon. The method includes applying a first actuation voltage to deform the cantilever assembly until the dielectric element contacts the second capacitance plate leaving a gap therebetween, and applying a second actuation voltage larger than the first actuation voltage to further deform the cantilever assembly to reduce the gap between the dielectric element and the second capacitance plate.

Claims

1. A MEMS varactor comprising:

a base portion including a first actuation electrode;

a cantilever assembly mounted on the base portion, the cantilever assembly including a second actuation electrode;

a first capacitance plate attached to the cantilever assembly;

a second capacitance plate attached to the base portion; and

a dielectric element disposed between the first capacitance plate and the second capacitance plate;

wherein the cantilever assembly is deformable towards the base portion in response to a voltage difference between the first actuation electrode and the second actuation electrode resulting in a change in the distance between the first capacitance plate and the second capacitance plate.

2. The varactor of claim 1, wherein the dielectric element comes into partial contact with both the first capacitance plate and the second capacitance plate when the cantilever assembly is sufficiently deformed towards the base portion.

3. The varactor of claim 2, wherein the dielectric element comes into complete contact with both the first capacitance plate and the second capacitance plate when the cantilever assembly is sufficiently deformed towards the base portion.

4. The varactor of claim 2, wherein the cantilever assembly is further deformable after the point at which the dielectric element has come into partial contact with both the first capacitance plate and the second capacitance plate through the application of a three-point load.

5. The varactor of claim 1, wherein the cantilever assembly includes a rigid, non-deforming portion.

6. The varactor of claim 1, wherein the dielectric element is attached to the cantilever.

7. The varactor of claim 1, wherein the dielectric element is attached to the first capacitance plate.

8. The varactor of claim 1, wherein the dielectric element is attached to the base portion.

9. The varactor of claim 1, wherein the dielectric element is attached to the second capacitance plate.

10. The varactor of claim 1, wherein the dielectric element comprises silicon nitride.

11. A method of continuously varying the capacitance of a MEMS varactor, the method comprising:

providing a MEMS varactor having a cantilever assembly mounted on a base portion, the cantilever assembly having a first capacitance plate and a dielectric element mounted thereon, and the base portion having a second capacitance plate mounted thereon;

applying a first actuation voltage to deform the cantilever assembly until the dielectric element contacts the second capacitance plate leaving a gap therebetween; and

applying a second actuation voltage larger than the first actuation voltage to further deform the cantilever assembly to reduce the gap between the dielectric element and the second capacitance plate.

12. The method of claim 11, wherein the cantilever assembly includes a rigid, non-deforming portion.

13. The method of claim 11, wherein applying the second actuation voltage causes the cantilever assembly to deform under a three-point load.

14. The method of claim 11, further comprising applying a third actuation voltage larger than either of the first or second actuation voltages to further deform the cantilever assembly and eliminate the gap between the dielectric element and the second capacitance plate.

15. The method of claim 14, wherein applying a third actuation voltage results in a conformal contact between the dielectric element and the second electrode.

16. The method of claim 14, wherein the third actuation voltage is applied across a pair of actuation electrodes disposed between the cantilever assembly and the base portion.

17. The method of claim 11, wherein applying a second actuation voltage results in a non-conformal contact between the dielectric element and the second electrode.

18. The method of claim 11, wherein the first actuation voltage and the second actuation voltage are applied across a pair of actuation electrodes disposed between the cantilever assembly and the base portion.

19. The method of claim 11, wherein the dielectric element comprise silicon nitride.