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Lithographic apparatus and device manufacturing method

  • US 7,362,415 B2
  • Filed: 12/07/2004
  • Issued: 04/22/2008
  • Est. Priority Date: 12/07/2004
  • Status: Expired due to Fees
First Claim
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1. A lithographic apparatus, comprising:

  • an illumination system that conditions a beam of radiation;

    an array of individually controllable elements that pattern the beam;

    a projection system that projects the patterned beam onto a target portion of a substrate;

    a cooling element comprising at least one conduit in thermal contact with the array of individually controllable elements;

    a cooling unit configured to adjust a temperature of fluid flowing through the conduit;

    a flow controller configured to adjust a flow rate of the fluid flowing though the conduit; and

    a cooling controller configured to provide control signals to the flow controller to adjust the flow rate of the fluid flowing though the conduit and to the cooling unit to adjust the temperature of the fluid flowing through the conduit, thereby controlling absorption by the fluid of heat dissipating from the array of individually controllable elements.

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