Substrate placement in immersion lithography

• US 7,352,440 B2
• Filed: 12/10/2004
• Issued: 04/01/2008
• Est. Priority Date: 12/10/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Nijmeijer, Gerrit Johannes, Van Eijck, Petrus Anton Willem Cornelia Maria, Hoogendam, Christiaan Alexander, Cuperus, Minne
• Primary Examiner(s): Nguyen; Henry Hung
• Application Number:
  US11/008,576
• Publication Number:
  US 20060126038A1
• Time in Patent Office: 1,208 Days
• Field of Search: 355/30, 355/55, 355/53, 355/72, 356399-401, 250/548
• US Class Current: 355/55
• CPC Class Codes: G01B 11/14 for measuring distance or clearance between spaced objects or spaced apertures G01B11/26 takes precedence; rangefinders G01C3/00
• CPC Class Codes: G01B 11/26 for measuring angles or tapers; for testing the alignment of axes
• CPC Class Codes: G01B 11/272 using photoelectric detection means
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position
• CPC Class Codes: G03F 9/7011 Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder

Abstract

A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.

Claims

1. A method for determining an offset between a center of a substrate and a center of a depression in a chuck, comprising:

measuring a gap between an edge of the substrate disposed inside the depression and an edge of the depression at a plurality of locations;

determining a center of the substrate using the measurements of the gap;

determining a chuck centering offset of the substrate between the center of the depression and the measured center of the substrate at the chuck;

providing the substrate to a prealigner and determining a center of the substrate at the prealigner;

determining a prealigner centering offset between a nominal center of the substrate and the measured center of the substrate at the prealigner; and

combining the chuck centering offset and the prealigner centering offset to obtain a global centering offset.

2. The method according to claim 1, further comprising determining a position of the edge of the depression and calculating a center of the depression.

3. The method according to claim 1, wherein determining the chuck centering offset comprises determining the position of the center of the substrate relative to the position of the center of the depression.

4. The method according to claim 1, wherein measuring the gap comprises scanning the gap across an optical beam and measuring an intensity variation in a reflection of the optical beam.

5. The method according to claim 1, wherein determining the center of the substrate using the measurements of the gap comprises determining a position of the edge of the substrate and calculating the position of the center of the substrate from the position of the edge.

6. The method according to claim 1, wherein the substrate is disposed inside the depression and removed from the depression using a substrate handler.

7. The method according to claim 6, further comprising calibrating the substrate handler to take into account the global centering offset.

8. The method according to claim 7, wherein calibrating the substrate handler includes shifting positioning of substrates by the substrate handler by an offset to correct for the global centering offset so that a subsequently positioned substrate is substantially centered inside the depression.

9. The method according to claim 7, wherein calibrating the substrate handler includes correcting for substrate positioning so that the gap of a subsequently positioned substrate is equally wide inside the depression.

10. A lithographic projection apparatus comprising:

a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;

a substrate table configured to hold a substrate, the substrate table having a depression configured to receive the substrate;

a projection system configured to project the patterned beam onto a target portion of the substrate;

a liquid supply system configured to provide a liquid, through which the patterned beam is to be projected, in a space between the projection system and the substrate;

a sensor configured to measure a position of the substrate and to measure a gap between an edge of the substrate disposed inside the depression and an edge of the depression; and

a substrate handling system in communication with the sensor configured to position the substrate inside the depression such that the gap between the edge of the substrate and the edge of the depression is substantially uniform inside the depression.

11. The apparatus according to claim 10, wherein the substrate handling system is configured to be calibrated to correct for an offset between the substrate and the depression.

12. The apparatus according to claim 10, wherein the substrate handling system is configured to determine an offset between a center of the substrate and a center of the depression.

13. The apparatus according to claim 10, wherein the sensor configured to measure the position of the substrate is configured to measure a position of an alignment mark of a test substrate disposed inside the depression, and wherein the substrate handling system is configured to determine an offset between a center of the test substrate and a center of the depression from the position of the alignment mark measured by the sensor.

14. The apparatus according to claim 10, wherein the substrate handling system is configured to determine to what extent the substrate should be translated in a plane substantially parallel to the substrate table to allow the substrate to enter inside the depression without colliding with a surface of the substrate table or an edge of the depression.

15. The apparatus according to claim 14, wherein the substrate handling system is configured to determine an offset between the substrate and the depression from determination of the translation in the plane.

16. The apparatus according to claim 10, wherein the substrate handling system is configured to determine a center of the substrate using measurements of the gap and to determine an offset of the substrate between a center of the depression and the measured center of the substrate.

17. The apparatus according to claim 16, further comprising a prealigner configured to measure a center of the substrate at the prealigner and wherein the substrate handling system is configured to determine a centering offset at the prealigner between a nominal center of the substrate and the measured center of the substrate at the prealigner.

18. The apparatus according to claim 17, wherein the substrate handling system is configured to combine the offset of the substrate and the centering offset to obtain a global centering offset.