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Optical proximity correction using chamfers and rounding at corners

  • US 7,355,681 B2
  • Filed: 04/08/2005
  • Issued: 04/08/2008
  • Est. Priority Date: 04/09/2004
  • Status: Active Grant
First Claim
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1. A method of optimizing a design to be formed on a substrate, comprising the steps of:

  • (a) determining approximate rounding of at least one corner of an image of the design based on a derivation of a predefined rule concerning a sub-lithographic assist feature for sharpening the corner of the design to be formed on the substrate when positioned on a mask at a position corresponding to the at least one corner;

    (b) generating a representation of the design further to the approximate rounding of the at least one corner;

    (c) generating an initial representation of a mask utilized to image the design based on the representation; and

    (d) performing Optical Proximity Correction (OPC) further to the initial representation of the mask.

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