Process for fabricating thin film transistors
First Claim
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1. An electrophoretic display comprising, in order:
- a metal layer;
a polyimide substrate;
at least one transistor on the polyimide substrate; and
an electrophoretic medium having a plurality of electrophoretic particles dispersed in a suspending fluid and capable of moving therethrough on application of an electric field to the medium.
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Abstract
Transistors are formed by depositing at least one layer of semiconductor material on a substrate comprising a polyphenylene polyimide. The substrate permits the use of processing temperatures in excess of 300° C. during the processes used to form the transistors, thus allowing the formation of high quality silicon semiconductor layers. The substrate also has a low coefficient of thermal expansion, which closely matches that of silicon, thus reducing any tendency for a silicon layer to crack or delaminate.
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Citations
14 Claims
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1. An electrophoretic display comprising, in order:
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a metal layer; a polyimide substrate; at least one transistor on the polyimide substrate; and an electrophoretic medium having a plurality of electrophoretic particles dispersed in a suspending fluid and capable of moving therethrough on application of an electric field to the medium. - View Dependent Claims (2, 3)
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4. An electrophoretic display comprising, in order:
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a metal layer; a polyimide substrate; at least one transistor on the polyimide substrate; and an electrophoretic medium having a plurality of electrophoretic particles dispersed in a suspending fluid and capable of moving therethrough on application of an electric field to the medium, wherein the polyimide is a polyphenylene polyimide. - View Dependent Claims (5, 6)
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7. An electrophoretic display comprising, in order:
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a metal layer; a polyimide substrate; at least one transistor on the polyimide substrate; and an electrophoretic medium having a plurality of electrophoretic particles dispersed in a suspending fluid and capable of moving therethrough on application of an electric field to the medium, the display further comprising a passivating layer between the polyimide substrate and the at least one transistor. - View Dependent Claims (8, 9, 10)
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11. An electrophoretic display comprising, in order:
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a metal layer having walls defining apertures extending through the metal layer; a polyimide substrate; at least one transistor on the polyimide substrate; and an electrophoretic medium having a plurality of electrophoretic particles dispersed in a suspending fluid and capable of moving therethrough on application of an electric field to the medium.
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12. An electrophoretic display comprising, in order:
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a metal layer; a polyimide substrate; at least one transistor on the polyimide substrate; and an electrophoretic medium having a plurality of electrophoretic particles dispersed in a suspending fluid and capable of moving therethrough on application of an electric field to the medium, wherein the transistor comprises at least one amorphous silicon layer. - View Dependent Claims (13, 14)
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Specification