Lithographic apparatus and device manufacturing method
First Claim
Patent Images
1. A lithographic apparatus, comprising:
- an illumination system that conditions a beam of radiation;
an array of individually controllable elements that pattern the beam;
a projection system that projects the patterned beam onto a target portion of a substrate;
a cooling element comprising at least one conduit in thermal contact with the array of individually controllable elements;
a cooling unit configured to adjust a temperature of fluid flowing through the conduit;
a flow controller configured to adjust a flow rate of the fluid flowing though the conduit; and
a cooling controller configured to provide control signals to the flow controller to adjust the flow rate of the fluid flowing though the conduit and to the cooling unit to adjust the temperature of the fluid flowing through the conduit, thereby controlling absorption by the fluid of heat dissipating from the array of individually controllable elements.
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Abstract
A system and method are used to allow for compensation of a thermal output of an array of individually controllable elements. This can be done by inputting control signals to the array when it is not being used to pattern a projection beam in order to maintain the temperature of the array. A heating element can be provided to maintain the temperature of the array. A thermal reservoir can be provided to maintain the temperature of the array or a cooling element can be provided to reduce the temperature of the array during use.
38 Citations
20 Claims
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1. A lithographic apparatus, comprising:
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an illumination system that conditions a beam of radiation; an array of individually controllable elements that pattern the beam; a projection system that projects the patterned beam onto a target portion of a substrate; a cooling element comprising at least one conduit in thermal contact with the array of individually controllable elements; a cooling unit configured to adjust a temperature of fluid flowing through the conduit; a flow controller configured to adjust a flow rate of the fluid flowing though the conduit; and a cooling controller configured to provide control signals to the flow controller to adjust the flow rate of the fluid flowing though the conduit and to the cooling unit to adjust the temperature of the fluid flowing through the conduit, thereby controlling absorption by the fluid of heat dissipating from the array of individually controllable elements. - View Dependent Claims (2, 3, 4, 5, 7, 13)
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6. A device manufacturing method, comprising:
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using an array of individually controllable elements to pattern a beam of radiation; projecting the patterned beam of radiation onto a target portion of a substrate; and absorbing heat from the array of individually controllable elements using a cooling element comprising at least one conduit in thermal contact with the array of individually controllable elements; and adjusting a temperature and a flow rate of the fluid flowing through the conduit using an associated cooling controller to control absorption by the fluid of dissipated heat.
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8. A lithographic apparatus, comprising:
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an illumination system configured to condition a beam of radiation; an array of individually controllable elements configured to pattern the beam; a projection system configured to project the patterned beam onto a target portion of a substrate; a first cooling element comprising a first conduit arranged such that fluid flowing in the first conduit thermally contacts each of a plurality of regions of the array of individually controllable elements in a first order; a first cooling controller coupled to the first cooling element to adjust a flow rate and a temperature of the fluid flowing through the first conduit; a second cooling element comprising a second conduit arranged such that fluid flowing through the second conduit thermally contacts each of the plurality of regions of the array of individually controllable elements in a second order; and a second cooling controller coupled to the second cooling element to adjust a flow rate and a temperature of the fluid flowing through the second conduit. - View Dependent Claims (9, 14, 15, 16, 17)
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10. A lithographic apparatus, comprising:
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an illumination system configured to condition a beam of radiation; an array of individually controllable elements configured to pattern the beam; a projection system configured to project the patterned beam onto a target portion of a substrate; a cooling element comprising at least one conduit in thermal contact with the array of individually controllable elements, wherein the fluid flowing through the conduit initially thermally contacts each of a plurality of regions of the array of individually controllable elements in a first order and subsequently contacts the each of the plurality of regions of the array of individually controllable elements in a second order; and a cooling controller that adjusts a flow rate and a temperature of a fluid flowing through the conduit to control absorption of heat dissipating from the array of individually controllable elements. - View Dependent Claims (11, 12, 18, 19, 20)
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Specification