Pad designs and structures for a versatile materials processing apparatus
First Claim
Patent Images
1. A pad structure for use in an apparatus for depositing material on, or removing material from, a substrate, the pad structure comprising:
- a substantially circular pad material having a top surface, a bottom surface and a defined thickness;
means for communicating electrolyte and an electric field, magnetic field or electromagnetic field through the pad material to the substrate, wherein the communicating means is an array of holes extending through the pad material and arranged in a radial direction from a center of the pad material; and
an adhesive system on the bottom surface, wherein the adhesive system is configured to block at least one of the holes to control distribution of at least one of the electric field and the electromagnetic field through the pad material.
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Accused Products
Abstract
An apparatus capable of assisting in controlling an electrolyte flow and an electric field distribution used for processing a substrate is provided. It includes a rigid member having a top surface of a predetermined shape and a bottom surface. The rigid member contains a plurality of channels, each forming a passage from the top surface to the bottom surface, and each allowing the electrolyte and electric field flow therethrough. A pad is attached to the rigid member via a fastener. The pad also allows for electrolyte and electric field flow therethrough to the substrate.
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Citations
36 Claims
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1. A pad structure for use in an apparatus for depositing material on, or removing material from, a substrate, the pad structure comprising:
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a substantially circular pad material having a top surface, a bottom surface and a defined thickness; means for communicating electrolyte and an electric field, magnetic field or electromagnetic field through the pad material to the substrate, wherein the communicating means is an array of holes extending through the pad material and arranged in a radial direction from a center of the pad material; and an adhesive system on the bottom surface, wherein the adhesive system is configured to block at least one of the holes to control distribution of at least one of the electric field and the electromagnetic field through the pad material. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A pad structure for use in an apparatus for depositing material on, or removing material from, a substrate, the pad structure comprising:
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a pad material having a top surface, a bottom surface and a defined thickness; at least one opening extending between the top surface and the bottom surface, the at least one opening having an inlet at the bottom surface and an outlet at the top surface, wherein the at least one opening is adapted to communicate electrolyte and an electric field, magnetic field or electromagnetic field through the pad material to the substrate, wherein the substrate is exposed to the outlet and wherein the at least one opening is a slit extending across a substantial portion of the diameter of the pad material, said slit also extending through the pad material; and an adhesive system on the bottom surface, wherein the adhesive system is configured to block at least a portion of the inlet and configured to control distribution of at least one of the electric field and the electromagnetic field through the pad material. - View Dependent Claims (13, 14, 15, 16, 17)
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18. A pad for polishing a surface of a substrate comprising:
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a plurality of channels formed therein, wherein the plurality of channels extend between a first surface and an opposite second surface of the pad, wherein at least one of the plurality of channels has an outlet exposed, wherein the surface of the substrate is exposed to the outlet, and wherein the plurality of channels are cylindrical and the channels include a diameter from 0.5 mm to 5 mm; and an adhesive system on one of the first and second surfaces, wherein the adhesive system is configured to block at least one of the channels to control distribution of at least one of an electric field and electromagnetic field through the pad. - View Dependent Claims (19, 20, 21, 22, 23, 24)
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25. A pad for polishing a surface of a substrate comprising:
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a plurality of channels formed therein; a polishing surface having a plurality of grooves disposed thereon, wherein a portion of the plurality of grooves intersect the plurality of channels, wherein the plurality of channels extend between the polishing surface and a bottom surface opposite the polishing surface; and an adhesive system on the bottom surface, wherein the adhesive system is non-porous under at least one of the channels and to configured to control distribution of at least one of an electric field and electromagnetic field through the pad. - View Dependent Claims (26)
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27. A pad for polishing a surface of a substrate comprising:
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a plurality of channels formed therein; a polishing surface having a plurality of grooves disposed thereon, wherein the plurality of grooves extend transversely with respect to one another, wherein the plurality of channels extend between the polishing surface and a bottom surface opposite the polishing surface; and an adhesive system on the bottom surface, wherein the adhesive system is non-porous under at least one of the channels and to configured to control distribution of at least one of an electric field and electromagnetic field through the pad. - View Dependent Claims (28, 29)
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30. A pad for polishing a surface of a substrate comprising:
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a plurality of channels formed therein, wherein the plurality of channels extend between a polishing surface and an opposite undersurface of the pad, wherein at least one of the plurality of channels has an outlet exposed, wherein the surface of the substrate is exposed to the outlet; an adhesive system on one of the first and second surfaces, wherein the adhesive system is configured to block at least one of the channels to control distribution of at least one of an electric field and electromagnetic field through the pad; and a support structure attached to the undersurface of the pad by the adhesive system, wherein the support structure includes a plurality of channels disposed therein and adapted to flow material therethrough and at least a portion of the plurality of channels in the pad are aligned with the plurality of channels in the support structure adapted for the flow of the material through the support structure and the pad. - View Dependent Claims (31, 32, 33, 34, 35, 36)
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Specification