Interferometry systems and methods of using interferometry systems

• US 7,375,823 B2
• Filed: 03/01/2006
• Issued: 05/20/2008
• Est. Priority Date: 04/22/2004
• Status: Expired due to Fees

• Current Assignee: Zygo Corporation (Ametek Incorporated)
• Original Assignee: Zygo Corporation (Ametek Incorporated)
• Inventors: Womack, Gary, Hill, Henry A.
• Primary Examiner(s): CONNOLLY, PATRICK J
• Application Number:
  US11/365,991
• Publication Number:
  US 20060187464A1
• Time in Patent Office: 811 Days
• Field of Search: 356/486, 356/489, 356/492, 356/495, 356/498, 356/500, 356/508, 356/509, 356511-514
• US Class Current: 356/500
• CPC Class Codes: G01B 2290/15 Cat eye, i.e. reflection always parallel to incoming beam
• CPC Class Codes: G01B 2290/70 Using polarization in the interferometer
• CPC Class Codes: G01B 9/02007 Two or more frequencies or sources used for interferometric measurement using only beat G01B9/02003
• CPC Class Codes: G01B 9/02018 Multipass interferometers, e.g. double-pass
• CPC Class Codes: G01B 9/02027 Two or more interferometric channels or interferometers
• CPC Class Codes: G01B 9/02058 by particular optical compensation or alignment elements, e.g. dispersion compensation
• CPC Class Codes: G01B 9/02059 Reducing effect of parasitic reflections, e.g. cyclic errors
• CPC Class Codes: G01B 9/02061 Reduction or prevention of effects of tilts or misalignment
• CPC Class Codes: G01B 9/0207 Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
• CPC Class Codes: G01B 9/02072 by calibration or testing of interferometer
• CPC Class Codes: G01B 9/02084 Processing in the Fourier or frequency domain when not imaged in the frequency domain
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position
• CPC Class Codes: G03F 9/7034 Leveling
• CPC Class Codes: G03F 9/7049 Technique, e.g. interferometric

Abstract

In general, in one aspect, the invention features methods that include interferometrically monitoring a distance between an interferometry assembly and a measurement object along each of three different measurement axes while moving the measurement object relative to the interferometry assembly. The methods also include monitoring an orientation angle of the measurement object with respect to a rotation axis non-parallel to the three different measurement axes while the measurement object is moving, determining values of a parameter for different positions of the measurement object from the monitored distances, wherein for a given position the parameter is based on the distances of the measurement object along each of the three different measurement axes at the given position, and deriving information about a surface figure profile of the measurement object from a frequency transform of at least the parameter values. Deriving the information includes accounting for variations of the monitored orientation angle during the measurement object'"'"'s motion.

Claims

1. A method, comprising:

interferometrically monitoring a distance between an interferometry assembly and a measurement object along each of three different measurement axes while moving the measurement object relative to the interferometry assembly;

monitoring an orientation angle of the measurement object with respect to a rotation axis non-parallel to the three different measurement axes while the measurement object is moving;

determining values of a parameter for different positions of the measurement object from the monitored distances, wherein for a given position the parameter is based on the distances of the measurement object along each of the three different measurement axes at the given position; and

deriving information about a surface figure profile of the measurement object from a frequency transform of at least the parameter values,

wherein deriving the information includes accounting for variations of the monitored orientation angle during the measurement object'"'"'s motion.

2. The method of claim 1, wherein accounting for the variations of the monitored orientation angle comprises correcting the monitored orientation angle for an angle measurement error based on predetermined information, where the angle measurement error refers to a deviation of the monitored orientation angle from an actual orientation angle of the measurement object with respect to the rotation axis.

3. The method of claim 2, wherein the predetermined information includes information about a component of the angle measurement error that is linear with respect to the location of the measurement object with respect to one of the measurement axes.

4. The method of claim 2, wherein the predetermined information includes information about a component of the angle measurement error that is non-linear with respect to the location of the measurement object with respect to one of the measurement axes.

5. The method of claim 2, wherein the monitored orientation angle is corrected for the angle measurement error based on the determined parameter values.

6. The method of claim 1, wherein the variations of the orientation angle are monitored interferometrically.

7. The method of claim 6, wherein the variations of the orientation angle are monitored by interferometrically monitoring a distance between a secondary measurement object and a second interferometry assembly along at least two secondary axes, wherein the secondary measurement object is physically coupled to the other measurement object and the secondary axes are non-parallel to the three different measurement axes.

8. The method of claim 7, wherein the physical coupling between the measurement object and the secondary measurement object is via attachment to a common stage.

9. The method of claim 1, further comprising determining values of a third parameter for different positions of the measurement object, wherein for each position the third parameter is based on the distance of the measurement object along each of two of the measurement axes at that position and the distance of the measurement object along one of the measurement axes at another position.

10. The method of claim 1, further comprising using the information about the surface figure profile of the measurement object to improve the accuracy of measurements made using the interferometry assembly.

11. The method of claim 1, further comprising using a lithography tool to expose a substrate with radiation passing through a mask while interferometrically monitoring the distance between the interferometry assembly and the measurement object, wherein the position of the substrate or the mask relative to a reference frame is related to the distance between the interferometry assembly and the measurement object.

