Removable antireflection film

• US 7,351,470 B2
• Filed: 04/29/2002
• Issued: 04/01/2008
• Est. Priority Date: 02/19/1998
• Status: Expired due to Fees

• Current Assignee: 3M Innovative Properties Company (3M Company)
• Original Assignee: 3M Innovative Properties Company (3M Company)
• Inventors: Smyth, William K., Kluge, Bruce D., Draheim, Erica J., Liu, Junkang J., Nagarkar, Pradnya V., Fong, Bettie C.
• Primary Examiner(s): EDWARDS, NEWTON O
• Application Number:
  US10/134,150
• Publication Number:
  US 20030012936A1
• Time in Patent Office: 2,164 Days
• Field of Search: 428/339, 428/212, 428/220, 428/432, 428/699, 428/701, 428/702, 428/343, 428/354, 359/603
• US Class Current: 428/339
• CPC Class Codes: C08F 2/44 Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
• CPC Class Codes: C08F 222/103 of trialcohols, e.g. trimethylolpropane tri(meth)acrylate
• CPC Class Codes: C08F 222/105 of pentaalcohols
• CPC Class Codes: C08F 290/06 Polymers provided for in subclass C08G
• CPC Class Codes: C08F 290/062 Polyethers
• CPC Class Codes: C08G 65/007 containing fluorine
• CPC Class Codes: C08L 2666/02 Organic macromolecular compounds, natural resins, waxes or and bituminous materials
• CPC Class Codes: C08L 2666/04 Macromolecular compounds according to groups C08L7/00 - C08L49/00, or C08L55/00 - C08L57/00; Derivatives thereof
• CPC Class Codes: C08L 53/00 Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
• CPC Class Codes: C09D 153/00 Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
• CPC Class Codes: C09D 171/02 Polyalkylene oxides
• CPC Class Codes: C09D 4/00 Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
• CPC Class Codes: C09D 4/06 Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
• CPC Class Codes: C09J 153/00 Adhesives based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers
• CPC Class Codes: C09J 2433/00 Presence of (meth)acrylic polymer
• CPC Class Codes: C09J 7/22 Plastics; Metallised plastics
• CPC Class Codes: C09J 7/30 characterised by the adhesive composition
• CPC Class Codes: G01N 1/36 Embedding or analogous mounting of samples
• CPC Class Codes: G02B 1/111 using layers comprising organic materials
• CPC Class Codes: G02B 21/34 Microscope slides, e.g. mounting specimens on microscope slides
• CPC Class Codes: G06F 1/1609 : to support filters or lenses
• CPC Class Codes: G06F 1/1626 : with a single-body enclosure integrating a flat display, e.g. Personal Digital Assistants [PDAs]
• CPC Class Codes: G06F 3/041 : Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
• CPC Class Codes: H01J 29/868 : Screens covering the input or output face of the vessel, e.g. transparent anti-static coatings, X-ray absorbing layers
• CPC Class Codes: H04N 5/65 : Holding-devices for protective discs or for picture masks
• CPC Class Codes: H04N 9/3141 : Constructional details thereof details not peculiar to the presence of an electronic spatial light modulator G03B21/14
• CPC Class Codes: Y10T 428/24975 : No layer or component greater than 5 mils thick
• CPC Class Codes: Y10T 428/269 : including synthetic resin or polymer layer or component
• CPC Class Codes: Y10T 428/28 : Web or sheet containing structurally defined element or component and having an adhesive outermost layer
• CPC Class Codes: Y10T 428/2848 : Three or more layers

Abstract

An antireflection film and method of making same includes a substrate having a first surface and a second surface, an inorganic layer deposited on the first surface of the substrate, and an optically active polymer layer formed by curing a curable composition in situ on the inorganic layer, the polymer layer having a refractive index not greater than about 1.53 over the wavelength range of 400 nm to 700 nm and a thickness of from about 20 nm to about 200 nm, and an adhesive layer deposited on the second surface of the substrate.

Claims

1. An antireflection film comprising:

a substrate having a first surface and a second surface;

an inorganic layer deposited on the first surface of the substrate;

an optically active polymer layer formed by curing a curable composition in situ on the inorganic layer, the polymer layer having a refractive index not greater than about 1.53 over the wavelength range of 400 nm to 700 nm and a thickness of from about 20 run, to about 200 nm; and

an adhesive layer deposited on the second surface of the substrate.

2. The antireflection film of claim 1 wherein the inorganic layer comprises a material selected from the group consisting of a metal oxide, a nitride, nickel, chromium, silica or any combination thereof.

3. The antireflection film of claim 2 wherein the metal oxide is selected from the group consisting of indium oxide, titanium dioxide, nickel oxide, chromium oxide, cadmium oxide, gallium indium oxide, niobium pentoxide, indium tin oxide, tin dioxide, or any combination thereof.

4. The antireflection film of claim 3 wherein the metal oxide layer has a thickness of from about 10 to about 30 nm and the polymer layer has a thickness of from about 80 nm to about 150 nm.

5. The antireflection film of claim 4 wherein the metal oxide layer has a thickness of from about 17 nm to about 23 nm and the polymer layer has a thickness of from about 110 nm to about 130 nm.

