Method of operating an advanced process controller by dynamically adapting hierarchy levels

• US 7,346,407 B2
• Filed: 10/12/2005
• Issued: 03/18/2008
• Est. Priority Date: 02/28/2005
• Status: Active Grant

• Current Assignee: Advanced Micro Devices, Inc.
• Original Assignee: Advanced Micro Devices, Inc.
• Inventors: Wagner, Heiko, Raebiger, Jan
• Primary Examiner(s): Picard, Leo
• Assistant Examiner(s): ORTIZ RODRIGUEZ, CARLOS R
• Application Number:
  US11/248,562
• Publication Number:
  US 20060195213A1
• Time in Patent Office: 888 Days
• Field of Search: 700 47- 51, 700108-109, 700/169, 700/29, 700/121, 700/97, 706 45- 47
• US Class Current: 700/97
• CPC Class Codes: G05B 19/41845 characterised by system universality, reconfigurability, modularity
• CPC Class Codes: G05B 2219/35391 Sort, order entered data hierarchical
• CPC Class Codes: G05B 2219/45031 Manufacturing semiconductor wafers
• CPC Class Codes: Y02P 90/02 Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Abstract

By providing a detailed hierarchical structure for an APC algorithm and by dynamically adapting a hierarchical level in this structure, an efficient utilization of controller data is ensured, while at the same time a large number of process conditions may be taken into consideration without requiring a re-design of the hierarchical structure.

Claims

1. A method, comprising:

establishing a hierarchy structure for an APC algorithm designed to provide a parameter setting for a first process tool of a specified manufacturing environment, said hierarchy structure including a plurality of hierarchy levels, each hierarchy level comprising a plurality of items associated with the first process tool;

determining a parameter setting for each item in each of the hierarchy levels based on measurement data;

comparing, on a hierarchy level basis, said parameter settings of items of a current hierarchy level with each other to obtain a comparison result; and

selecting a second hierarchy level above the current hierarchy level for controlling said first process tool based on said determined parameter settings responsive to said comparison result indicating a difference less than a predefined range.

2. The method of claim 1, further comprising selecting a third hierarchy level below said current hierarchy level for controlling said first process tool responsive to said comparison result indicating a difference greater than a predefined threshold in one specific hierarchy level below said current hierarchy level.

3. The method of claim 1, further comprising selecting a third hierarchy level for at least one specified item in a hierarchy level below said second hierarchy level, said third hierarchy level being relevant for all items in said hierarchy structure that are related to said one specified item and said second hierarchy level being relevant for the remaining items.

4. A method, comprising:

establishing an APC algorithm for a specified manufacturing environment including at least a first process tool and a second process tool to be controlled based on a parameter setting provided by said APC algorithm based on measurement data, said APC algorithm comprising a hierarchy structure comprising a plurality of items arranged in a plurality of hierarchy levels; and

dynamically selecting some of the plurality of items at a first hierarchy level for controlling the first process tool and at a second hierarchy level different than the first hierarchy level for controlling the second process tool based on parameter settings determined for said plurality of items for items in levels below the first hierarchy level for the first process tool and items below the second hierarchy level for the second process tool by;

considering a parameter setting for each item in each of the hierarchy levels below the first and second hierarchy levels;

selecting a different hierarchy level for controlling a selected one of the first or second process tools based on said considered parameter settings by comparing, on a level basis, said parameter settings of items of a current hierarchy level associated with the selected process tool and hierarchy levels below said current hierarchy level, which are correlated by said hierarchy structure with one item of a hierarchy level below said current hierarchy level, with each other to obtain a comparison result; and

selecting the different hierarchy level to be one level above said current hierarchy level when said comparison result for items of the current hierarchy level indicates a difference that is less than a predefined range.

5. The method of claim 4, wherein, when said comparison result indicates a difference in one specific hierarchy level below said current hierarchy level, said specific hierarchy level is selected as the different hierarchy level.

6. The method of claim 4, further comprising selecting a third hierarchy level for at least one specified item in a hierarchy level below said different hierarchy level, said third hierarchy level being relevant for all items in said lower hierarchy level that are related to said one specified item and said different hierarchy level being relevant for the remaining items.