Method, program product and apparatus for generating assist features utilizing an image field map

• US 7,376,930 B2
• Filed: 06/29/2004
• Issued: 05/20/2008
• Est. Priority Date: 06/30/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Masktools B.V. (ASML Holding NV)
• Inventors: Chen, Jang Fung, Van Den Broeke, Douglas, Wampler, Kurt E., Shi, Xuelong, Hollerbach, Uwe
• Primary Examiner(s): Dinh; Paul
• Application Number:
  US10/878,490
• Publication Number:
  US 20050053848A1
• Time in Patent Office: 1,421 Days
• Field of Search: 716 19- 21, 382/144, 430/5, 430/311, 430/22
• US Class Current: 716/54
• CPC Class Codes: G03F 1/36 Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
• CPC Class Codes: G03F 7/70433 Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
• CPC Class Codes: G03F 7/70441 Optical proximity correction [OPC]

Abstract

Disclosed concepts include a method, program product and apparatus for generating assist features for a pattern to be formed on the surface of a substrate by generating an image field map corresponding to the pattern. Characteristics are extracted from the image field map, and assist features are generated for the pattern in accordance with the characteristics extracted in step. The assist features may be oriented relative to a dominant axis of a contour of the image field map. Also, the assist features may be polygon-shaped and sized to surround the contour or relative to the inside of the contour. Moreover, the assist features may be placed in accordance with extrema identified from the image field map. Utilizing the image field map, a conventional and complex two-dimensional rules-based approach for generating assist feature can be obviated.

Claims

1. A method of generating assist features for a pattern to be formed on a surface of a substrate, the steps comprising:

(a) generating an image field map corresponding to the pattern;

(b) extracting characteristics of a contour at a predetermined threshold of the image field map; and

(c) determining a dominant axis of the contour;

(d) generating at least one assist feature for the pattern in accordance with the characteristics extracted in step (b);

(e) orienting an assist feature in accordance with the dominant axis.

2. The method of generating assist features according to claim 1, wherein the image field map corresponds to a map showing changes in magnitude of intensity characteristics, interference characteristics, e-field characteristics, or intensity, interference or e-field characteristics that factor a characteristic or a limitation of a lithographic apparatus for forming the pattern over the surface of the substrate.

3. The method of generating assist features according to claim 1, wherein in step (b), characteristics at the predetermined threshold corresponds to a plurality of contours of the image field map.

4. The method of generating assist features according to claim 1, further comprising the steps of:

(i) analyzing a different contour at a different predetermined threshold;

(ii) determining a dominant axis of the contour and of the different contour; and

(iii) orienting an assist feature in accordance with the dominant axis of the contour and another assist feature in accordance with the dominant axis of the different contour.

5. The method of generating assist features according to claim 1, further comprising the step of determining the dominant axis of the contour in accordance with one axis of a plurality of axes.

6. The method of generating assist features according to claim 5, further comprising the step of positioning an origin of the plurality of axes on or near a centroid of the contour.

7. The method of generating assist features according to claim 1, wherein the assist feature is of a predetermined size.

8. The method of generating assist features according to claim 1, further comprising the step of determining a length or width of the assist feature in accordance with the contour.

9. A computer program product, comprising executable code stored in at least one machine readable memory, wherein execution of the code by at least one programmable computer causes the at least one programmable computer to perform a sequence of steps for generating assist features for a pattern to be formed on a surface of a substrate, the steps comprising:

(a) generating an image field map corresponding to the pattern;

(b) extracting characteristics of a contour at a predetermined threshold of the image field map; and

(c) determining a dominant axis of the contour;

(d) generating at least one assist feature for the pattern in accordance with the characteristics extracted in step (b);

(e) orienting an assist feature in accordance with the dominant axis.

10. The computer program product according to claim 9, wherein the image field map corresponds to a map showing changes in magnitude of intensity characteristics, interference characteristics, e-field characteristics, or intensity, interference or e-field characteristics that factor a characteristic or a limitation of a lithographic apparatus for forming the pattern over the surface of the substrate.

11. The computer program product according to claim 9, wherein in step (b), characteristics at the predetermined threshold corresponds to a plurality of contours of the image field map.

12. The computer program product according to claim 9, further comprising the steps of:

(i) analyzing a different contour at a different predetermined threshold;

(ii) determining a dominant axis of the contour and of the different contour; and

(iii) orienting an assist feature in accordance with the dominant axis of the contour and another assist feature in accordance with the dominant axis of the different contour.

13. The computer program product according to claim 9, further comprising the step of determining the dominant axis of the contour in accordance with one axis of a plurality of axes.

14. The computer program product according to claim 13, further comprising the step of positioning an origin of the plurality of axes on or near a centroid of the contour.

15. The computer program product according to claim 9, wherein the assist feature is of a predetermined size.

16. The computer program product according to claim 9, further comprising the step of determining a length or width of the assist feature in accordance with the contour.