Heater for heating a wafer and method for fabricating the same

• US 7,361,865 B2
• Filed: 05/25/2005
• Issued: 04/22/2008
• Est. Priority Date: 08/27/2003
• Status: Active Grant

• Current Assignee: Kyocera Corporation
• Original Assignee: Kyocera Corporation
• Inventors: Masuyama, Hiroyuki, Takenouchi, Hiroshi, Nakamura, Tsunehiko, Maki, Seiichirou
• Primary Examiner(s): PAIK, SANG YEOP
• Application Number:
  US11/138,943
• Publication Number:
  US 20050252903A1
• Time in Patent Office: 1,063 Days
• Field of Search: 2194431-4682, 219544-553, 338/280, 338/281, 338306-314
• US Class Current: 219/444.1
• CPC Class Codes: H01L 21/67103 mainly by conduction
• CPC Class Codes: H05B 3/143 applied to semiconductors, e.g. wafers heating H05B3/0047 takes precedence

Abstract

Provided is a heater capable of having a high uniform heating characteristic and substantially equally heating a wafer etc. mounted thereon, and a wafer heating device using the same, as well as a method thereof. The heater comprises a plate shaped body, a belt-like resistance heating element formed on the plate shaped body and having a channel for adjusting the resistance value, and a positioning mark formed on the plate shaped body, which serves as a reference for positioning the channel.

Claims

1. A heater comprising:

a plate shaped body and

a belt-like resistance heating element formed on a surface of the plate shaped body,

wherein the belt-like resistance heating element is provided with channels,

wherein the plate shaped body is provided with positioning marks located at a position that has no influence on a heating characteristic on the surface thereof,

wherein the positioning marks are formed on a position corresponding to the channels, and wherein each of the positioning marks is not connected to the resistance heating element, or the one terminal of each of the positioning marks is connected to the resistance heating element and the other terminal thereof is not connected to the resistance heating element.

2. The heater according to claim 1, wherein the channels are provided in the belt-like resistance for adjusting a resistance value of the resistance heating element.

3. The heater according to claim 1, wherein the plate shaped body is made of ceramics.

4. The heater according to claim 1, wherein the positioning mark is a protrusion protruded from the belt like resistance heating element in a lateral direction.

5. The heater according to claim 1, wherein the resistance heating element is made of a composite material of an insulating composition and a conductive composition, and the conductive composition on the surface of the channel has a density less than that of an interior of the resistance heating element.

6. The heater according to claim 5, wherein the conductive composition has an average particle size of 1 to 20 μ

m on the surface of the channel.

7. The heater according to claim 5, wherein the resistance heating element has the insulating composition enclosed by conductive particles made of the conductive composition.

8. The heater according to claim 1, wherein the resistance heating element is formed in an approximately concentric circular shape on the circular plate shaped body, and the resistance heating element is provided with a group of channels at a substantially center in a width direction thereof.

9. The heater according to claim 1, wherein the resistance heating element is formed in an approximately concentric circular shape on a circular plate shaped body, and the channel is unilaterally distributed on the inner side in the radial direction of the plate shaped body or the outer side in the radial direction of the plate shaped body on the resistance heating element.

10. The heater according to claim 1, wherein the resistance heating element is provided with a plurality of channels extended along a length direction thereof and arranged in a direction substantially perpendicular to the length direction or in the width direction thereof.

11. The heater according to claim 10, wherein some of the plurality of channels have a length different from the others.

12. The heater according to claim 10, wherein among the plurality of channels, the channel located on the outer side in the width direction of the resistance heating elements has a length different from the others.

13. The heater according to claim 1, wherein the channel has an edge of an arc shape.

14. The heater according to claim 13, wherein the arc shaped portion on the edge of the channel has a radius of curvature corresponding to the circle diameter of 0.5 to 3 times a width of the channel.

15. The heater according to claim 13, wherein the edge of the channel is formed with a passivation layer.

16. The heater according to claim 1, wherein the channel is formed by means of a laser.

17. A heater comprising:

a plate shaped body and a belt-like resistance heating element formed on a surface of the plate shaped body,

wherein the belt-like resistance heating element is provided with channels,

wherein the plate shaped body is provided with positioning marks on the surface thereof,

wherein the positioning marks are formed on a position corresponding to the channels, and wherein the resistance heating element has a plurality of groups consisting of a plurality of channels that are formed in a substantially equal length along a length direction of the resistance heating element and also arranged in a direction substantially perpendicular to the length direction, and an interval between adjacent groups is smaller than width of the resistance heating element.

