System and method for an improved illumination system in a lithographic apparatus

• US 7,355,677 B2
• Filed: 12/09/2004
• Issued: 04/08/2008
• Est. Priority Date: 12/09/2004
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Bijvoet, Dirk-Jan
• Primary Examiner(s): RUTLEDGE, DELLA J
• Application Number:
  US11/007,588
• Publication Number:
  US 20060126047A1
• Time in Patent Office: 1,216 Days
• Field of Search: 355/53, 355/67, 355/71
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70825 Mounting of individual elements, e.g. mounts, holders or supports workpiece or mask holders G03F7/707

Abstract

An array of individually controllable elements for use in lithography in which each of the individually controllable elements is comprised of a planar reflector mounted on supports on a substrate by way of elongate hinges.

Claims

1. A lithographic apparatus, comprising:

an illumination system that supplies a beam of radiation;

an array of individually controllable elements that pattern the beam; and

a projection system that projects the patterned beam onto a target portion of a substrate,

wherein the array of individually controllable elements includes a substrate having a plurality of supports on which the individually controllable elements are mounted,

wherein the individually controllable elements each comprise,

a planar reflector, having a reflective surface substantially located in a reflecting plane, and

at least two hinges each having an elongated portion, wherein the hinges are each connected at one end to the planar reflector and at the other end to one of the supports on the substrate;

wherein the length of the hinges, between the connections to the planar reflector and the support, is at least one of;

(a) half of a smallest dimension of the planar reflector across the reflecting plane, (b) equal to the smallest dimension of the planar reflector across the reflecting plane and (c) twice the smallest dimension of the planar reflector across the reflecting plane.

2. The apparatus of claim 1, wherein each hinge comprises at least first and second ones of the elongate portions arranged such that the elongate directions of the first and second ones of the elongate portions are substantially parallel to first and second edges of the planar reflector, respectively.

3. The apparatus of claim 1, wherein at least a part of the elongate portion of each hinge is arranged such that an elongate direction of each elongate portion is substantially perpendicular to an edge of the planar reflector to which each elongate portion is connected.

4. The apparatus of claim 1, wherein each of the supports is connected to respective first and second ones of the at least two hinges that are connected, respectively, to first and second ones of the planar reflectors that are adjacent each other.

5. The apparatus of claim 1, wherein each of the supports are connected to respective first to fourth ones of the at least two hinges that are connected, respectively, to first to fourth ones of the planar reflectors, the first to fourth ones of the planar reflectors being arranged to form two adjacent rows each of two adjacent ones of the planar reflectors.

6. The apparatus of claim 1, wherein each of the supports are connected to a plurality of the at least two hinges that are connected to a plurality of the planar reflectors arranged substantially in a row.

7. The apparatus of claim 6, wherein the planar reflectors and the connected hinges are integrally formed from the same material.

8. The apparatus of claim 7, wherein two or more of the at least two hinges connected to a common one of the supports are integrally formed from the same material.

9. The apparatus of claim 1, wherein the individually controllable elements further comprise:

an actuator that actuates the associated individually controllable element, such that the individually controllable element rotates about an axis arranged substantially within the reflecting plane.

10. The apparatus of claim 1, wherein the individually controllable elements ftirther comprise:

an actuator that actuates the associated individually controllable element, such that the individually controllable element translates in a direction substantially perpendicular to the reflecting plane.

11. An array of individually controllable elements, configured to pattern a beam of radiation, comprising:

a plurality of individually controllable elements, each comprising,

a planar reflector having a reflective surface substantially located in a reflecting plane, and

at least two elongate hinges, and

a substrate having a plurality of supports on which the individually controllable elements are mounted,

wherein the hinges are each connected at one end to the planar reflector and at the other end to one of the supports on the substrate;

wherein a length of the hinges is at least one of (a) half of a smallest dimension of the planar reflector across the reflecting plane, (b) eciual to the smallest dimension of the planar reflector across the reflecting plane and (c) twice the smallest dimension of the planar reflector across the reflecting plane.

12. A device manufacturing method comprising:

mounting a plurality of individually controllable elements on a plurality of supports on a substrate to form an array of individually controllable elements, wherein each individually controllable element includes a planar reflector;

connecting a first hinge to each of the individually controllable elements and to its associated planar reflector and a second hinge to each of the individually controllable elements and to one of the supports on the substrate, a length of the first and second hinges being at least one of (a) half of a smallest dimension of the planar reflector across a reflecting plane, (b) equal to the smallest dimension of the planar reflector across the reflecting plane and (c) twice the smallest dimension of the planar reflector across the reflecting plane thereof,

patterning a beam of radiation using the array of individually controllable elements; and

projecting the patterned beam of radiation onto a target portion of a substrate.

13. The method of claim 12, further comprising:

actuating the planar reflectors to position them as necessary to impart the pattern to the beam.