Display device, manufacturing method thereof, and television receiver
First Claim
Patent Images
1. A method for manufacturing a display device comprising the steps of:
- forming a film comprising a photosensitive material over a substrate;
forming a pattern comprising a photosensitive material by irradiating the film with a laser beam and developing the film;
modifying a surface of the pattern into a droplet-shedding surface;
forming a source electrode and a drain electrode by discharging a conductive material at an outer edge of the pattern having the droplet-shedding surface by a droplet-discharging method; and
forming a semiconductor layer, a gate-insulating layer, and a gate electrode over the source electrode and the drain electrode.
1 Assignment
0 Petitions
Accused Products
Abstract
The present invention discloses a method for manufacturing a display device comprising the steps of forming a first film pattern using a photosensitive material over a substrate, forming a second film pattern in such a way that the first film pattern is exposed by being irradiated with a laser beam, modifying a surface of the second film pattern into a droplet-shedding surface, forming a source electrode and a drain electrode by discharging a conductive material to an outer edge of the droplet-shedding surface by a droplet-discharging method, and forming a semiconductor region, a gate-insulating film, and a gate electrode over the source electrode and the drain electrode.
95 Citations
36 Claims
-
1. A method for manufacturing a display device comprising the steps of:
-
forming a film comprising a photosensitive material over a substrate; forming a pattern comprising a photosensitive material by irradiating the film with a laser beam and developing the film; modifying a surface of the pattern into a droplet-shedding surface; forming a source electrode and a drain electrode by discharging a conductive material at an outer edge of the pattern having the droplet-shedding surface by a droplet-discharging method; and forming a semiconductor layer, a gate-insulating layer, and a gate electrode over the source electrode and the drain electrode. - View Dependent Claims (2, 3, 4, 5, 6, 7)
-
-
8. A method for manufacturing a display device comprising the steps of:
-
forming a first film by using a solution for forming a droplet-shedding surface over a substrate; forming a second film having a droplet-shedding portion and a droplet-attracting portion by irradiating the first film with a laser beam; forming a source electrode and a drain electrode by discharging a conductive material to a droplet-attracting portion of the second film by a droplet-discharging method; and forming a semiconductor layer, a gate-insulating layer, and a gate electrode over the source electrode and the drain electrode. - View Dependent Claims (9, 10, 11, 12)
-
-
13. A method for manufacturing a display device comprising the steps of:
-
forming a film over a light-transmitting substrate; discharging or applying a photosensitive material over the film; forming a mask pattern by irradiating the photosensitive material with a first laser beam and developing the photosensitive material; forming a gate electrode by etching the film using the mask pattern; forming an insulating film over the gate electrode; forming a droplet-shedding portion on a surface of the insulating film; modifying a part of the droplet-shedding portion into a droplet-attracting portion by irradiating the part of the droplet-shedding portion with a second laser beam transmitted through the light-transmitting substrate; forming a source electrode and a drain electrode on the droplet-attracting portion; and forming a semiconductor layer over the source electrode and the drain electrode. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20)
-
-
21. A method for manufacturing a display device comprising the steps of:
-
forming a first pattern over a light-transmitting substrate by a droplet-discharging method; discharging or applying a photosensitive material over the first pattern; forming a mask pattern by irradiating a portion where the first pattern and the photosensitive material are superposed with a first laser beam and developing the portion; forming a gate electrode by etching the first pattern using the mask pattern; forming an insulating film over the gate electrode; forming a semiconductor layer over the insulating film; forming a droplet-shedding portion on the surface of the semiconductor layer; modifying a part of the droplet-shedding portion into a droplet-attracting portion by irradiating the part of the droplet-shedding portion with a second laser beam transmitted through the light-transmitting substrate; forming a source electrode and a drain electrode on the droplet-attracting portion; and forming a source region and a drain region by etching parts of the semiconductor layer using the source electrode and the drain electrode as masks. - View Dependent Claims (22, 23, 24, 25, 26, 27, 28)
-
-
29. A method for manufacturing a display device comprising the steps of:
-
forming a first pattern over a light-transmitting substrate by a droplet-discharging method; discharging or applying a photosensitive material over the first pattern; forming a mask pattern by irradiating a portion where the first pattern and the photosensitive material are superposed with a first laser beam and developing the portion; forming a gate electrode by etching the first pattern using the mask pattern; forming a first insulating film over the gate electrode; forming a first semiconductor layer over the first insulating film; forming a second insulating film over the first semiconductor layer; forming a second semiconductor layer over the first semiconductor layer and the second insulating film; forming a droplet-shedding portion on the surface of the second semiconductor layer; modifying a part of the droplet-shedding portion into a droplet-attracting portion by irradiating the part of the droplet-shedding portion with a second laser beam transmitted through the light-transmitting substrate; forming a source electrode and a drain electrode over the droplet-attracting portion; and forming a source region and a drain region by etching parts the second semiconductor layer using the source electrode and the drain electrode as masks. - View Dependent Claims (30, 31, 32, 33, 34, 35, 36)
-
Specification
-
- Resources
Litigation Campaign Assessment
Thank you for your request. You will receive a custom alert email when the Litigation Campaign Assessment is available.
×
-
Current AssigneeSemiconductor Energy Laboratory Co., Ltd.
-
Original AssigneeSemiconductor Energy Laboratory Co., Ltd.
-
InventorsShoji, Hironobu, Maekawa, Shinji, Yamazaki, Shunpei
-
Primary Examiner(s)Lebentritt; Michael
-
Assistant Examiner(s)DINH, THU HUONG T
-
Application NumberUS11/038,212Publication NumberTime in Patent Office1,194 DaysField of Search340/784, 438/66, 438/149, 257/E21.26, 257/E51.031, 257/E21.577, 257/E21.414US Class Current348/739CPC Class CodesH01L 27/12 the substrate being other t...H01L 27/1285 using control of the anneal...H01L 27/1292 using liquid deposition, e....
