Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle

• US 7,379,154 B2
• Filed: 04/30/2004
• Issued: 05/27/2008
• Est. Priority Date: 04/30/2003
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Van Dijck, Hendrikus Alphonsus Ludovicus, Uitterdijk, Tammo, Bruls, Richard Joseph, Hofmans, Gerardus Carolus Johannus, Cicilia, Orlando Serapio
• Primary Examiner(s): Rutledge; D.
• Application Number:
  US10/835,287
• Publication Number:
  US 20050140949A1
• Time in Patent Office: 1,488 Days
• Field of Search: 355/53, 355/75, 355/55, 378/35, 430/5, 430/2, 430/22, 430/322, 430/20
• US Class Current: 355/53
• CPC Class Codes: G03F 1/62 Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
• CPC Class Codes: G03F 1/64 characterised by the frames, e.g. structure or material, including bonding means therefor
• CPC Class Codes: G03F 1/82 Auxiliary processes, e.g. cleaning or inspecting
• CPC Class Codes: G03F 7/70258 Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
• CPC Class Codes: G03F 7/70308 Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
• CPC Class Codes: G03F 7/70983 Optical system protection, e.g. pellicles or removable covers for protection of mask

Abstract

A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.

Claims

1. A mask having a pellicle fixed to a frame in spaced relation thereto, wherein said pellicle is fixed to said frame such that in use during exposure in a lithographic apparatus, the pellicle adopts a shape that introduces imaging effects that are substantially compensatable for by adjustment of available system parameters of a lithographic apparatus with which the mask is to be used.

2. A mask according to claim 1 wherein said pellicle is fixed to said frame along two parallel edges and compliantly mounted along the other edges such that said pellicle adopts a substantially one-dimensional shape when in the orientation in which it will be used for exposures in a lithographic projection apparatus.

3. A mask according to claim 2 wherein said pellicle is fixed to said frame at said two parallel edges at an angle equal to that that would be adopted were the pellicle allowed to bow freely under gravity.

4. A mask according to claim 2 wherein said pellicle is fixed to said frame at both of said parallel edges at an angle of 0°

.

5. A mask according to claim 1, further comprising a spoiler attached to one of said mask, said pellicle or said frame, said spoiler shaped to reduce Bernoulli effects that would otherwise distort said pellicle when said mask moves during an exposure.

6. A mask according to claim 1, wherein the frame has a shape that conforms with the shape of the pellicle so that a seal around the periphery of the pellicle can be made.

7. A mask according to claim 1, wherein the pellicle is supported on only two edges of the frame and further comprising a rim provided along the non-supporting edges of the frame, the rim reaching close to, but not touching, the edge of the pellicle.

8. A mask according to claim 1, wherein said pellicle is fixed to said frame at an angle to minimize image fading.

9. A mask according to claim 1, further comprising a sealing material provided in a gap between the pellicle and the frame.

10. A mask having a pellicle fixed to a frame in spaced relation thereto, wherein said pellicle is fixed to said frame such that in use during exposure in a lithographic apparatus, the pellicle adopts a substantially one-dimensional non-flat shape when in the orientation in which it will be used for the exposure in the lithographic apparatus.

11. A mask according to claim 10, wherein the pellicle introduces imaging effects that are substantially compensatable for by adjustment of available system parameters of the lithographic apparatus.

12. A mask according to claim 10, wherein the pellicle is fixed to said frame at two parallel edges at an angle equal to that that would be adopted were the pellicle allowed to bow freely under gravity.

13. A mask according to claim 10, wherein said pellicle is fixed to said frame at two parallel edges at an angle of 0°

.

14. A mask according to claim 10, further comprising a spoiler attached to one of said mask, said pellicle or said frame, said spoiler shaped to reduce Bernoulli effects that would otherwise distort said pellicle when said mask moves during an exposure.

15. A mask according to claim 10, wherein the frame has a shape that conforms with the shape of the pellicle so that a seal around the periphery of the pellicle can be made.

16. A mask according to claim 10, wherein the pellicle is supported on only two edges of the frame and further comprising a rim provided along the non-supporting edges of the frame, the rim reaching close to, but not touching, the edge of the pellicle.

17. A mask according to claim 10, wherein said pellicle is fixed to said frame at an angle to minimize image fading.

18. A mask according to claim 10, further comprising a sealing material provided in a gap between the pellicle and the frame.