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Lithographic apparatus and device manufacturing method

  • US 7,375,796 B2
  • Filed: 03/30/2005
  • Issued: 05/20/2008
  • Est. Priority Date: 04/01/2004
  • Status: Expired due to Fees
First Claim
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1. A lithographic apparatus, comprising:

  • a substrate table configured to hold a substrate;

    a projection system configured to project a patterned beam of radiation onto a target portion of the substrate;

    a first liquid supply system configured to at least partially fill a space between a final element of the projection system and the substrate table, with a first liquid; and

    a measurement system configured to measure a location of each of a plurality of points on the substrate, the measurement system being arranged such that measurements take place through a second liquid, the second liquid not being supplied by the first liquid supply system.

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