6. The antireflection film of claim 2 wherein the nitride is selected from the group consisting of silicon nitride, titanium nitride, or a combination thereof.

7. The antireflection film of claim 2 wherein the inorganic layer comprises a first metal oxide layer, a silica layer, and a second metal oxide layer, wherein the silica layer is disposed between the first metal oxide layer and the second metal oxide layer and wherein the first metal oxide layer is deposited on the first surface of the substrate.

8. The antireflection film of claim 7 wherein the first metal oxide layer has a thickness of from about 20 nm to about 35 nm, the silica layer has a thickness of from about 10 nm to about 25 nm, the second metal oxide layer has a thickness of from about 50 nm to about 100 nm and the polymer layer has a thickness of from about 70 nm to about 120 nm.

9. The antireflection film of claim 8 wherein the first metal oxide layer has a thickness of from about 25 nm to about 30 nm, the silica layer has a thickness of from about 15 nm to about 20 nm, the second metal oxide layer has a thickness of from about 65 nm to about 80 nm and the polymer layer has a thickness of from about 85 nm to about 100 nm.

10. The antireflection film of claim 2 wherein the inorganic layer comprises a metal oxide layer and a silica layer, wherein the metal oxide layer is deposited on the first surface of the substrate and the silica layer is deposited on the metal oxide layer.

11. The antireflection film of claim 10 wherein the metal oxide layer has a thickness of from about 10 nm to about 30 nm, the silica layer has a thickness of from about 10 nm to about 120 nm and the polymer layer has a thickness of from about 50 nm to about 130 nm.

12. The antireflection film of claim 11 wherein the metal oxide layer has a thickness of from about 10 nm to about 20 nm, the silica layer has a thickness of from about 10 nm to about 50 nm, and the polymer layer has a thickness of from about 60 nm to about 100 nm.

13. The antireflection film of claim 1 wherein the polymer layer has a refractive index not greater than about 1.50 over the wavelength range of 400 nm to 700 nm.

14. The antireflection film of claim 1 wherein the polymer layer comprises repeating units derived from a fluoroalkene, an acrylate with silicone, a methacrylate, a polyfunctional acrylate monomer, or any combination thereof.

15. The antireflection film of claim 1 wherein the polymer layer comprises repeating units derived from a fluoroalkene and repeating units derived from an acrylate with silicone and wherein the polymer layer has an outer portion enriched in the acrylate with silicone and an inner portion enriched in the fluoroalkene.

16. The antireflection film of claim 1 wherein the polymer layer comprises repeating units derived from a fluoroalkene and repeating units derived from a methacrylate and wherein the polymer layer has an outer portion enriched in the methacrylate and an inner portion enriched in the fluoroalkene.

17. The antireflection film of claim 1 wherein the polymer layer further comprises an antistatic agent.

18. The antireflection film of claim 1 further comprising an antistatic coating disposed on the polymer layer.

19. The antireflection film of claim 1 further comprising a hardcoat layer disposed between the first surface of the substrate and the inorganic layer.

20. The antireflection film of claim 19 wherein the hardcoat layer is microtextured.

21. The antireflection film of claim 19 wherein the hardcoat layer has a thickness of from about 1 μ

m to about 15 μ

m.

22. The antireflection film of claim 19 wherein the hardcoat layer comprises colloidal inorganic oxide particles dispersed in a free-radically cured binder.

23. The antireflection film of claim 22 wherein the colloidal inorganic oxide particles comprise colloidal silica particles.

24. The antireflection film of claim 22 wherein the binder is selected from the group consisting of copolymerizable free-radically curable monomers, oligomers, polymers or any combination thereof.

25. The antireflection film of claim 22 wherein the binder comprises a conductive polymer.

26. The antireflection film of claim 1 wherein the substrate is a thermosetting polymer, a thermoplastic polymer, or a combination thereof.

27. The antireflection film of claim 26 wherein the substrate is polyethylene terephthalate.

28. The antireflection film of claim 1 wherein the substrate is a louvered plastic film.

29. The antireflection film of claim 1 further comprising a louvered plastic layer disposed between the second surface of the substrate and the adhesive layer.

30. The antireflection film of claim 1 wherein the substrate is a circular polarizer comprising a linear polarizer and a quarter-wavelength retarder, wherein the inorganic layer is deposited on the linear polarizer and the adhesive layer is deposited on the quarter-wavelength retarder.

31. The antireflection film of claim 1 further comprising a circular polarizer disposed between the second surface of the substrate and the adhesive layer, wherein the circular polarizer comprises a linear polarizer and a quarter-wavelength retarder and wherein the linear polarizer is adjacent to the second surface of the substrate and the quarter-wavelength retarder is adjacent to the adhesive layer.

32. The antireflection film of claim 1 further comprising a protective liner deposited on the adhesive layer.

33. The antireflection film of claim 1 wherein the adhesive layer is microtextured.

34. The antireflection film of claim 1 wherein the adhesive layer comprises a non-pressure sensitive adhesive.

35. The antireflection film of claim 34 wherein the non-pressure sensitive adhesive is a thermoplastic block copolymer elastomer.