Non-photolithographic method for forming a wire grid polarizer for optical and infrared wavelengths

• US 7,351,346 B2
• Filed: 11/30/2004
• Issued: 04/01/2008
• Est. Priority Date: 11/30/2004
• Status: Expired due to Fees

• Current Assignee: Agoura Technologies, Inc.
• Original Assignee: Agoura Technologies, Inc.
• Inventors: Little, Michael J.
• Primary Examiner(s): OLSEN, ALLAN W
• Application Number:
  US11/001,449
• Publication Number:
  US 20060113279A1
• Time in Patent Office: 1,218 Days
• Field of Search: None
• US Class Current: 216/41
• CPC Class Codes: G02B 5/3058 comprising electrically conductive elements, e.g. wire grids, conductive particles

Abstract

A method for forming a plurality of parallel metal lines on a substrate of thin film elastomeric material and a wire grid polarizer formed by such method. A sacrificial layer is formed by coating the substrate with a water soluble polymer while the substrate is stretched. The existing tensile force is removed, leaving an undulating topology of buckled sacrificial layer material. A masking layer is then deposited at an oblique angle and then fractured into parallel lines of material by application of a second tensile force. Unmasked portions of the sacrificial layer are removed by dry etch. A metallic layer is then deposited and a lift off process employed to remove remaining portions of the sacrificial layer and materials deposited thereover. Upon removal of the second tensile force, the substrate returns to its unstressed length with metal lines of predetermined periodicity thereon.

Claims

1. A method for forming a plurality of substantially-straight metallic lines of predetermined periodicity Λ

on a thin film substrate of elastomeric material having an unstressed length, said method comprising the steps of;

a) applying a first uniaxial tensile force to stress said substrate whereby said substrate is elongated from said unstressed length to a first stressed length;

then

b) coating said elongated substrate with a sacrificial layer of material;

then

c) removing said first uniaxial tensile force from said coated substrate whereby said substrate assumes substantially said unstressed length and said material of said sacrificial layer buckles to assume a repetitive undulating topology of periodicity Λ

;

then

d) depositing a masking layer of material at an oblique angle with respect to said buckled layer so that said material of said masking layer is arranged into regions of alternating thickness of periodicity Λ

;

then

e) applying a second uniaxial tensile force that exceeds said first uniaxial tensile force to said substrate so that said substrate is elongated to a second stressed length exceeding said first stressed length whereby said material of said masking layer is fractured into a plurality of lines of periodicity Λ

′

;

then

f) removing regions of said sacrificial layer that lie between said lines of material of said masking layer;

then

g) depositing a metallic layer onto said substrate whereby said metallic layer overlies said lines of said masking layer and exposed portions of said substrate;

then

h) removing said lines of material of said masking layer, underlying portions of said sacrificial layer and portions of said metallic layer that overlie said lines of material of said masking layer, leaving parallel lines of said metallic layer of periodicity Λ

′

that directly overlie said substrate; and

then

i) removing said second uniaxial tensile force from said substrate whereby said substate is relaxed to substantially said unstressed length the periodicity of said lines of material of said metallic layer is reduced to Λ

.

2. A method as defined in claim 1 wherein said sacrificial layer comprises a water-soluble polymer.

3. A method as defined in claim 2 further including the step of removing said lines of material of said masking layer, underlying portions of said sacrificial layer and portions of said metallic layer that overlie said lines of material of said masking layer by a lift off process.

4. A method as defined in claim 3 wherein said lift off process includes the step of applying water as solvent.

5. A method as defined in claim 1 wherein said substrate comprises poly(dimethylsiloxane).

6. A method as defined in claim 1 wherein said masking layer comprises metallic material.

7. A method as defined in claim 1 wherein said masking layer comprises dielectric material.

8. A method as defined in claim 1 further comprising the step of removing regions of said sacrificial layer that lie between said lines of material of said masking layer by reactive ion etching.

9. A method as defined in claim 1 further including the step of vacuum deposition of said masking layer.

10. A wire grid polarizer formed by the process of:

a) applying a first uniaxial tensile force to stress a thin film substrate of elastomeric material having an unstressed length whereby said substrate is elongated from said unstressed length to a first stressed length;

then

b) coating said elongated substrate with a first layer of material;

then

c) removing said first uniaxial tensile force from said coated substrate whereby said substrate assumes substantially said unstressed length and said material of said first layer buckles to assume a repetitive undulating topology of periodicity Λ

;

then

d) depositing a second layer of material at an oblique angle with respect to said buckled first layer so that said material of said second layer is arranged into regions of alternating thickness of periodicity Λ

;

then

e) applying a second uniaxial tensile force that exceeds said first uniaxial tensile force to said substrate so that said substrate is elongated to a second stressed length exceeding said first stressed length whereby said material of said second layer is fractured into a plurality of lines of periodicity Λ

′

;

then

f) removing regions of said first layer that lie between said lines of material of said second layer;

then

g) depositing a metallic layer onto said lines of material and regions exposed by removal of said regions of said first layer whereby said metallic layer overlies said lines of said second layer and exposed portions of said substrate;

then

h) removing said lines of material of said second layer, underlying portions of said first layer and portions of said metallic layer that overlie said lines of material of said second layer, leaving lines of material of said metallic layer of periodicity Λ

′

that directly overlie said substrate; and

then

i) removing said second uniaxial tensile force from said substrate whereby said substate is relaxed to substantially said unstressed length the periodicity of said lines of material of said metallic layer is reduced to Λ

.

11. A wire grid polarizer as defined in claim 10 wherein said first layer comprises a water-soluble polymer.

12. A wire grid polarizer as defined in claim 11 further including the step of removing said lines of material of said second layer, underlying portions of said first layer and portions of said metallic layer that overlie said lines of material of said second layer by a lift off process.

13. A wire grid polarizer as defined in claim 12 wherein said lift off process includes the step of applying water as solvent.

14. A wire grid polarizer as defined in claim 10 wherein said substrate comprises poly(dimethylsiloxane).

15. A wire grid polarizer as defined in claim 10 wherein said second layer comprises metallic material.

16. A wire grid polarizer as defined in claim 10 wherein said second layer comprises dielectric material.

17. A wire grid polarizer as defined in claim 10 further comprising the step of removing regions of said first layer that lie between said lines of material of said second layer by reactive ion etching.

18. A wire grid polarizer as defined in claim 10 further including the step of vacuum deposition of said second layer.