Liquid crystal display and manufacturing method of the same
First Claim
1. A method for manufacturing a liquid crystal display, the method comprising:
- forming gate lines and a gate electrode on a substrate;
forming a gate insulating film on the substrate, including the gate electrode;
forming a first active layer on the gate insulating film corresponding to an upper portion of the gate electrode and forming a second active layer on the gate insulating film corresponding to a pixel electrodes that is to be formed;
forming source/drain electrodes on an upper portion of the first active layer;
forming a passivation film on the whole surface of the active layer including the source/drain electrodes; and
forming the pixel electrode connected to the drain electrode on the passivation film.
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Accused Products
Abstract
A liquid crystal display includes a plurality of gate lines (GØ-Gn), a plurality of data lines (D1-Dn) formed in a direction crossing the gate lines, a plurality of pixel electrodes formed in a pixel area defined by the gate lines and the data lines, the pixel electrodes indicating pictures by a control of the corresponding gate lines, and a light volume adjusting layer formed on a lower layer of the pixel electrodes controlled by a second one of the gate lines (G1). A method for manufacturing a liquid crystal display includes the steps of: forming gate lines and a gate electrode on a substrate, forming a gate insulating film on the board including the gate electrode, forming a first active layer on the gate insulating film corresponding to an upper portion of the gate electrode and forming a second active layer on the gate insulating film corresponding to a portion where pixel electrodes are formed, forming source/drain electrodes on an upper portion of the first active layer, and forming a passivation film on the whole surface of the active layer including the source/drain electrodes.
21 Citations
8 Claims
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1. A method for manufacturing a liquid crystal display, the method comprising:
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forming gate lines and a gate electrode on a substrate; forming a gate insulating film on the substrate, including the gate electrode; forming a first active layer on the gate insulating film corresponding to an upper portion of the gate electrode and forming a second active layer on the gate insulating film corresponding to a pixel electrodes that is to be formed; forming source/drain electrodes on an upper portion of the first active layer; forming a passivation film on the whole surface of the active layer including the source/drain electrodes; and forming the pixel electrode connected to the drain electrode on the passivation film. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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Specification