Integrated DRAM-NVRAM multi-level memory
First Claim
1. A method for operation of an integrated DRAM-NVRAM cell having a DRAM function and a NVRAM function, the cell comprising a DRAM gate, a NVRAM control gate, a DRAM source region, a NVRAM source region, a shared drain region, and a bitline coupled to the shared drain region, the method comprising:
- applying a ground potential to the NVRAM source region;
applying a first voltage to the NVRAM control gate; and
applying a second voltage to the DRAM gate in order to read one of a plurality of data bits from the NVRAM function in response to the first voltage and the second voltage.
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Accused Products
Abstract
An integrated DRAM-NVRAM, multi-level memory cell is comprised of a vertical DRAM device with a shared vertical gate floating plate device. The floating plate device provides enhanced charge storage for the DRAM part of the cell through the shared floating body in a pillar between the two functions. The memory cell is formed in a substrate with trenches that form pillars. A vertical wordline/gate on one side of a pillar is used to control the DRAM part of the cell. A vertical trapping layer on the other side of the pillar stores one or more charges as part of the floating plate device and to enhance the DRAM function through the floating body between the DRAM and floating plate device. A vertical NVRAM wordline/control gate is formed alongside the trapping layer and is shared with an adjacent floating plate device.
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Citations
18 Claims
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1. A method for operation of an integrated DRAM-NVRAM cell having a DRAM function and a NVRAM function, the cell comprising a DRAM gate, a NVRAM control gate, a DRAM source region, a NVRAM source region, a shared drain region, and a bitline coupled to the shared drain region, the method comprising:
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applying a ground potential to the NVRAM source region; applying a first voltage to the NVRAM control gate; and applying a second voltage to the DRAM gate in order to read one of a plurality of data bits from the NVRAM function in response to the first voltage and the second voltage. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method for operation of an integrated DRAM-NVRAM cell having a DRAM function and a NVRAM function, the cell formed in a pillar and comprising a DRAM gate, a NVRAM control gate, a DRAM source region, a NVRAM source region, a shared drain region, and a bitline coupled to the shared drain region, the method comprising:
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biasing the NVRAM source region with a voltage substantially equal to 0V; biasing the NVRAM control gate with a first voltage; and biasing the DRAM gate with a second voltage such that one of a plurality of data bits is read from the NVRAM function in response to the first and second voltages. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15)
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16. A method for operation of an integrated DRAM-NVRAM cell having a DRAM function and a NVRAM function, the cell formed in a pillar between two trenches and comprising a vertical DRAM gate, a vertical NVRAM control gate, a DRAM source region, a NVRAM source region, a shared drain region formed in the top of the pillar, and a bitline coupled to the shared drain region, the method comprising:
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biasing the vertical NVRAM source region with a voltage substantially equal to 0V; biasing the vertical NVRAM control gate with a first voltage; and biasing the vertical DRAM gate with a second voltage such that one of a plurality of data bits is read from the NVRAM function in response to the first and second voltages. - View Dependent Claims (17, 18)
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Specification