Optical proximity correction using chamfers and rounding at corners
First Claim
Patent Images
1. A method of optimizing a design to be formed on a substrate, comprising the steps of:
- (a) determining approximate rounding of at least one corner of an image of the design based on a derivation of a predefined rule concerning a sub-lithographic assist feature for sharpening the corner of the design to be formed on the substrate when positioned on a mask at a position corresponding to the at least one corner;
(b) generating a representation of the design further to the approximate rounding of the at least one corner;
(c) generating an initial representation of a mask utilized to image the design based on the representation; and
(d) performing Optical Proximity Correction (OPC) further to the initial representation of the mask.
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Abstract
Disclosed is a method of optimizing a design to be formed on a substrate. The method includes approximating rounding of at least one corner of an image of the design; generating a representation of the design further to the approximate rounding of the at least one corner; generating an initial representation of a mask utilized to image the design based on the representation; and performing Optical Proximity Correction (OPC) further to the initial representation of the mask.
37 Citations
16 Claims
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1. A method of optimizing a design to be formed on a substrate, comprising the steps of:
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(a) determining approximate rounding of at least one corner of an image of the design based on a derivation of a predefined rule concerning a sub-lithographic assist feature for sharpening the corner of the design to be formed on the substrate when positioned on a mask at a position corresponding to the at least one corner; (b) generating a representation of the design further to the approximate rounding of the at least one corner; (c) generating an initial representation of a mask utilized to image the design based on the representation; and (d) performing Optical Proximity Correction (OPC) further to the initial representation of the mask. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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Specification