Ultrasonic assisted etch using corrosive liquids
First Claim
Patent Images
1. An ultrasonic etching apparatus for chemically-etching a workpiece, the apparatus comprising:
- an outer tank adapted to be at least partially filled with an aqueous solution;
an inner tank comprising a chemically-resistant polymer and at least partially disposed within the outer tank and adapted to be in contact with the aqueous solution, the inner tank adapted to be at least partially filled with an etching solution, the inner tank having at least a sidewall and a base and defining an upper mouth, and being receptive to the workpiece;
a lid adapted to be engaged with the upper mouth of the inner tank, wherein a weight of the lid is adapted to create at least a partial seal between the upper mouth of the inner tank and a lower surface of the lid to increase a partial pressure of at least one gas above the etching solution;
an ultrasonic transducer coupled to the outer tank to impart ultrasonic energy to the etching solution in the inner tank; and
a mechanism adapted to impart relative motion between the workpiece disposed in the inner tank and the ultrasonic transducer;
wherein the mechanism comprises a rotary motion actuator for rotating at least one of the inner tank and the ultrasonic transducer.
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Abstract
An ultrasonic etching apparatus for chemically-etching a workpiece is disclosed. The apparatus includes an outer tank at least partially filled with an aqueous solution, an inner tank at least partially disposed within the outer tank and in contact with aqueous solution, the inner tank at least partially filled with an etching solution, a lid engaged with the mouth of said inner tank; and an ultrasonic transducer coupled to the outer tank to impart ultrasonic energy to the etching solution in said inner tank. Also disclosed are methods of using the apparatus to etch workpieces.
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Citations
26 Claims
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1. An ultrasonic etching apparatus for chemically-etching a workpiece, the apparatus comprising:
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an outer tank adapted to be at least partially filled with an aqueous solution; an inner tank comprising a chemically-resistant polymer and at least partially disposed within the outer tank and adapted to be in contact with the aqueous solution, the inner tank adapted to be at least partially filled with an etching solution, the inner tank having at least a sidewall and a base and defining an upper mouth, and being receptive to the workpiece; a lid adapted to be engaged with the upper mouth of the inner tank, wherein a weight of the lid is adapted to create at least a partial seal between the upper mouth of the inner tank and a lower surface of the lid to increase a partial pressure of at least one gas above the etching solution; an ultrasonic transducer coupled to the outer tank to impart ultrasonic energy to the etching solution in the inner tank; and a mechanism adapted to impart relative motion between the workpiece disposed in the inner tank and the ultrasonic transducer; wherein the mechanism comprises a rotary motion actuator for rotating at least one of the inner tank and the ultrasonic transducer. - View Dependent Claims (2, 3, 4, 5, 6)
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7. An ultrasonic etching apparatus for chemically-etching a workpiece, the apparatus comprising:
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an outer tank adapted to be at least partially filled with an aqueous solution; an inner tank comprising a chemically-resistant polymer and at least partially disposed within the outer tank and adapted to be in contact with the aqueous solution, the inner tank adapted to be at least partially filled with an etching solution, the inner tank having at least a sidewall and a base and defining an upper mouth, and being receptive to the workpiece; a lid adapted to be engaged with the upper mouth of the inner tank, wherein a weight of the lid is adapted to create at least a partial seal between the upper mouth of the inner tank and a lower surface of the lid to increase a partial pressure of at least one gas above the etching solution to maintain a substantially stable concentration of the etching solution; wherein the weight of the lid is selected so that the lid releases at least a portion of the at least one gas before a dangerous pressure level of the at least one gas is present within the inner tank; an ultrasonic transducer coupled to the outer tank to impart ultrasonic energy to the etching solution in the inner tank; and a mechanism adapted to impart relative motion between the workpiece disposed in the inner tank and the ultrasonic transducer; wherein the mechanism comprises a rotary motion actuator for rotating at least one of the inner tank and the ultrasonic transducer. - View Dependent Claims (8, 9)
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10. An ultrasonic etching apparatus for chemically-etching a workpiece, the apparatus comprising:
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an outer tank adapted to be at least partially filled with an aqueous solution; an inner tank comprising a chemically-resistant polymer and at least partially disposed within the outer tank and adapted to be in contact with the aqueous solution, the inner tank adapted to be at least partially filled with an etching solution, the inner tank having at least a sidewall and a base and defining an upper mouth, and being receptive to the workpiece; a lid adapted to be engaged with the upper mouth of the inner tank, wherein a weight of the lid is adapted to create at least a partial seal between the upper mouth of the inner tank and a lower surface of the lid to increase a partial pressure of at least one gas above the etching solution to maintain a substantially stable concentration of the etching solution; wherein the weight of the lid is selected so that the lid releases at least a portion of the at least one gas before a dangerous pressure level of the at least one gas is present within the inner tank; and an ultrasonic transducer coupled to the outer tank to impart ultrasonic energy to the etching solution in the inner tank wherein the ultrasonic transducer is positioned outside of the aqueous solution and is operably connected to a power oscillator. - View Dependent Claims (11, 12, 13, 14, 15)
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16. An ultrasonic etching apparatus for chemically-etching a workpiece, the apparatus comprising:
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an outer tank adapted to be at least partially filled with an aqueous solution wherein the aqueous solution is a filtered and recirculated deionized water bath; an inner tank comprising a chemically-resistant polymer and at least partially disposed within the outer tank and adapted to be in contact with the aqueous solution, the inner tank adapted to be at least partially filled with an etching solution, the inner tank having at least a sidewall and a base and defining an upper mouth, and being receptive to the workpiece; a lid adapted to be engaged with the upper mouth of the inner tank, wherein a weight of the lid is adapted to create at least a partial seal between the upper mouth of the inner tank and a lower surface of the lid to increase a partial pressure of at least one gas above the etching solution to maintain a substantially stable concentration of the etching solution; wherein the weight of the lid is selected so that the lid releases at least a portion of the at least one gas before a dangerous pressure level of the at least one gas is present within the inner tank; and an ultrasonic transducer coupled to the outer tank to impart ultrasonic energy to the etching solution in the inner tank. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
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Specification