Optical data storage media with enhanced contrast
First Claim
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1. An optical data storage device comprising:
- a substrate having oppositely facing first and second surfaces;
a first metal/alloy layer overlaying the first surface of the substrate, wherein the first metal/alloy layer comprises tin, antimony and an element selected from the group consisting of indium, germanium, aluminum, and zinc, and;
a first silicon oxynitride layer overlaying the first metal/alloy layer, wherein a thickness of the first silicon oxynitride layer and an index of refraction of the first silicon oxynitride layer are selected to substantially maximize an optical contrast between an amorphous state of the first metal/alloy layer and a crystalline state of the first metal/alloy layer, and wherein no further layers overlay the first silicon oxynitride layer.
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Abstract
Disclosed is an optical data storage medium with enhanced contrast. The optical data storage medium includes a substrate having oppositely facing first and second surfaces. A first metal/alloy layer is formed overlaying the first surface of the substrate. The first metal/alloy layer is formed from tin, antimony and element selected from the group consisting of indium, germanium, aluminum, and zinc. After the first metal/alloy layer is formed, a first dielectric layer is formed overlaying the first metal/alloy layer. This dielectric layer is formed from silicon oxynitride. The first metal/alloy layer is positioned between the substrate and the first dielectric layer.
42 Citations
20 Claims
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1. An optical data storage device comprising:
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a substrate having oppositely facing first and second surfaces; a first metal/alloy layer overlaying the first surface of the substrate, wherein the first metal/alloy layer comprises tin, antimony and an element selected from the group consisting of indium, germanium, aluminum, and zinc, and; a first silicon oxynitride layer overlaying the first metal/alloy layer, wherein a thickness of the first silicon oxynitride layer and an index of refraction of the first silicon oxynitride layer are selected to substantially maximize an optical contrast between an amorphous state of the first metal/alloy layer and a crystalline state of the first metal/alloy layer, and wherein no further layers overlay the first silicon oxynitride layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A method conspiring:
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forming a first metal/alloy layer overlaying a first surface of a substrate wherein the first metal/alloy layer comprises tin, antimony and an element selected from the group consisting of indium, germanium, aluminum, and zinc, and; forming a first silicon oxynitride layer overlaying the first metal/alloy layer, wherein the first silicon oxynitride layer has a thickness and an index of refraction substantially maximize selected to an optical contrast between an amorphous state of the first metal/alloy layer and a crystalline state of the first metal/alloy layer, and wherein the first metal/alloy layer is positioned between the substrate and the first silicon oxynitride layer and no further layers overlay the first silicon oxynitride layer. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20)
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Specification