12. The method of claim 1, wherein the interferometer assembly or the measurement object are attached to a stage and at least one of the monitored distances is used to monitor the position of the stage relative to a frame supporting the stage.

13. A lithography method for use in fabricating integrated circuits on a wafer, the method comprising:

supporting the wafer on a moveable stage;

imaging spatially patterned radiation onto the wafer;

adjusting the position of the stage; and

monitoring the position of the stage using the measurement object and using the information about the surface figure profile of the measurement object derived using the method of claim 1 to improve the accuracy of the monitored position of the stage.

14. A lithography method for use in the fabrication of integrated circuits comprising:

directing input radiation through a mask to produce spatially patterned radiation;

positioning the mask relative to the input radiation;

monitoring the position of the mask relative to the input radiation using the measurement object and using the information about the surface figure profile of the measurement object derived using the method of claim 1 to improve the accuracy of the monitored position of the mask; and

imaging the spatially patterned radiation onto a wafer.

15. A lithography method for fabricating integrated circuits on a wafer comprising:

positioning a first component of a lithography system relative to a second component of a lithography system to expose the wafer to spatially patterned radiation; and

monitoring the position of the first component relative to the second component using the measurement object and using the information about the surface figure profile of the measurement object derived using the method of claim 1 to improve the accuracy of the monitored position of the first component.

16. A method for fabricating integrated circuits, the method comprising:

applying a resist to a wafer; and

forming a pattern of a mask in the resist by exposing the wafer to radiation using the lithography method of claim 13.

17. A method for fabricating integrated circuits, the method comprising:

applying a resist to a wafer; and

forming a pattern of a mask in the resist by exposing the wafer to radiation using the lithography method of claim 14.

18. A method for fabricating integrated circuits, the method comprising:

applying a resist to a wafer; and

forming a pattern of a mask in the resist by exposing the wafer to radiation using the lithography method of claim 15.

19. A method for fabricating a lithography mask, the method comprising:

directing a write beam to a substrate to pattern the substrate;

positioning the substrate relative to the write beam; and

monitoring the position of the substrate relative to the write beam using the measurement object and using the information about the surface figure profile of the measurement object derived using the method of claim 1 to improve the accuracy of the monitored position of the substrate.

20. An apparatus, comprising:

a first interferometer assembly configured to produce three output beams each including interferometric information about a distance between the interferometer and a measurement object along a respective axis;

a second interferometer assembly configured to provide information about an orientation angle of the measurement object with respect to a rotation axis non-parallel to the respective axes; and

an electronic processor configured to determine values of a parameter for different positions of the measurement object from the interferometric information, wherein for a given position the parameter is based on the distances of the measurement object along each of the respective measurement axes at the given position,

the electronic processor being further configured to derive information about a surface figure profile of the measurement object from a frequency transform of at least the parameter values.

21. The apparatus of claim 20, further comprising a secondary measurement object, wherein the second interferometer assembly is configured to monitor a location of the secondary measurement object along a secondary axis non-parallel to the respective axes.

22. The apparatus of claim 20, wherein the electronic processor is configured to account for variations of the monitored orientation angle when deriving the information about the surface figure profile of the measurement object.

23. The apparatus of claim 22, wherein the electronic processor is configured so that accounting for the variations in orientation angle comprises correcting the monitored orientation angle for an angle measurement error based on predetermined information, where the angle measurement error refers to a deviation of the monitored orientation angle from an actual orientation angle of the measurement object with respect to the rotation axis.

24. The apparatus of claim 20, further comprising a stage and wherein the interferometer assemblies or measurement object are attached to the stage.

25. A lithography system for use in fabricating integrated circuits on a wafer, the system comprising:

a stage for supporting the wafer;

an illumination system for imaging spatially patterned radiation onto the wafer;

a positioning system for adjusting the position of the stage relative to the imaged radiation; and

the apparatus of claim 20 for monitoring the position of the wafer relative to the imaged radiation.

26. A lithography system for use in fabricating integrated circuits on a wafer, the system comprising:

a stage for supporting the wafer; and

an illumination system including a radiation source, a mask, a positioning system, a lens assembly, and the apparatus of claim 20,

wherein during operation the source directs radiation through the mask to produce spatially patterned radiation, the positioning system adjusts the position of the mask relative to the radiation from the source, the lens assembly images the spatially patterned radiation onto the wafer, and the apparatus monitors the position of the mask relative to the radiation from the source.

27. A beam writing system for use in fabricating a lithography mask, the system comprising:

a source providing a write beam to pattern a substrate;

a stage supporting the substrate;

a beam directing assembly for delivering the write beam to the substrate;

a positioning system for positioning the stage and beam directing assembly relative one another; and

the apparatus of claim 20 for monitoring the position of the stage relative to the beam directing assembly.

28. A method for fabricating integrated circuits, the method comprising:

applying a resist to a wafer; and

forming a pattern of a mask in the resist by exposing the wafer to radiation using the lithography system of claim 25.

29. A method for fabricating integrated circuits, the method comprising:

applying a resist to a wafer; and

forming a pattern of a mask in the resist by exposing the wafer to radiation using the lithography system of claim 26.