18. The heater according to claim 17, wherein the interval between the adjacent groups of channels is 1 mm or less.

19. A wafer heating device comprising:

a heater comprising a plate shaped body having a pair of main surfaces;

one main surface being provided with a plurality of resistance heating elements thereon and the other serving as a mounting surface for mounting a wafer wherein the belt-like resistance heating element is provided with channels,

wherein the plate shaped body is provided with positioning marks on the surface thereof, and

wherein the positioning marks are formed on a position corresponding to the channels;

a power supply part for independently supplying electric power to the plurality of resistance heating elements; and

a metal case enclosing the power supply part,

wherein the plurality of resistance heating elements are provided with a circular resistance heating element zone formed at the center of the plate shaped body, and a plurality of annular resistance heating element zones formed in a shape of a concentric circle on an outer side thereof, and

wherein the annular resistance heating element zones located at least at the outermost circumference have a plurality of positioning marks located on a plurality of straight lines extending from a center with a substantially equal center angle therebetween on the concentric circle.

20. A wafer heating device comprising:

a heater comprising a plate shaped body having a pair of main surfaces, one main surface being provided with a plurality of resistance heating elements thereon and the other main surface serving as a mounting surface for mounting a wafer wherein the belt-like resistance heating element is provided with channels,

wherein the plate shaped body is provided with positioning marks on the surface thereof, and

wherein the positioning marks are formed on a position corresponding to the channels, and further wherein the positioning mark is a protrusion protruded from the belt-like resistance heating element in a lateral direction;

a power supply part for independently supplying electric power to the plurality of resistance heating elements; and

a metal case enclosing the power supply part,

wherein the plurality of resistance heating elements has a circular resistance heating element zone formed at the center of the plate shaped body, and a plurality of annular resistance heating element zones formed in a shape of a concentric circle on an outer side thereof, and

wherein the annual resistance heating element zones located at least at the outermost circumference have a plurality of protrusions located on a plurality of straight lines extending from a center with a substantially equal central angle therebetween on the concentric circle.

21. A heater comprising:

a plate shaped body and

a belt-like resistance heating element formed on a surface of the plate shaped body,

wherein the belt-like resistance heating element is provided with a plurality of channels being substantially parallel to the length direction of the belt of the resistance heating element and the plurality of channels are continuous in the direction perpendicular to the belt of belt-like resistance heating element,

wherein the plate shaped body is provided with positioning marks on the surface thereof, and

wherein the positioning marks are formed on a position corresponding to the channels.

22. The heater according to claim 21, wherein the channels are provided in the belt-like resistance for adjusting a resistance value of the resistance heating element.

23. The heater according to claim 21, wherein the plate shaped body is made of ceramics.

24. The heater according to claim 21, wherein the positioning mark is a protrusion protruded from the belt-like resistance heating element in a lateral direction.

25. The heater according to claim 21, wherein the resistance heating element is made of a composite material of an insulating composition and a conductive composition, and the conductive composition on the surface of the channel has a density less than that of an interior of the resistance heating element.

26. The heater according to claim 25, wherein the conductive composition has an average particle size of 1 to 20 μ

m on the surface of the channel.

27. The heater according to claim 25, wherein the resistance heating element has the insulating composition enclosed by conductive particles made of the conductive composition.

28. The heater according to claim 21, wherein the resistance heating element is provided with a plurality of channels extended along a length direction thereof and arranged in a direction substantially perpendicular to the length direction or in the width direction thereof.

29. The heater according to claim 21, wherein the channel is formed by means of a laser.

30. A wafer heating device comprising:

a heater according comprising a plate shaped body having a pair of main surfaces, one main surface being provided with a plurality of resistance heating elements thereon and the other main surface serving as a mounting surface for mounting a wafer wherein the belt-like resistance heating element is provided with channels, wherein the plate shaped body is provided with positioning marks on the surface thereof, wherein the positioning marks are formed on a position corresponding to the channels, and wherein the positioning mark is a protrusion protruded from the belt-like resistance heating element in a lateral direction;

a power supply part for independently supplying electric power to the plurality of resistance heating elements; and

a metal case enclosing the power supply part,

wherein the plurality of resistance heating elements has a circular resistance heating element zone formed at the center of the plate shaped body, and a plurality of annular resistance heating element zones formed in a shape of a concentric circle on an outer side thereof, and

wherein the annular resistance heating element zones located at least at the outermost circumference have a plurality of protrusions located on a plurality of straight lines extending from a center with a substantially equal central angle therebetween on the concentric circle.