Lithographic apparatus, device manufacturing method, and device manufactured thereby
First Claim
1. A lithographic apparatus comprising:
- an illumination system for supplying a projection beam of radiation;
an array of individually controllable elements serving to impart the projection beam with a pattern in its cross-section to form a patterned beam;
a projection system for projecting the patterned beam onto a target portion of a substrate;
a substrate supply having adjacent layers of substrates arranged to output at least one unbroken length of substratea substrate conveying system arranged to convey each outputted unbroken length of substrate from the substrate supply and past the projection system such that the projection system is able to project the patterned beam onto a series of target portions along each unbroken length of substrate; and
a detection system arranged to detect alignment marks on the substrate that enable the lithographic apparatus to position the substrate.
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Accused Products
Abstract
Substrate processing apparatus includes a lithographic apparatus which comprises an illumination system for supplying a projection beam of radiation, an array of individually controllable elements serving to impart the projection beam with a pattern in its cross-section, and a projection system for projecting the patterned beam onto a target portion of a substrate. The processing apparatus also includes a substrate supply arranged to output at least one unbroken length of substrate, and a substrate conveying system arranged to convey each outputted unbroken length of substrate from the substrate supply and past the projection system such that the projection system is able to project the patterned beam onto a series of target portions along each unbroken length of substrate. In certain embodiments, long lengths of substrate are supplied from a roll, but alternatively a series of separate sheets can be supplied.
25 Citations
33 Claims
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1. A lithographic apparatus comprising:
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an illumination system for supplying a projection beam of radiation; an array of individually controllable elements serving to impart the projection beam with a pattern in its cross-section to form a patterned beam; a projection system for projecting the patterned beam onto a target portion of a substrate; a substrate supply having adjacent layers of substrates arranged to output at least one unbroken length of substrate a substrate conveying system arranged to convey each outputted unbroken length of substrate from the substrate supply and past the projection system such that the projection system is able to project the patterned beam onto a series of target portions along each unbroken length of substrate; and a detection system arranged to detect alignment marks on the substrate that enable the lithographic apparatus to position the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A device manufacturing method comprising the steps of:
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providing a substrate supply having adjacent layers of substrate with a separating material arranged between adjacent layers of substrate; outputting from the supply at least one unbroken length of substrate; providing a projection beam of radiation using an illumination system; using an array of individually controllable elements to impart the projection beam with a pattern in its cross-section to form a patterned beam; using a projection system to project the patterned beam; conveying each outputted unbroken length of substrate from the substrate supply and past the projection system; positioning the length of substrate by detecting alignment marks extending along each unbroken length of substrate; and projecting the patterned beam onto a series of target portions along each unbroken length of substrate. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25, 26)
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27. A substrate processing apparatus comprising:
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a lithographic apparatus that projects a patterned beam onto a target portion of a substrate; a substrate supply having adjacent layers of substrates arranged to output at least one unbroken length of substrate, wherein a layer of separating material exists between adjacent layers of substrates; and a substrate conveying system arranged to convey each outputted unbroken length of substrate from the substrate supply such that the lithographic apparatus is able to project the patterned beam onto a series of target portions along each unbroken length of substrate; and a detection system arranged to detect alignment marks on the substrate that enable the lithographic apparatus to position the substrate. - View Dependent Claims (28, 29, 30)
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31. A device manufacturing method comprising the steps of:
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providing a substrate supply having adjacent layers of substrate with a separating material arranged between adjacent layers of substrate; outputting from the supply at least one unbroken length of substrate; providing a projection beam of radiation using a lithographic apparatus; conveying each outputted unbroken length of substrate from the substrate supply; positioning the length of substrate by detecting alignment marks extending along each unbroken length of substrate; and projecting the patterned beam onto a series of target portions along each unbroken length of substrate. - View Dependent Claims (32, 33)
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Specification